Patents by Inventor Paul Murphy

Paul Murphy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070113562
    Abstract: Methods and apparatus for fast starting and loading a combined cycle power system are described. In one example embodiment, the method includes loading the gas turbine at up to it's maximum rate, and loading the steam turbine at its maximum rate with excess steam bypassed to the condenser while maintaining the temperature of steam supplied to the steam turbine at a substantially constant temperature from initial steam admission into the steam turbine until all steam generated by the heat recovery steam generator is being admitted to the steam turbine while the gas turbine operates at up to maximum load.
    Type: Application
    Filed: November 18, 2005
    Publication date: May 24, 2007
    Inventors: Leroy Tomlinson, Charles Jones, Gordon Smith, Mark Steffen, Bruce Martindale, Marc Kazanas, Paul Murphy, Gurbaksh Ohson, Steven Shemo, Eric Fung
  • Patent number: 7173691
    Abstract: A method for calibrating and aligning a metrology system comprising a machine including multi-axis part-positioning means and a wavefront-measuring gauge embedded in the machine. The gauge is used in determining spatial relationships among the translational and rotational axes, between part surface coordinates and machine coordinates, and between machine coordinates embedded gauge coordinates; in calibrating various components of the machine and the embedded gauge; and in aligning itself to the machine. A complete method comprises the steps of coarsely aligning the machine rotary axes with their respective translational axes and setting nominal zero points for the rotary axes; aligning the embedded gauge mainframe to the machine axes; aligning the embedded gauge focal point onto a spindle axis; determining the spatial offsets between the rotary axes when so aligned; precisely aligning the machine rotary axes with their respective translational axes; and setting precise zero points for the rotary axes.
    Type: Grant
    Filed: December 22, 2003
    Date of Patent: February 6, 2007
    Assignee: QED Technologies International, Inc.
    Inventors: Paul Murphy, Jon Fleig, Greg Forbes
  • Publication number: 20070022301
    Abstract: A system and method for authenticating an online user by using different and independent communication services to enhance security. A key server validates the factors of authentication, namely a first factor (username/password) and a second factor (key). The key server generates and sends the key to the user with a different and independent communication service, e.g., telephone, SMS or email. The user then submits the key using the online communication service. A third factor, e.g., a second password or a biometric symbol of the user, can also be used. Validation of the biometric symbol can be a prerequisite to delivery of the key to the user. A plurality of the independent services can be daisy-chained.
    Type: Application
    Filed: July 14, 2006
    Publication date: January 25, 2007
    Inventors: J. Nicholson, Paul Murphy, Ivo Rothschild
  • Publication number: 20060289798
    Abstract: An angle measurement system for an ion beam includes a flag defining first and second features, wherein the second feature has a variable spacing from the first feature, a mechanism to translate the flag along a translation path so that the flag intercepts at least a portion of the ion beam, and a sensing device to detect the ion beam for different flag positions along the translation path and produce a sensor signal in response to the detected ion beam. The sensor signal and corresponding positions of the flag are representative of a vertical beam angle of the ion beam in a vertical plane. The sensing device may include a mask and a mechanism to translate the mask in order to define a beam current sensor on a portion of an associated Faraday sensor.
    Type: Application
    Filed: January 20, 2006
    Publication date: December 28, 2006
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: James Cummings, Joseph Olson, Arthur Clough, Eric Hermanson, Rosario Mollica, Paul Murphy, Mark Donahue
  • Publication number: 20060271336
    Abstract: An apparatus for diagnosing motor damping network integrity, the motor damping network configured for selective short-circuiting of the windings of a motor in a motor control system. The apparatus includes a motor controller with a motor drive portion thereof electrically isolated from the windings of the motor. A resonant network is based on the windings of the motor, the damping network, and a remaining non-isolated portion of the controller. An amplifier circuit applies an excitation signal to the resonant network. A detector circuit detects a response of the resonant network based on the excitation signal. A state of the damping network is determined based on the response.
    Type: Application
    Filed: May 26, 2005
    Publication date: November 30, 2006
    Inventor: Paul Murphy
  • Patent number: 7140847
    Abstract: The present invention relates to the integration of a TMP with the associated bypass line and valves so that a single sub-assembly is created. The housing of the TMP is significantly modified to accommodate the associated equipment necessary for constructing a high-vacuum system.
    Type: Grant
    Filed: August 11, 2004
    Date of Patent: November 28, 2006
    Assignee: The BOC Group, Inc.
    Inventors: Michael S. Boger, Daimhin Paul Murphy, Christopher M. Bailey, Yoshihiro Enomoto
  • Publication number: 20060258128
    Abstract: Substrate masking apparatus includes a platen assembly to support a substrate for processing, a mask having an aperture, a retaining mechanism to retain the mask in a masking position, and a positioning mechanism to change the relative positions of the mask and the substrate so that different areas of the substrate are exposed through the aperture in the mask. The apparatus may further include a mask loading mechanism to transfer the mask to and between the masking position and a non-masking position. The processing may include ion implantation of the substrate with different implant parameter values in different areas. In other embodiments, an area of the substrate to be processed is selectable by a mask, a shutter or a beam modifier in front of the substrate.
    Type: Application
    Filed: January 11, 2006
    Publication date: November 16, 2006
    Inventors: Peter Nunan, Anthony Renau, Alan Sheng, Paul Murphy, Kyu-Ha Shim, Charles Teodorczyk, Steven Anella, Samuel Barsky, Lawrence Ficarra, Richard Hertel
  • Publication number: 20060219936
    Abstract: An angle measurement system for an ion beam includes a flag defining first and second features, wherein the second feature has a variable spacing from the first feature, a mechanism to translate the flag along a translation path so that the flag intercepts at least a portion of the ion beam, and a sensing device to detect the ion beam for different flag positions along the translation path and produce a sensor signal having a first signal component representative of the first feature and a second signal component representative of the second feature. The first and second signal components and corresponding positions of the flag are representative of an angle of the ion beam in a direction orthogonal to the translation path. The sensing device may be a two-dimensional array of beam current sensors. The system may provide measurements of horizontal and vertical beam angles while translating the flag in only one direction.
    Type: Application
    Filed: April 5, 2005
    Publication date: October 5, 2006
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Joseph Olson, Eric Hermanson, Rosario Mollica, Paul Murphy
  • Publication number: 20060221350
    Abstract: A system comprising a plurality of methods for measuring surfaces or wavefronts from a test part with greatly improved accuracy, particularly the higher spatial frequencies on aspheres. These methods involve multiple measurements of a test part. One of the methods involves calibration and control of the focusing components of a metrology gauge in order to avoid loss of resolution and accuracy when the test part is repositioned with respect to the gauge. Other methods extend conventional averaging methods for suppressing the higher spatial-frequency structure in the gauge's inherent slope-dependent inhomogeneous bias. One of these methods involve averages that suppress the part's higher spatial-frequency structure so that the gauge's bias can be disambiguated; another method directly suppresses the gauge's bias within the measurements. All of the methods can be used in conjunction in a variety of configurations that are tailored to specific geometries and tasks.
    Type: Application
    Filed: April 5, 2006
    Publication date: October 5, 2006
    Inventors: Paul Murphy, Dragisha Miladinovic, Greg Forbes, Gary DeVries, Jon Fleig
  • Patent number: 7094373
    Abstract: A process and apparatus for air forming an article having a plurality of superimposed reinforced fibrous layers. The layers are formed in substantially discrete forming chambers by depositing fibrous materials on a forming surface which moves along a forming path through the chambers. A first layer is air-formed on the forming surface as the surface moves through the first forming chamber and a second layer is air-formed over the first layer as the surface moves through the second forming chamber. A reinforcing web is embedded in the article during the air-forming process.
    Type: Grant
    Filed: November 27, 2002
    Date of Patent: August 22, 2006
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: David W. Heyn, Susan J. Daniels, Derek Paul Murphy, Michael Barth Venturino
  • Publication number: 20060169915
    Abstract: Ion sources and methods for generating molecular ions in a cold operating mode and for generating atomic ions in a hot operating mode are provided. In some embodiments, first and second electron sources are located at opposite ends of an arc chamber. The first electron source is energized in the cold operating mode, and the second electron source is energized in the hot operating mode. In other embodiments, electrons are directed through a hole in a cathode in the cold operating mode and are directed at the cathode in the hot operating mode. In further embodiments, an ion beam generator includes a molecular ion source, an atomic ion source and a switching element to select the output of one of the ion sources.
    Type: Application
    Filed: November 8, 2005
    Publication date: August 3, 2006
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Joseph Olson, Anthony Renau, Donna Smatlak, Kurt Deckerlucke, Paul Murphy, Alexander Perel, Russell Low, Peter Kurunczi
  • Publication number: 20060171094
    Abstract: An apparatus is provided to improve clamping of a work piece to a support surface. The apparatus includes a support base, an insulator layer disposed on the support base, an electrode layer disposed on the insulator layer, and a clamping layer comprising aluminum oxynitride disposed on the electrode layer wherein the workpiece is clamped to the surface of the clamping layer. The apparatus provides a higher clamping force for the workpiece while reducing gas leakage and particle levels in addition to maintaining a declamping time suitable for high throughput processing. The apparatus may further provide a raised surface geometry or embossments on the dielectric or a dielectric comprising an outer ring a center cavity for reducing particle contamination to the backside of the workpiece.
    Type: Application
    Filed: October 31, 2005
    Publication date: August 3, 2006
    Inventors: Richard Muka, Paul Murphy, David Suuronen
  • Publication number: 20060124155
    Abstract: A technique for reducing backside particles is disclosed. In one particular exemplary embodiment, the technique may be realized as an apparatus for reducing backside particles. The apparatus may comprise a delivery mechanism configured to supply a cleaning substance to a platen, wherein the platen is housed in a process chamber. The apparatus may also comprise a control unit configured to cause the process chamber to reach a first pressure level, cause the cleaning substance to be supplied to a surface of the platen, and cause the process chamber to reach a second pressure level, thereby removing contaminant particles, together with the cleaning substance, from the surface of the platen.
    Type: Application
    Filed: September 30, 2005
    Publication date: June 15, 2006
    Inventors: David Suuronen, Arthur Riaf, Paul Buccos, Kevin Daniels, Paul Murphy, Lawrence Ficarra, Kenneth Starks
  • Publication number: 20060100955
    Abstract: An accounting system allows posting transactions to a general ledger of an Exchange Traded Fund. The accounting system includes a computer-assisted process that nets subscription and redemption orders that occurred over a particular time (e.g., one day) and records a transfer of securities into or out of the fund based on the net of the subscription and redemption orders.
    Type: Application
    Filed: September 21, 2005
    Publication date: May 11, 2006
    Inventors: Ronald Baldassini, Paul Murphy, Kirk Cleathero, Ian Johnson, Chip Russo, Timothy Hanifin, Gail Knudsen, James Boucher
  • Publication number: 20060012939
    Abstract: An apparatus is provided to improve clamping of a work piece to a support surface. The apparatus includes a support base, an insulator layer disposed on the support base, an electrode layer disposed on the insulator layer, and a clamping layer comprising aluminum oxynitride disposed on the electrode layer wherein the workpiece is clamped to the surface of the clamping layer. The apparatus provides a higher clamping force for the workpiece while reducing gas leakage and particle levels in addition to maintaining a declamping time suitable for high throughput processing. The apparatus may also include a support base, an insulator layer disposed on the support base, an electrode layer disposed on the insulator layer, and a clamping layer comprising a dielectric layer and a resilient material layer disposed on the electrode layer wherein the workpiece is clamped to the surface of the clamping layer.
    Type: Application
    Filed: April 8, 2005
    Publication date: January 19, 2006
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: David Suuronen, Paul Murphy
  • Patent number: 6982052
    Abstract: Process and apparatus for air forming an article having a plurality of superimposed fibrous layers. The layers are formed in substantially discrete forming chambers by depositing fibrous material on a forming surface which moves along an arcuate path through the chambers. A first layer is air-formed on the forming surface as the surface moves through the first forming chamber and a second layer is air-formed over the first layer as the surface moves through the second forming chamber.
    Type: Grant
    Filed: September 26, 2002
    Date of Patent: January 3, 2006
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Susan J. Daniels, David W. Heyn, Derek Paul Murphy, Michael Barth Venturino
  • Publication number: 20050280227
    Abstract: There is disclosed a storage bin (11) transportable by a wheelbarrow of the kind comprised of a load receptacle, a front support wheel and a pair of elongate handles spaced one to either side of the load receptacle and projecting rearwardly from the load receptacle, said storage bin (11) having front (18) and rear (19) walls connected by side walls (20) and a floor (21) defining a storage space (22), the side walls (20) being stepped so as to have outwardly extending downwardly facing shoulders (23) extending from front to rear of the bin such that the bin can be mounted on the handles of a wheelbarrow of the said kind so as to straddle the handles with the shoulders of its side walls resting on the handles and the parts (24) of the side walls below the shoulders projecting downwardly between the handles.
    Type: Application
    Filed: June 15, 2005
    Publication date: December 22, 2005
    Inventors: Paul Murphy, Stephen Lister
  • Patent number: 6956657
    Abstract: A method for accurately synthesizing a full-aperture data map from a series of overlapped sub-aperture data maps. In addition to conventional alignment uncertainties, a generalized compensation framework corrects a variety of errors, including compensators that are independent in each sub-aperture. Another class of compensators (interlocked) include coefficients that are the same across all the sub-apertures. A constrained least-squares optimization routine maximizes data consistency in sub-aperture overlap regions. The stitching algorithm includes constraints representative of the accuracies of the hardware to ensure that the results are within meaningful bounds. The constraints also enable the computation of estimates of uncertainties in the final results. The method therefore automatically calibrates the system, provides a full-aperture surface map, and an estimate of residual uncertainties.
    Type: Grant
    Filed: November 25, 2002
    Date of Patent: October 18, 2005
    Assignee: QED Technologies, Inc.
    Inventors: Donald Golini, Greg Forbes, Paul Murphy
  • Publication number: 20050228542
    Abstract: A method and system to calibrate a handler robot can include determining positions for stations between which the robot will transfer payloads, performing a transfer of a payload by the robot between the stations, measuring an offset and angle of the payload from the determined position of the station to which it was transferred and updating the determined position of that station based on the measured offset and angle.
    Type: Application
    Filed: October 1, 2004
    Publication date: October 13, 2005
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Stanley Stone, Paul Murphy
  • Publication number: 20050205211
    Abstract: A plasma immersion ion implant apparatus and method, and a plasma chamber, each configured to provide a uniform ion flux and to dissipate the effects of secondary electrons are disclosed. The invention includes a plasma chamber including a dielectric tophat configuration and a conductive top section that may be liquid cooled. In addition, the invention provides a radio frequency (RF) antenna configuration including an active antenna that is coupled to an RF source and a parasitic antenna that is not directly coupled to any RF source, but may be grounded. The RF antenna allows for tuning of the RF coupling.
    Type: Application
    Filed: March 22, 2004
    Publication date: September 22, 2005
    Inventors: Vikram Singh, Timothy Miller, Paul Murphy, Harold Persing, Jay Scheuer, Donna Smatlak, Edmund Winder, Robert Bettencourt