Abstract: A compact, self-contained remote plasma generator is mounted on the lid of a semiconductor processing chamber to form an integrated substrate processing system. The remote plasma generator is activated in a clean operation to generate cleaning plasma species to provide better cleaning of the chamber and lower perfluorocarbon emissions than in situ plasma clean processes. A three-way valve is adjustable to control gas flow to the chamber. During the clean operation, the three-way valve directs a cleaning plasma precursor from a first gas line to the remote plasma generator to generate cleaning plasma species which are flowed to the chamber for cleaning deposits therein. During a deposition process, the three-way valve directs a first process gas from the flat gas line to the chamber, bypassing the remote plasma generator.

Abstract: A conduit interlock assembly for being clamped to portions of a pair of conduits which portions are adjacent an end-to-end interconnection between the two conduits and which conduit interlock assembly is for surrounding a conduit fastener or fasteners fastening the conduits together in the end-to-end connection. The conduit interlock assembly includes a normally open switch for being closed upon the conduit interlock assembly being clamped to the conduits to provide an indication that the conduits are in the end-to-end interconnection and which switch is opened upon the conduit interlock assembly being unclamped from the conduits to provide an indication that the conduits possibly are not in the end-to-end interconnection.