Patents by Inventor Paul P. Tesch
Paul P. Tesch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10192708Abstract: An electron emitter that consists of: a low work function material including Lanthanum hexaboride or Iridium Cerium that acts as an emitter, a cylinder base made of high work function material that has a cone shape where the low work function material is embedded in the high work function material but is exposed at end of the cone and the combined structure is heated and biased to a negative voltage relative to an anode, an anode electrode that has positive bias relative to the emitter, and a wehnelt electrode with an aperture where the cylindrical base protrudes through the wehnelt aperture so the end of the cone containing the emissive area is placed between the wehnelt and the anode.Type: GrantFiled: November 19, 2016Date of Patent: January 29, 2019Assignees: OREGON PHYSICS, LLC, APPLIED PHYSICS TECHNOLOGIES, INC.Inventors: Paul P. Tesch, Gerald G. Magera
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Publication number: 20180330909Abstract: In a plasma ion source having an induction coil adjacent to a reactor chamber for inductively coupling power into the plasma from a radio frequency power source and designed for negative and positive ion extraction, a method for operating the source according to the invention comprises providing radio frequency power to the induction coil with a RF amplifier operating with a variable frequency connected to a matching network mainly comprised of fixed value capacitors. In this device, the impedance between the RF power source and the plasma ion source is matched by tuning the RF frequency rather than adjusting the capacitance of the matching network. An option to use a RF power source utilizing lateral diffused metal oxide semiconductor field effect transistor based amplifiers is disclosed.Type: ApplicationFiled: May 15, 2017Publication date: November 15, 2018Inventors: Roderick W. Boswell, Noel S. Smith, Paul P. Tesch, Noel P. Martin, Philip J. Witham
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Patent number: 10128076Abstract: In a plasma ion source having an induction coil adjacent to a reactor chamber for inductively coupling power into the plasma from a radio frequency power source and designed for negative and positive ion extraction, a method for operating the source according to the invention comprises providing radio frequency power to the induction coil with a RF amplifier operating with a variable frequency connected to a matching network mainly comprised of fixed value capacitors. In this device, the impedance between the RF power source and the plasma ion source is matched by tuning the RF frequency rather than adjusting the capacitance of the matching network. An option to use a RF power source utilizing lateral diffused metal oxide semiconductor field effect transistor based amplifiers is disclosed.Type: GrantFiled: May 15, 2017Date of Patent: November 13, 2018Assignee: OREGON PHYSICS, LLCInventors: Roderick W. Boswell, Noel S. Smith, Paul P. Tesch, Noel P. Martin, Philip J. Witham
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Publication number: 20170148605Abstract: An electron emitter that consists of: a low work function material including Lanthanum hexaboride or Iridium Cerium that acts as an emitter, a cylinder base made of high work function material that has a cone shape where the low work function material is embedded in the high work function material but is exposed at end of the cone and the combined structure is heated and biased to a negative voltage relative to an anode, an anode electrode that has positive bias relative to the emitter, and a wehnelt electrode with an aperture where the cylindrical base protrudes through the wehnelt aperture so the end of the cone containing the emissive area is placed between the wehnelt and the anode.Type: ApplicationFiled: November 19, 2016Publication date: May 25, 2017Inventors: Paul P. Tesch, Gerald G. Magera
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Patent number: 9655223Abstract: In a plasma ion source having an induction coil adjacent to a reactor chamber for inductively coupling power into the plasma from a radio frequency power source and designed for negative and positive ion extraction, a method for operating the source according to the invention comprises providing radio frequency power to the induction coil with a RF amplifier operating with a variable frequency connected to a matching network mainly comprised of fixed value capacitors. In this device the impedance between the RF power source and the plasma ion source is matched by tuning the RF frequency rather than adjusting the capacitance of the matching network. An option to use a RF power source utilizing lateral diffused metal oxide semiconductor field effect transistor based amplifiers is disclosed.Type: GrantFiled: September 16, 2013Date of Patent: May 16, 2017Assignee: OREGON PHYSICS, LLCInventors: Noel S. Smith, Roderick W. Boswell, Paul P. Tesch, Noel P. Martin
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Patent number: 9401262Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.Type: GrantFiled: May 12, 2015Date of Patent: July 26, 2016Assignee: FEI COMPANYInventors: Noel Smith, Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, David William Tuggle
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Publication number: 20150318140Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.Type: ApplicationFiled: May 12, 2015Publication date: November 5, 2015Applicant: FEI CompanyInventors: Noel Smith, Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, David William Tuggle
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Patent number: 9029812Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.Type: GrantFiled: April 8, 2014Date of Patent: May 12, 2015Assignee: Fei CompanyInventors: Noel Smith, Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, David William Tuggle
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Publication number: 20140312245Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.Type: ApplicationFiled: April 8, 2014Publication date: October 23, 2014Applicant: FEI CompanyInventors: Noel Smith, Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, David William Tuggle
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Patent number: 8692217Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.Type: GrantFiled: March 26, 2013Date of Patent: April 8, 2014Assignee: FEI CompanyInventors: Noel Smith, Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, Dave Tuggle
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Publication number: 20140077699Abstract: In a plasma ion source having an induction coil adjacent to a reactor chamber for inductively coupling power into the plasma from a radio frequency power source and designed for negative and positive ion extraction, a method for operating the source according to the invention comprises providing radio frequency power to the induction coil with a RF amplifier operating with a variable frequency connected to a matching network mainly comprised of fixed value capacitors. In this device the impedance between the RF power source and the plasma ion source is matched by tuning the RF frequency rather than adjusting the capacitance of the matching network. An option to use a RF power source utilizing lateral diffused metal oxide semiconductor field effect transistor based amplifiers is disclosed.Type: ApplicationFiled: September 16, 2013Publication date: March 20, 2014Applicant: Oregon Physics, LLCInventors: Roderick W. Boswell, Noel S. Smith, Paul P. Tesch, Noel P. Martin
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Patent number: 8525419Abstract: A plasma source for processing or imaging a substrate, for ion source for proton therapy, for ion thrusters, or for high energy particle accelerators includes a coolant circuit passing adjacent to a plasma ion reactor chamber and RF antenna coils. In a method for operating the plasma ion source having an induction coil adjacent to a reaction chamber for inductively coupling power into the plasma from a radio frequency power source, the method comprises pumping a dielectric fluid into contact with induction coils of the plasma ion source along the coolant circuit. Use of the dielectric fluid both electrically insulates the plasma chamber, so that it can be biased to 30 kV and up, and efficiently transfers heat away from the plasma chamber.Type: GrantFiled: November 20, 2009Date of Patent: September 3, 2013Assignee: Oregon Physics, LLCInventors: Noel S. Smith, Noel P. Martin, Paul P. Tesch
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Patent number: 8405054Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.Type: GrantFiled: October 4, 2011Date of Patent: March 26, 2013Assignee: FEI CompanyInventors: Noel Smith, Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, Dave Tuggle
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Publication number: 20120080407Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.Type: ApplicationFiled: October 4, 2011Publication date: April 5, 2012Applicant: FEI COMPANYInventors: Noel Smith, Clive D. Chandler, Mark Utlaut, Paul P. Tesch, Dave Tuggle
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Patent number: 8076650Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.Type: GrantFiled: July 16, 2007Date of Patent: December 13, 2011Assignee: FEI CompanyInventors: Noel Smith, Clive D. Chandler, Mark Utlaut, Paul P. Tesch, Dave Tuggle
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Publication number: 20110163068Abstract: A multibeam system in which a charged particle beam and one or more additional beams can be directed to the target within a single vacuum chamber. A first beam colunm preferably produces a beam for rapid processing, and a second beam column produces a beam for more precise processing. A third beam column can be used to produce a beam useful for forming an image of the sample while producing little or no change in the sample.Type: ApplicationFiled: January 9, 2009Publication date: July 7, 2011Inventors: Mark Utlaut, Noel Smith, Paul P. Tesch, Tom Miller, David H. Narum, David Tuggle, Lawrence Scipioni
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Publication number: 20100126964Abstract: A plasma source for processing or imaging a substrate, for ion source for proton therapy, for ion thrusters, or for high energy particle accelerators includes a coolant circuit passing adjacent to a plasma ion reactor chamber and RF antenna coils. In a method for operating the plasma ion source having an induction coil adjacent to a reaction chamber for inductively coupling power into the plasma from a radio frequency power source, the method comprises pumping a dielectric fluid into contact with induction coils of the plasma ion source along the coolant circuit. Use of the dielectric fluid both electrically insulates the plasma chamber, so that it can be biased to 30 kV and up, and efficiently transfers heat away from the plasma chamber.Type: ApplicationFiled: November 20, 2009Publication date: May 27, 2010Applicant: OREGON PHYSICS, LLCInventors: Noel S. Smith, Noel P. Martin, Paul P. Tesch
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Publication number: 20090309018Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.Type: ApplicationFiled: July 16, 2007Publication date: December 17, 2009Applicant: Fei CompanyInventors: Noel Smith, Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, Dave Tuggle
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Patent number: 6949756Abstract: A method and apparatus for providing a shaped ion beam having low current density and sharp edges. The low current density and sharp edges eliminate the problem of overmilling, while permitting rapid ion beam processing. One method of producing the shaped beam is by using a two lens system, the first lens imaging the source onto the plane of the second lens and the second lens forming an image of the aperture onto the target plane. Another method is to greatly underfocus a chromatic aberration limited beam. Large beams having uniform current density and sharp edges can be produced. A knife edge beam, having a sharp edge can also be produced.Type: GrantFiled: January 19, 2001Date of Patent: September 27, 2005Assignee: FEI CompanyInventors: Robert L. Gerlach, Mark W. Utlaut, Paul P. Tesch, Richard J. Young, Clive D. Chandler, Karl D. van der Mast
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Patent number: 6797953Abstract: A charged particle beam system uses multiple electron columns to increase throughput. One or more multiple electron emitters are in one or more vacuum sealable gun chambers to allow the gun chamber to be replaced with electrons guns having emitters that have been previously conditioned so that the system does not need to be out of service to condition the newly installed emitters.Type: GrantFiled: February 22, 2002Date of Patent: September 28, 2004Assignee: FEI CompanyInventors: Robert L. Gerlach, Paul P. Tesch, Walter Skoczylas