Patents by Inventor Paul Kupper

Paul Kupper has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Antireflection layer and process for lithographically structuring a layer
    Patent number: 5747388
    Abstract: A thick layer formed of aSi or aSi/aSiN is used as an antireflection layer (3) in the lithographic structuring of layers (2) on a semiconductor substrate (1). A reflection suppression is based on absorption in the aSi layer and on interference in the aSiN layer. An optical decoupling of the background is achieved, with the result that the antireflection layer can be used universally.
    Type: Grant
    Filed: March 20, 1995
    Date of Patent: May 5, 1998
    Assignee: Siemens Aktiengesellschaft
    Inventors: Karl-Heinz Kusters, Paul Kupper, Gunther Czech, Hellmut Joswig