Abstract: An integrated circuit wafer, covered by a protective overcoat, comprising an array of integrated circuit chips bordered by seal regions and separated by dicing lines; at least two sets of substantially parallel structures within each of said seal regions, each set extending along the edge of a chip on opposite sides of each said dicing line, respectively; each of said sets comprising at least one continuous barrier wall adjacent each chip, respectively; at least one sacrificial composite structure in combination therewith, between said wall and the center of said dicing line, said composite structure being a discontinuous barrier wall comprising metal rivets interconnecting electrically conductive layers in an alternating manner, whereby said composite structure provides mechanical strength to said sets and simultaneously disperses the energy associated with crack propagation; and at least one slot opened into said protective overcoat, reaching from the surface of said overcoat at least to the surface-nearest

Abstract: A method of forming a via in an integrated circuit is provided. The method includes forming a stack including a first layer, a hard mask layer, and at least one intermediate layer disposed between the first layer and the hard mask layer. The first layer comprises a first metal line. The method further includes forming a channel in the hard mask layer. The channel has a first side and a second side opposite the first side. The method further includes forming a resist layer having an opening extending over both the first and second sides of the channel. The method further includes forming a metal line trench and a via opening aligned with the first and second sides of the channel. The method further includes filling the filling the metal line trench and the via opening with a conductive material to create a second metal line and a via connecting the second metal line with the first metal line.

Abstract: A method of forming a via in an integrated circuit is provided. The method includes forming a stack including a first layer, a hard mask layer, and at least one intermediate layer disposed between the first layer and the hard mask layer. The first layer comprises a first metal line. The method further includes forming a channel in the hard mask layer. The channel has a first side and a second side opposite the first side. The method further includes forming a resist layer having an opening extending over both the first and second sides of the channel. The method further includes forming a metal line trench and a via opening aligned with the first and second sides of the channel. The method further includes filling the filling the metal line trench and the via opening with a conductive material to create a second metal line and a via connecting the second metal line with the first metal line.

Abstract: An integrated circuit wafer, covered by a protective overcoat, comprising an array of integrated circuit chips bordered by seal regions and separated by dicing lines; at least two sets of substantially parallel structures within each of said seal regions, each set extending along the edge of a chip on opposite sides of each said dicing line, respectively; each of said sets comprising at least one continuous barrier wall adjacent each chip, respectively; at least one sacrificial composite structure in combination therewith, between said wall and the center of said dicing line, said composite structure being a discontinuous barrier wall comprising metal rivets interconnecting electrically conductive layers in an alternating manner, whereby said composite structure provides mechanical strength to said sets and simultaneously disperses the energy associated with crack propagation; and at least one slot opened into said protective overcoat, reaching from the surface of said overcoat at least to the surface-nearest

Abstract: An integrated circuit wafer, covered by a protective overcoat, comprising an array of integrated circuit chips bordered by seal regions and separated by dicing lines; at least two sets of substantially parallel structures within each of said seal regions, each set extending along the edge of a chip on opposite sides of each said dicing line, respectively; each of said sets comprising at least one continuous barrier wall adjacent each chip, respectively; at least one sacrificial composite structure in combination therewith, between said wall and the center of said dicing line, said composite structure being a discontinuous barrier wall comprising metal rivets interconnecting electrically conductive layers in an alternating manner, whereby said composite structure provides mechanical strength to said sets and simultaneously disperses the energy associated with crack propagation; and at least one slot opened into said protective overcoat, reaching from the surface of said overcoat at least to the surface-nearest

Abstract: A method for forming copper interconnect lines using a damascene process. After the formation of the copper seed layer (112) and prior to the formation of the copper layer (120), a pattern (114) is formed to block the formation of the copper in non-interconnect areas. The copper layer (120) is then formed and the pattern (114) is removed. The exposed seed layer (112) and any barrier layers (110) thereunder are removed.