Abstract: An HPLC injection valve is mounted to a probe drive system close to the probe axis to minimize probe movements required for sample injections into a mobile phase column. The probe is directly connected by a short conduit to the injection valve, eliminating the need to dispense aspirated samples from the probe into a remote injection port.

Abstract: An HPLC injection valve is mounted to a probe drive system close to the probe axis to minimize probe movements required for sample injections into a mobile phase column. The probe is directly connected by a short conduit to the injection valve, eliminating the need to dispense aspirated samples from the probe into a remote injection port.

Abstract: An optical filter is provided for use in color projection display imaging systems which utilize liquid crystal light valves for image modulation. The optical filter is a dichroic coating which separates light into different colors. The optical filter is located on a light transmissive surface of a color splitting device such as a Philips prism. The optical filter is formed from layers of at least two different dielectric materials including a high refractive index material, such as zirconium oxide and a low refractive index material such as aluminum oxide. The low refractive index material has an average refractive index of no less than about 1.6. The high refractive index material has an average refractive index which is sufficiently greater than the average refractive index of the low refractive index such that the average refractive index of the high refractive index material divided by the average refractive index of the low refractive index material yields a ratio that is greater than about 1.

Abstract: A thin film coating system incorporates separate, separately-controlled deposition and reaction zones for depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. The associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated, sequentially or simultaneously operated deposition and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by controlled coating thickness, including both constant and selectively varied thickness profiles.

Abstract: A wear resistant, low reflectence optical thin films composite is suitable for high wear, stringent optical quality applications such as in xerographic copier platens. The optical thin film coating composite comprises relatively thick layers of aluminum oxide and silicon oxide and a relatively thin top layer of titanium nitride.

Abstract: A rotary cylindrical sputtering system incorporates separate, separately-controlled linear magnetron sputter deposition and reaction zones for sputter depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. In one aspect, the associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated, sequentially or simultaneously operated deposition and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by the ability to form durable optical quality thin films of nominal refractive indices and controlled coating thickness, including both constant and selectively varied thickness profiles.

Abstract: A thin film coating system incorporates separate, separately-controlled deposition and reaction zones for depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. The associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated, sequentially or simultaneously operated deposition and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by controlled coating thickness, including both constant and selectively varied thickness profiles.

Abstract: A rotary cylindrical sputtering system incorporates separate, separately-controlled linear magnetron sputter deposition and reaction zones for sputter depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. In one aspect, the associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated, sequentially or simultaneously operated deposition and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by the ability to form durable optical quality thin films of nominal refractive indices and controlled coating thickness, including both constant and selectively varied thickness profiles.

Abstract: High purity (95-99.5 percent) red, orange and yellow filters are disclosed which comprise a periodic stack of relatively low index of refraction dielectric material (L) such as SiO.sub.2 or MgF.sub.2 and absorbing relatively high index material such as silicon or Fe.sub.2 O.sub.3. Together, the low and high index materials provide a high index ratio (typically 1.7 to 2.5). The filters are fabricated according to designs such as (H/2 L H/2).sup.n, typically using only 5 to 7 layers. Despite the very small layer count, these filters provide overall optical performance which is at least the equivalent of all-dielectric filters of 30 or more layers, with color purity that is unachievable by all-dielectric filters and simple low cost design. In addition, our filters have inherently low stress levels and absorb and reflect unwanted light such as blue light.

Abstract: A rotary cylindrical sputtering system incorporates separate, separately-controlled linear magnetron sputter cathode and reaction zones for sputter depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. The associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated, sequentially or simultaneously operated cathode and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by controlled coating thickness, including both constant and selectively varied thickness profiles.