Patents by Inventor Paul Libbers

Paul Libbers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mix head assembly for forming chemical mechanical polishing pads
    Patent number: 8118897
    Abstract: A mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers is provided, wherein inclusions of entrained gas inclusion defects are minimized.
    Type: Grant
    Filed: April 11, 2011
    Date of Patent: February 21, 2012
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: John Esbenshade, Andrew M Geiger, Paul Libbers, Samuel J November, Paul J Sacchetti, Jonathan Tracy, David Verbaro, Michael E Watkins
  • Mix head assembly for forming chemical mechanical polishing pads
    Publication number: 20110185967
    Abstract: A mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers is provided, wherein inclusions of entrained gas inclusion defects are minimized.
    Type: Application
    Filed: April 11, 2011
    Publication date: August 4, 2011
    Applicant: Rohm and Haas Electronic Materials CMP Holding, Inc.
    Inventors: John Esbenshade, Andrew M. Geiger, Paul Libbers, Samuel J. November, Paul J. Sacchetti, Jonathan Tracy, David Verbaro, Michael E. Watkins
  • Method for manufacturing chemical mechanical polishing pad polishing layers having reduced gas inclusion defects
    Patent number: 7947098
    Abstract: A method for manufacturing chemical mechanical polishing pad polishing layers that minimizes entrained gas inclusion defects is provided. Also provided is a mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers, wherein inclusions of entrained gas inclusion defects are minimized.
    Type: Grant
    Filed: June 23, 2009
    Date of Patent: May 24, 2011
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: John Esbenshade, Andrew M Geiger, Paul Libbers, Samuel J November, Paul J Sacchetti, Jonathan Tracy, David Verbaro, Michael E Watkins
  • Method for manufacturing chemical mechanical polishing pad polishing layers having reduced gas inclusion defects
    Publication number: 20100269416
    Abstract: A method for manufacturing chemical mechanical polishing pad polishing layers that minimizes entrained gas inclusion defects is provided. Also provided is a mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers, wherein inclusions of entrained gas inclusion defects are minimized.
    Type: Application
    Filed: June 23, 2009
    Publication date: October 28, 2010
    Applicant: Rohm and Haas Electroinic Materials CMP Holidays, Inc.
    Inventors: John Esbenshade, Andrew M. Geiger, Paul Libbers, Samuel J. November, Paul J. Sacchetti, Jonathan Tracy, David Verbaro, Michael E. Watkins