Abstract: A method, devices, and a system is proposed for configuring a security control system of a secure control area, the method comprising exchanging UWB transmission(s) between a mobile communication device and one or more access control devices of the security control system, determining location information of the mobile communication device within the secure control area, receiving, by the mobile communication device, one or more user inputs comprising one or more relationship indication(s) of one or more relationship(s) between the respective location(s) of the mobile communication device and one or more security perimeters of the secure control area; and generating layout information relating to a physical layout of the one or more security perimeters within the secure control area using the location information and the one or more relationship indications.

Abstract: A thermally controlled chamber liner comprising a passage having an inlet and outlet adapted to flow a fluid through the one or more fluid passages formed at least partially therein. The chamber liner may comprise a first liner, a second liner or both a first liner and a second liner. The thermally controlled chamber liner maintains a predetermined temperature by running fluid from a temperature controlled, fluid source through the fluid passages. By maintaining a predetermined temperature, deposition of films on the chamber liner is discouraged and particulate generation due to stress cracking of deposited films is minimized.

Abstract: A capacitively coupled reactor for plasma etch processing of substrates at subatmospheric pressures includes a chamber body defining a processing volume, a lid provided upon the chamber body, the lid being a first electrode, a substrate support provided in the processing volume and comprising a second electrode, a radio frequency source coupled at least to one of the first and second electrodes, a process gas inlet configured to deliver process gas into the processing volume, and an evacuation pump system having pumping capacity of at least 1600 liters/minute. The greater pumping capacity controls residency time of the process gases so as to regulate the degree of dissociation into more reactive species.

Abstract: The invention solves the problem of continuously monitoring wafer temperature during processing using an optical or fluoro-optical temperature sensor including an optical fiber having an end next to and facing the backside of the wafer. This optical fiber is accommodated without disturbing plasma processing by providing in one of the wafer lift pins an axial void through which the optical fiber passes. The end of the fiber facing the wafer backside is coincident with the end of the hollow lift pin. The other end is coupled via an “external” optical fiber to temperature probe electronics external of the reactor chamber. The invention uses direct wafer temperature measurements with a test wafer to establish a data base of wafer temperature behavior as a function of coolant pressure and a data base of wafer temperature behavior as a function of wafer support or “puck” temperature.

Abstract: A plasma reactor embodying the invention includes a wafer support and a chamber enclosure member having an interior surface generally facing the wafer support. At least one miniature gas distribution plate for introducing a process gas into the reactor is supported on the chamber enclosure member and has an outlet surface which is a fraction of the area of the interior surface of said wafer support. A coolant system maintains the chamber enclosure member at a low temperature, and the miniature gas distribution plate is at least partially thermally insulated from the chamber enclosure member so that it is maintained at a higher temperature by plasma heating.

Abstract: A thermally controlled chamber liner comprising a passage having an inlet and outlet adapted to flow a fluid through the one or more fluid passages formed at least partially therein. The chamber liner may comprise a first liner, a second liner or both a first liner and a second liner. The thermally controlled chamber liner maintains a predetermined temperature by running fluid from a temperature controlled, fluid source through the fluid passages. By maintaining a predetermined temperature, deposition of films on the chamber liner is discouraged and particulate generation due to stress cracking of deposited films is minimized.

Abstract: The invention solves the problem of continuously monitoring wafer temperature during processing using an optical or fluoro-optical temperature sensor including an optical fiber having an end next to and facing the backside of the wafer. This optical fiber is accommodated without disturbing plasma processing by providing in one of the wafer lift pins an axial void through which the optical fiber passes. The end of the fiber facing the wafer backside is coincident with the end of the hollow lift pin. The other end is coupled via an “external” optical fiber to temperature probe electronics external of the reactor chamber. The invention uses direct wafer temperature measurements with a test wafer to establish a data base of wafer temperature behavior as a function of coolant pressure and a data base of wafer temperature behavior as a function of wafer support or “puck” temperature.

Abstract: An apparatus and method for controlling a plasma in a plasma processing system. The apparatus comprises a wafer support pedestal surrounded by a process kit that is driven by an RF signal. Both an electrode (cathode) in the pedestal and the process kit are driven with an RF signal to establish a primary plasma above the pedestal and a secondary plasma above the process kit.

Abstract: An apparatus and method for controlling a plasma in a plasma processing system. The apparatus comprises a wafer support pedestal surrounded by a process kit that is driven by an RF signal. Both an electrode (cathode) in the pedestal and the process kit are driven with an RF signal to establish a primary plasma above the pedestal and a secondary plasma above the process kit.

Abstract: A vertical conveying apparatus is used particularly advantageously in a vertical continuous furnace, for example, in semiconductor production. Since rubbing contacts are avoided and there is thus barely any wear, continuous furnaces provided therewith are particularly suitable for the sensitive semiconductor products and production processes. Since no lateral guides are necessary for the specially designed carriers in the case of relatively small and average stack heights, there is no rubbing contact in the furnace region either, and wear is thus completely avoided. Furthermore, the invention is distinguished by its mechanical simplicity, which has advantages, in particular as far as durability and maintenance are concerned. The absence of retaining or transporting beams in the furnace region makes it possible to achieve a wide variety of different temperature zones over the vertical height of the stack.

Abstract: An apparatus for heating food-warmer plates includes a housing into which a plurality of the food-warmer plates may be slid through slots in a wall of the housing. An electrical heating element is disposed under each food-warmer plate inserted into the housing. The heating elements may be switched on and off individually. In this way it is possible to heat only that number of food-warmer plates which is actually needed.

Abstract: The present invention relates to an apparatus for heating stackable dishes. The apparatus includes a shaft-like heatable housing with an open top which can be closed off with a cover. A support for a stack of dishes is disposed within the interior of the housing. The support moves translationally in the vertical direction on guide rails and is linked to endless chains which are driven by an electric motor. By operating the electric motor, the support with the stack of dishes is moved to a vertical position which is convenient for removing or inserting dishes. This movement may be executed following an automatic opening of the cover. The operator does not need to bend over or to stretch to reach the dishes. An automatic control further serves to lower the stack of dishes into the housing and to close the cover after the passage of a predetermined time interval at the desired vertical position.

Abstract: Method of producing protective coatings on metal parts to be used in contact with molten glass.The method of the invention comprises spraying onto the surface to be coated, by a thermal spraying process such as flame or plasma spraying, a powdered material consisting essentially of at least 60% by weight of chromium oxide, from 0 to 40% by weight of a nickel-base alloy such as a nickel-chromium alloy and from 0 to 20% by weight of metal oxides such as aluminum, titanium and zirconium oxides.