Patents by Inventor Paul Mertens
Paul Mertens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180047560Abstract: A method for performing a wet treatment of a structure is described in the present disclosure. An example method includes obtaining a structure comprising a first surface, wherein the first surfaces comprises a feature fixed at least at a first end to the first surface from which it protrudes, and wherein a sidewall of the feature faces and is positioned away from a second surface by a gap g, performing a wet treatment of the structure and subsequently, drying the structure, wherein performing the wet treatment comprises rinsing the structure by exposing it to a rinsing liquid comprising water, and exposing the structure, subsequently, to a sequence of liquids.Type: ApplicationFiled: August 10, 2017Publication date: February 15, 2018Applicant: IMEC VZWInventor: Paul Mertens
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Patent number: 9673373Abstract: This present application relates to a system for delivering megasonic energy to a liquid, involving one or more megasonic transducers, each transducer having a single operating frequency within an ultrasound bandwidth and comprising two or more groups of piezoelectric elements arranged in one or more rows, and a megasonic generator means for driving the one or more transducers at frequencies within the bandwidth, the generator means being adapted for changing the voltage applied to each group of piezoelectric elements so as to achieve substantially the same maximum acoustic pressure for each group of piezoelectric elements. The generator means and transducers being constructed and arranged so as to produce ultrasound within the liquid. Such a system may be part of an apparatus for cleaning a surface of an article such as a semiconductor wafer or a medical implant.Type: GrantFiled: August 15, 2013Date of Patent: June 6, 2017Assignee: IMECInventors: Steven Brems, Paul Mertens
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Publication number: 20170076936Abstract: Disclosed are systems and methods for cleaning semiconductor substrates, wherein a nucleation structure having nucleation sites is mounted facing a surface of the substrate to be cleaned. The substrate and structure are brought into contact with a cleaning liquid, which is subsequently subjected to acoustic waves of a given frequency. The nucleation template features easier nucleation formation than the surface that needs to be cleaned by, for example, causing the template to have a higher contact angle when in contact with the liquid than the substrate surface to be clean. Therefore, bubbles nucleate on the structure and not on the surface to be cleaned.Type: ApplicationFiled: November 22, 2016Publication date: March 16, 2017Inventors: Paul Mertens, Steven Brems
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Patent number: 9378989Abstract: The present invention is related to a method and apparatus for cleaning a substrate, in particular a semiconductor substrate such as a silicon wafer. The substrate is placed in a tank containing a cleaning liquid, at an angle with respect to acoustic waves produced in said liquid. The angle corresponds to the angle of transmission, i.e. the angle at which waves are not reflected off the substrate surface. A damping material is provided in the tank, arranged to absorb substantially all waves thus transmitted through the substrate. A significant improvement in terms of cleaning efficiency is obtained by the method of the invention.Type: GrantFiled: April 23, 2012Date of Patent: June 28, 2016Assignees: IMEC, Katholieke Universiteit Leuven, KU LEUVEN R&DInventors: Paul Mertens, Steven Brems, Elisabeth Camerotto, Marc Hauptmann
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Publication number: 20150250590Abstract: A chordae replacement device includes a first anchor for coupling to a native valve leaflet, a second anchor for coupling to heart tissue and a filament adapted for connection between the first anchor and the second anchor so as to limit the movement of the native valve leaflet away from the second anchor.Type: ApplicationFiled: February 26, 2015Publication date: September 10, 2015Applicant: ST. JUDE MEDICAL, CARDIOLOGY DIVISION, INC.Inventors: Sara Jane Gries, Jacob Paul Mertens
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Publication number: 20140053864Abstract: This present application relates to a system for delivering megasonic energy to a liquid, involving one or more megasonic transducers, each transducer having a single operating frequency within an ultrasound bandwidth and comprising two or more groups of piezoelectric elements arranged in one or more rows, and a megasonic generator means for driving the one or more transducers at frequencies within the bandwidth, the generator means being adapted for changing the voltage applied to each group of piezoelectric elements so as to achieve substantially the same maximum acoustic pressure for each group of piezoelectric elements. The generator means and transducers being constructed and arranged so as to produce ultrasound within the liquid. Such a system may be part of an apparatus for cleaning a surface of an article such as a semiconductor wafer or a medical implant.Type: ApplicationFiled: August 15, 2013Publication date: February 27, 2014Applicant: IMECInventors: Steven Brems, Paul Mertens
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Patent number: 8324116Abstract: A substrate treating method comprising a step of preparing a semiconductor substrate (W, 11) which has an oxide film (13, 14) containing at least one of a rare earth oxide and an alkaline earth oxide, at least a portion of the oxide film (13, 14) being exposed, and a rinse step of supplying the oxide film (13, 14) on the semiconductor substrate (W, 11) with a rinse liquid made of an alkaline chemical or an organic solvent. Preferably, the alkaline chemical is an alkaline aqueous solution having a pH of more than 7. Further, preferably, the organic solvent is a high concentration organic solvent having a concentration of substantially 100%.Type: GrantFiled: June 11, 2010Date of Patent: December 4, 2012Assignees: IMEC, Dainippon Screen Mfg. Co., Ltd.Inventors: Rita Vos, Paul Mertens, Tom Schram, Masayuki Wada
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Publication number: 20120266912Abstract: The present invention is related to a method and apparatus for cleaning a substrate, in particular a semiconductor substrate such as a silicon wafer. The substrate is placed in a tank containing a cleaning liquid, at an angle with respect to acoustic waves produced in said liquid. The angle corresponds to the angle of transmission, i.e. the angle at which waves are not reflected off the substrate surface. A damping material is provided in the tank, arranged to absorb substantially all waves thus transmitted through the substrate. A significant improvement in terms of cleaning efficiency is obtained by the method of the invention.Type: ApplicationFiled: April 23, 2012Publication date: October 25, 2012Applicants: Katholieke Universiteit Leuven, K.U. Leuven R&D, IMECInventors: Paul Mertens, Steven Brems, Elisabeth Camerotto, Marc Hauptmann
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Publication number: 20120227775Abstract: Methods and apparatuses for cleaning a surface of a substrate are presented. The method comprises positioning a substrate at a controllable distance from a piezoelectric transducer, supplying a cleaning liquid between the substrate and the transducer, applying an oscillating acoustic force to the cleaning liquid by actuating the transducer, and moving the transducer relative to the substrate. The method further comprises, while moving the transducer relative to the substrate, measuring a value that indicates a distance between a surface of the substrate and the transducer, comparing the measured value to a desired value, and adjusting the distance between the surface and the transducer so that the measured value is maintained substantially equal to the desired value. The measured value may be the distance between the surface of the substrate and the transducer or a phase shift between an alternating current and voltage applied to the transducer.Type: ApplicationFiled: May 25, 2012Publication date: September 13, 2012Applicant: IMECInventors: Steven Brems, Paul Mertens
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Patent number: 8197604Abstract: Methods and apparatuses for cleaning a surface of a substrate are presented. The method comprises positioning a substrate at a controllable distance from a piezoelectric transducer, supplying a cleaning liquid between the substrate and the transducer, applying an oscillating acoustic force to the cleaning liquid by actuating the transducer, and moving the transducer relative to the substrate. The method further comprises, while moving the transducer relative to the substrate, measuring a value that indicates a distance between a surface of the substrate and the transducer, comparing the measured value to a desired value, and adjusting the distance between the surface and the transducer so that the measured value is maintained substantially equal to the desired value. The measured value may be the distance between the surface of the substrate and the transducer or a phase shift between an alternating current and voltage applied to the transducer.Type: GrantFiled: June 30, 2010Date of Patent: June 12, 2012Assignee: IMECInventors: Steven Brems, Paul Mertens
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Publication number: 20110088719Abstract: Disclosed are systems and methods for cleaning semiconductor substrates, wherein a nucleation structure having nucleation sites is mounted facing a surface of the substrate to be cleaned. The substrate and structure are brought into contact with a cleaning liquid, which is subsequently subjected to acoustic waves of a given frequency. The nucleation template features easier nucleation formation than the surface that needs to be cleaned by, for example, causing the template to have a higher contact angle when in contact with the liquid than the substrate surface to be clean. Therefore, bubbles nucleate on the structure and not on the surface to be cleaned.Type: ApplicationFiled: October 20, 2010Publication date: April 21, 2011Applicant: IMECInventors: Paul Mertens, Steven Brems
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Publication number: 20110000504Abstract: Methods and apparatuses for cleaning a surface of a substrate are presented. The method comprises positioning a substrate at a controllable distance from a piezoelectric transducer, supplying a cleaning liquid between the substrate and the transducer, applying an oscillating acoustic force to the cleaning liquid by actuating the transducer, and moving the transducer relative to the substrate. The method further comprises, while moving the transducer relative to the substrate, measuring a value that indicates a distance between a surface of the substrate and the transducer, comparing the measured value to a desired value, and adjusting the distance between the surface and the transducer so that the measured value is maintained substantially equal to the desired value. The measured value may be the distance between the surface of the substrate and the transducer or a phase shift between an alternating current and voltage applied to the transducer.Type: ApplicationFiled: June 30, 2010Publication date: January 6, 2011Applicant: IMECInventors: Steven Brems, Paul Mertens
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Publication number: 20100317185Abstract: A substrate treating method comprising a step of preparing a semiconductor substrate (W, 11) which has an oxide film (13, 14) containing at least one of a rare earth oxide and an alkaline earth oxide, at least a portion of the oxide film (13, 14) being exposed, and a rinse step of supplying the oxide film (13, 14) on the semiconductor substrate (W, 11) with a rinse liquid made of an alkaline chemical or an organic solvent. Preferably, the alkaline chemical is an alkaline aqueous solution having a pH of more than 7. Further, preferably, the organic solvent is a high concentration organic solvent having a concentration of substantially 100%.Type: ApplicationFiled: June 11, 2010Publication date: December 16, 2010Inventors: Rita Vos, Paul Mertens, Tom Schram, Masayuki Wada
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Publication number: 20100224215Abstract: Disclosed is a method for performing a physical force-assisted cleaning process on a patterned surface of a substrate, including providing a substrate having at least one patterned surface, supplying a cleaning liquid to the patterned surface, and applying a physical force to the cleaning liquid in contact with the patterned surface, whereby the physical force leads to bubble formation in the cleaning liquid. Furthermore, and prior to applying the physical force, an additive is supplied to the surface, and the additive is maintained in contact with the surface for a given time, the additive and the time being chosen so that a substantially complete wetting of the surface by the cleaning liquid is achieved.Type: ApplicationFiled: March 5, 2010Publication date: September 9, 2010Applicant: IMECInventors: Paul Mertens, Sandip Halder, Antoine Pacco, Tom Janssens
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Patent number: 7722610Abstract: A multiple coil staple is provided which includes a backspan and a pair of spaced legs. The backspan includes one or more pockets configured to induce coiling of the legs of the staple. A multiple coil staple applier is also provided which includes a pusher having a distal face defining a staple engagement surface and one or more staple deforming pockets. Each staple deforming pocket is configured to induce coiling of the legs of a staple. The multiple coil staple and staple applier facilitate joining of tissues having wider ranges of thicknesses using a single size staple.Type: GrantFiled: June 1, 2006Date of Patent: May 25, 2010Assignee: Tyco Healthcare Group LPInventors: Frank J. Viola, Richard D. Gresham, Ken Blier, Paul Merten, Joseph Sapiente, Henry E. Holsten, Russell Heinrich
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Publication number: 20090223832Abstract: The present invention is related to a method and apparatus for cleaning a semiconductor substrate including on a surface of the substrate at least one structure comprising a first conducting or semiconducting material, surrounded by a layer of a second conducting or semiconducting material, said layer essentially extending over the totality of said surface, the first and second material being in physical contact, the method comprising the steps of: providing the substrate, positioning a counter-electrode facing the substrate surface, and supplying an electrolytic fluid to the space between the surface and the electrode, the counter-electrode acting as an anode in the galvanic cell defined by the substrate surface, the cleaning fluid and the counter-electrode.Type: ApplicationFiled: January 7, 2009Publication date: September 10, 2009Applicants: Interuniversitair Microelektronica Centrum vzw (IMEC), Katholieke Universiteit Leuven, K.U.LEUVEN R&DInventors: Sylvain Garaud, Rita Vos, Leonardus Leunissen, Paul Mertens
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Patent number: 7521408Abstract: The present invention recites a composition comprising a first compound and a second compound. The first compound has the chemical formula ( 1a), wherein m, n and o are independently from each other equal to 2 or 3; wherein p is equal to 1 or 2; R being a chemical group with the chemical formula (1a?), wherein q is equal to 1, 2 or 3; wherein R1, R2 and R3 are independently selected from the group consisting of hydrogen and an organic group. The second compound has the chemical formula (1c). Metal ions can be present in the solution or in an external medium being contacted with the solution. The present invention can be used for cleaning a semiconductor substrate.Type: GrantFiled: December 12, 2005Date of Patent: April 21, 2009Assignees: Interuniversitair Microelektronica Centrum ( IMEC), Air Products and Chemicals Inc.Inventors: Rita Vos, Paul Mertens, Bernd Kolbesen, Albrecht Fester, Oliver Doll
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Patent number: 7226472Abstract: The present invention provides a catheter balloon having an advantageous cone design. In particular, the catheter balloon has at least one cone section with a volume in mm3 such that, when the ratio of one cone volume to the transverse cross-sectional area in mm2 of the inflated median section is at least about 2.1 mm. In certain applications, the advantageous cone design can assist in the preferential expansion of the cone sections prior to any significant expansion of the median section. The balloon can thus advantageously be utilized as a component of a balloon catheter or prosthesis delivery system, also provided via the present invention. When so utilized, the inventive balloon can assist in reducing any shifting of the balloon and/or prosthesis during inflation or delivery, respectively. Methods of utilizing the balloon catheters in dilation procedures, as well as the prosthesis delivery systems to deliver prosthesis, are also provided.Type: GrantFiled: October 15, 2002Date of Patent: June 5, 2007Assignee: Boston Scientific Scimed, Inc.Inventors: Gary John Pederson, Jr., Jan D. Seppala, John Robert Moberg, Steven Paul Mertens
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Patent number: 7224433Abstract: A method and apparatus for immersion lithography is described. The method includes positioning a semiconductor substrate under an optical immersion head assembly, providing an immersion liquid between the substrate and the optical immersion head assembly, and supplying a tensio-active gaseous substance along the perimeter of the contact area of the immersion liquid and the substrate. The immersion liquid contacts at least an area of the substrate. The tensio-active gaseous substance is chosen such that, when at least partially mixed with the immersion liquid, the mixture has a lower surface tension than the immersion liquid, thereby creating a surface tension gradient pulling the immersion liquid from the perimeter towards an inside portion of the contact area.Type: GrantFiled: July 1, 2005Date of Patent: May 29, 2007Assignee: Interuniversitair Microelektronica Centrum (IMEC)Inventors: Paul Mertens, Wim Fyen
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Patent number: 7160482Abstract: The present invention is related to a composition comprising an oxidizing compound and a complexing compound with the chemical formula wherein R1, R2, R3 and R4 are selected from the group consisting of H and any organic side chain. The oxidizing compound can be in the form of an aqueous solution. The complexing compound is for complexing metal ions. Metal ions can be present in the solution or in an external medium being contacted with the solution.Type: GrantFiled: December 21, 2001Date of Patent: January 9, 2007Assignees: IMEC vzw, Air Products and Chemicals, Inc.Inventors: Rita Vos, Paul Mertens, Albrecht Fester, Oliver Doll, Bernd Kolbesen