Abstract: Disclosed is a process for the preparation of polyesters, comprising the following steps and characterized by the following measures: a) suspending polyethylene terephthalate waste in ethylene glycol and/or in 1,2-propylene glycol containing a transesterification catalyst, b) heating the reaction mixture to depolymerize the polyethylene terephthalate waste for a time sufficient to decompose the polyethylene terephthalate into monomers and into oligomers, c) addition of end group forming monomers in the form of polyalkylene glycol monoalkyl ethers, fatty alcohols, fatty amines, fatty acids or esters thereof or mixtures of two or more thereof, and/or sulfo(poly)alkylene glycols and/or sulfoaryl carboxylic acids or esters thereof, d) addition of sulfoarylene dicarboxylic acids or polyester-forming derivatives thereof, e) optionally adding aliphatic diols, cycloaliphatic diols, organic dicarboxylic acids, their polyester-forming derivatives, crosslinkers or mixtures of two or more thereof, f) heating the react

Abstract: Disclosed are aqueous compositions of selected anionic polyesters and of selected nonionic polyesters. These compositions are characterized by good storage stability and low viscosity and can be used in detergents and cleaning agents to improve soil release.

Abstract: The present invention concerns a composition comprising Mn(II) acetate, a protonated salt of a cyclic triamine, a polysaccharide absorbent, and a water-soluble polymer, e.g. polyvinylalcohol. The invention also concerns a method of making such compositions, preferably in the form of a granule, and bleaching formulations comprising the salt and a peroxy compound or precursor thereof. The protonated ligand salt and Mn(II) acetate containing composition and formulations comprising it, are suitable for use in catalysing oxidation, for example as a component of a laundry or dishwasher bleaching composition. The invention further relates to cleaning agents comprising the compositions described herein.

Abstract: Anti-adrenomedullin (ADM) antibody or an anti-ADM antibody fragment or anti-ADM non-Ig scaffold for the treatment of a critically ill patients suffering from an acute disease or condition including: severe infections, meningitis, systemic inflammatory response syndrome, sepsis, shock, septic shock, cardiogenic shock, acute heart failure, acute decompensated heart failure, chronic heart failure with worsening signs and symptoms, myocardial infarction, stroke, organ dysfunction or dementia, in order to accelerate the conversion of ADM-Gly to ADM-NH2 of circulating ADM-Gly in the patient, which patient has a ratio of pro-Adrenomedullin or a fragment thereof to ADM-NH2 above a certain threshold in a sample of bodily fluid, wherein the pro-Adrenomedullin or fragment thereof is PAMP, MR-proADM, ADM-Gly or CT-proADM and wherein the anti-ADM antibody or anti-ADM fragment or anti-ADM non-Ig scaffold binds to the N-terminal and/or mid-regional part (amino acid 1-42) of ADM-Gly and/or ADM-NH2: YRQSMNNFQGLRSFGCRFGTCTVQKL

Abstract: The present invention relates to a compound according to Formula (3), wherein the compound comprises from 28 wt. % to 100 wt. % bio-based carbon content, relative to the total mass of carbon in the compound, measured according to standard ASTM D6866-12, Method B; and wherein X+is a proton. The present invention also relates to a polymer obtained by polymerising at least one of compound according to Formula (3), in addition to processes and uses related thereto.

Abstract: A stand-alone self-service document shredding machine that receives the documents, shreds them, and securely stores the shredded documents in a receiving bin for later removal. There is a feeder mechanism that feeds the documents yet protects the user from injury when the shredder machine is operating. The shredded documents are disbursed across the receiving bin. The user interfaces with the shredding machine by means of a touch screen and can pay with a credit or debit card or an account set up online.

Abstract: The present invention relates to a compound according to Formula (3), wherein the compound comprises from 28 wt. % to 100 wt. % bio-based carbon content, relative to the total mass of carbon in the compound, measured according to standard ASTM D6866-12, Method B; and wherein X+ is a proton. The present invention also relates to a polymer obtained by polymerising at least one of said compound, in addition to processes and uses related thereto.

Abstract: A projection exposure system (10) includes: a mask holding device (14), a substrate holding device (36), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system, which defined position is mechanically uncoupled from the position of the mask holding device. The projection exposure system also includes a detector (52) arranged to record an image of the measurement structure imaged by the projection optics. During operation of the system, the imaging of the mask structures and of the measurement structure takes place at the same time by the projection optics. An evaluation device (54) establishes a lateral position of the image of the measurement structure in the area of the detector during the exposure process.

Abstract: A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding to device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26.

Abstract: A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding to device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26.

Abstract: A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26.

Abstract: A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26.

Abstract: A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26.

Abstract: A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26.

Abstract: A process for providing information related to an individual or an animal in a portable display and storage device that allows other individuals to access the personal and medical information quickly. The process includes entering the information in formatted screens of data in a computer, transferring the formatted screens of data to the portable display and storage device, storing the formatted screens of data in the portable display and storage device, and displaying the formatted screens of data in the portable display and storage device. In some embodiments, the formatted screens of data in the display and storage device are transferred to a computer, modified, and transferred back to the display and storage device.

Abstract: A method of bridging a gap in an external electrical power supply line without stalling using an electrically powered rail propulsion vehicle includes using an electrically powered rail propulsion vehicle to propel a consist, the electrically powered rail propulsion vehicle configured to run as an emission-free pure electric unit from the external electrical power supply line; determining if a gap in the external electrical power supply line condition occurs; and supplying electric power from one or more ultracapacitor packs to run the electrically powered rail propulsion vehicle if a gap condition is determined to occur.

Abstract: A wind instrument such as a recorder or a flute is disclosed. The wind instrument may include a body fabricated from a clear or translucent light-transmitting material, with or without color. The body includes a compartment and a light source retained within the compartment. The light source may direct light along and through the body of the wind instrument. The light source may include multiple colored LEDs or other light-emitting devices.

Abstract: A wind instrument such as a recorder or a flute is disclosed. The wind instrument may include a body fabricated from a clear or translucent light-transmitting material, with or without color. The body includes a compartment and a light source retained within the compartment. The light source may direct light along and through the body of the wind instrument. The light source may include multiple colored LEDs or other light-emitting devices.

Abstract: The invention relates to an optical bench that has a base plate and can be permanently connected to an associated component. A receiving element for other optical elements that is arranged in such a way in relation to the base plate with connecting elements that it is deformable in its entirety in relation to said base plate, is allocated to the same.

Abstract: The invention relates to an optical bank that has a base plate and can be permanently connected to an associated component. A receiving element for other optical elements that is arranged in such a way in relation to the base plate with connecting elements that it is deformable in its entirety in relation to said base plate, is allocated to the same.