Patents by Inventor Paul Penner

Paul Penner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacture of a multilayer structure
    Patent number: 10586651
    Abstract: Disclosed is a method for the manufacture of a multilayer structure comprising a first layer, a second layer and a third layer for example to form a capacitor. The multilayer structure comprises a first layer, a second layer and a third layer, wherein the first layer and the third layer each form at least one of at least two electrodes and comprise one or more pyrolyzed carbon nanomembranes or one or more layers of graphene, and the second layer is a dielectric comprising one or more carbon nanomembranes.
    Type: Grant
    Filed: February 7, 2019
    Date of Patent: March 10, 2020
    Assignee: CNM TECHNOLOGIES GMBH
    Inventors: Armin Goelzhaeuser, Andre' Beyer, Paul Penner, Xianghui Zhang
  • Method of Manufacture of a Multilayer Structure
    Publication number: 20190228910
    Abstract: Disclosed is a method for the manufacture of a multilayer structure comprising a first layer, a second layer and a third layer for example to form a capacitor. The multilayer structure comprises a first layer, a second layer and a third layer, wherein the first layer and the third layer each form at least one of at least two electrodes and comprise one or more pyrolyzed carbon nanomembranes or one or more layers of graphene, and the second layer is a dielectric comprising one or more carbon nanomembranes.
    Type: Application
    Filed: February 7, 2019
    Publication date: July 25, 2019
    Inventors: Armin Goelzhaeuser, Andre' Beyer, Paul Penner, Xianghui Zhang
  • Multilayer structure
    Patent number: 10229786
    Abstract: A multilayer structure comprising a first layer, a second layer and a third layer, a capacitor comprising at least one multilayer structure, a capacitor comprising at least two two-layer structures, a method of manufacture of the multilayer structure, a method of manufacture of the capacitor, a microelectronic device and an energy storage device comprising the capacitor. The multilayer structure comprises a first layer, a second layer and a third layer, wherein the first layer and the third layer each form at least one of at least two electrodes and comprise one or more pyrolyzed carbon nanomembranes or one or more layers of graphene, and the second layer is a dielectric comprising one or more carbon nanomembranes.
    Type: Grant
    Filed: June 26, 2015
    Date of Patent: March 12, 2019
    Assignee: CNM TECHNOLOGIES GMBH
    Inventors: Armin Goelzhaeuser, Andre' Beyer, Paul Penner, Xianghui Zhang
  • Multilayer Structure
    Publication number: 20170140873
    Abstract: A multilayer structure comprising a first layer, a second layer and a third layer, a capacitor comprising at least one multilayer structure, a capacitor comprising at least two two-layer structures, a method of manufacture of the multilayer structure, a method of manufacture of the capacitor, a microelectronic device and an energy storage device comprising the capacitor. The multilayer structure comprises a first layer, a second layer and a third layer, wherein the first layer and the third layer each form at least one of at least two electrodes and comprise one or more pyrolysed carbon nanomembranes or one or more layers of graphene, and the second layer is a dielectric comprising one or more carbon nanomembranes.
    Type: Application
    Filed: June 26, 2015
    Publication date: May 18, 2017
    Inventors: Armin Goelzhaeuser, Andre' Beyer, Paul Penner, Xianghui Zhang