Patents by Inventor Paul Petrus

Paul Petrus has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110005603
    Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.
    Type: Application
    Filed: June 22, 2010
    Publication date: January 13, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul Petrus Joannes Berkvens, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Matheus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Ruud Hendricus Martinus Johannes Bloks
  • Publication number: 20100290013
    Abstract: An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.
    Type: Application
    Filed: April 15, 2010
    Publication date: November 18, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christophe DE METSENAERE, Ronald Casper Kunst, Paul Petrus Joannes Berkvens, Mauritius Gerardus Elisabeth Schneiders, Jimmy Matheus Wilhelmus Van De Winkel, Gregory Martin Mason Corcoran
  • Patent number: 7826521
    Abstract: Rate adaptation is accurately provided by using an average SNR technique, a predicted PER technique, or an EVM to PER mapping technique. An average SNR is computed by averaging EVM values in a particular domain. Using the computed average SNR, an optimized rate is determined. The predicted PER technique includes computing EVM values for a current packet, determining an average BER using these EVM values for each data rate, determining an average SNR from this average BER, using the average SNR and a PER versus SNR curve to determine the predicted PER for each data rate, and using a data rate and the predicted PER to compute the predicted throughput for that data rate. In the last technique, an EVM is mapped to a packet error rate (PER) for each data rate. A throughput is computed for each data rate and PER. A data rate with a high throughput is selected.
    Type: Grant
    Filed: February 28, 2007
    Date of Patent: November 2, 2010
    Assignee: Atheros Communications, Inc.
    Inventors: Qinfang Sun, Paul Petrus
  • Publication number: 20100249373
    Abstract: A method of identifying a compound that modulates NCKX-mediated calcium ion exchange across a cell membrane, the method comprising the steps of providing an adherent cell, the cell membrane of which comprises a NCKX polypeptide or a functionally equivalent variant thereof, exposing the cell in suspension to a fluorescent calcium-sensitive dye, thereby causing intracellular uptake of the dye, settling the cell onto a solid support without allowing the cell to adhere to the solid support, exposing the cell to a test compound, exposing the cell to calcium and potassium ions, and measuring fluorescence from the intracellular calcium-sensitive dye after exposure of the cell to the test compound and the calcium and potassium ions, thereby to determine the rate and/or amount of calcium ion exchange across the cell membrane in the presence of the test compound.
    Type: Application
    Filed: November 11, 2008
    Publication date: September 30, 2010
    Inventors: Richard Martin Ogborne, Paul Petrus Marius Schnetkamp
  • Publication number: 20100149501
    Abstract: An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.
    Type: Application
    Filed: December 9, 2009
    Publication date: June 17, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Nicolaas Rudolf KEMPER, Robertus Nicodemus Jacobus Van Ballegoij, Marcus Martinus Petrus Adrianus Vermeulen, Michel Riepen, Martinus Wilhelmus Van Den Heuvel, Paul Petrus Joannes Berkvens, Christophe De Metsenaere, Jimmy Matheus Wilhelmus Van De Winkel, Cornelius Maria Rops
  • Patent number: 7710540
    Abstract: A position control system for a substrate support of a lithographic apparatus includes a position measurement system configured to determine a position of a sensor or sensor target on the substrate support, a controller configured to provide a control signal based on a desired position of a target portion of the substrate and the determined position, and one or more actuators configured to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, the stiffness compensation model including a relation between a difference in a change in position of the target portion and a change in position of the sensor or sensor target as a result of a force exerted on the substrate support. The position control system is configured to substantially correct at least during projection of a patterned radiation beam on the target portion, the position of the target portion using the stiffness compensation model.
    Type: Grant
    Filed: April 5, 2007
    Date of Patent: May 4, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Henrikus Herman Marie Cox, Jeroen Johannes Sophia Maria Mertens, Wilhelmus Franciscus Johannes Simons, Paul Petrus Joannes Berkvens
  • Publication number: 20090279062
    Abstract: A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.
    Type: Application
    Filed: May 7, 2009
    Publication date: November 12, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Daniel Jozef Maria DIRECKS, Danny Maria Hubertus PHILIPS, Clemens Johannes Gerardus VAN DEN DUNGEN, Maikel Adrianus Cornelis SCHEPERS, Paul Petrus Joannes BERKVENS, Koen STEFFENS, Arnold Jan VAN PUTTEN
  • Publication number: 20090181115
    Abstract: The invention provides a method of identifying compounds that either increase or decrease skin and/or hair pigmentation, the method comprising determining the ability of a test compound to modulate NCKX-mediated calcium ion movement across a membrane (e.g. NCKX5). The method may comprise the steps of exposing a membrane comprising a NCKX molecule or variant, fusion or derivative thereof to a test compound and measuring either directly or indirectly the calcium ion concentration on one or both sides of the membrane. The invention also relates to kits, nucleic acid molecules, polypeptides and cells useful in the method of the invention.
    Type: Application
    Filed: May 30, 2007
    Publication date: July 16, 2009
    Inventors: Wendy Filsell, Rebecca Susan Ginger, Martin Richard Green, Carl Dudley Jarman, Richard Martin Ogborne, Paul Petrus Marius Schnetkamp, Stephen Wilson
  • Patent number: 7519011
    Abstract: In one embodiment, the present invention includes a repeating frame for a time division radio communications system with a sequence of uplink slots each having a predetermined duration, a sequence of downlink slots, each having a predetermined duration that is greater than the duration of the uplink slots, an interburst guard time between each uplink slot, an interburst guard time between each downlink slot, and an interframe guard time after the sequence of downlink slots.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: April 14, 2009
    Assignee: Intel Corporation
    Inventors: Paul Petrus, Christopher R. Uhlik, Mitchell D. Trott
  • Publication number: 20090086175
    Abstract: A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.
    Type: Application
    Filed: September 25, 2008
    Publication date: April 2, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Roelof Frederik De Graaf, Johannes Catharinus Hubertus Mulkens, Marcel Beckers, Paul Petrus Joannes Berkvens, David Lucien Anstotz
  • Patent number: 7512109
    Abstract: In one embodiment, the present invention includes a slot in a repeating time division frame with a first training sequence, an information sequence after the first training sequence, and a second training sequence after the information sequence. In some embodiments either the first or the second training sequences indicates a type for the information sequence, such as a random access channel message and a traffic channel message, a configuration message, a channel assignment message, or a data traffic message.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: March 31, 2009
    Assignee: Intel Corporation
    Inventors: Mitchell D. Trott, Mithat C. Dogan, Paul Petrus, Sundar G. Sankaran
  • Publication number: 20090073395
    Abstract: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.
    Type: Application
    Filed: September 13, 2007
    Publication date: March 19, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Paul Petrus Joannes Berkvens, Roelof Frederik De Graaf, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul William Scholtes-Van Eijk, Gert-Jan Gerardus Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Spruytenburg, Joris Johan Verstraete
  • Publication number: 20090075616
    Abstract: A communication system environment estimation apparatus and method. In one embodiment, an environment estimation apparatus according to the teachings of the present invention includes a plurality of antenna elements and a receiver coupled to receive uplink signals from the plurality of antenna elements. The apparatus also includes a signal processor coupled to receive the uplink signals to select an estimation of an environment responsive to the uplink signals received from the plurality of antenna elements.
    Type: Application
    Filed: November 25, 2008
    Publication date: March 19, 2009
    Applicant: INTEL CORPORATION
    Inventor: Paul Petrus
  • Patent number: 7460835
    Abstract: A communication system environment estimation apparatus and method. In one embodiment, an environment estimation apparatus according to the teachings of the present invention includes a plurality of antenna elements and a receiver coupled to receive uplink signals from the plurality of antenna elements. The apparatus also includes a signal processor coupled to receive the uplink signals to select an estimation of an environment responsive to the uplink signals received from the plurality of antenna elements.
    Type: Grant
    Filed: September 22, 2000
    Date of Patent: December 2, 2008
    Assignee: ArrayComm LLC
    Inventor: Paul Petrus
  • Publication number: 20080246936
    Abstract: A position control system for a substrate support of a lithographic apparatus includes a position measurement system configured to determine a position of a sensor or sensor target on the substrate support, a controller configured to provide a control signal based on a desired position of a target portion of the substrate and the determined position, and one or more actuators configured to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, the stiffness compensation model including a relation between a difference in a change in position of the target portion and a change in position of the sensor or sensor target as a result of a force exerted on the substrate support. The position control system is configured to substantially correct at least during projection of a patterned radiation beam on the target portion, the position of the target portion using the stiffness compensation model.
    Type: Application
    Filed: April 5, 2007
    Publication date: October 9, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Henrikus Herman Marie Cox, Jeroen Johannes Sophia Maria Mertens, Wilhelmus Franciscus Johannes Simons, Paul Petrus Joannes Berkvens
  • Publication number: 20080212046
    Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
    Type: Application
    Filed: November 30, 2007
    Publication date: September 4, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Michel Riepen, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Josef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete
  • Patent number: 7389111
    Abstract: The present invention provides method and apparatus for facilitating base station selection/handover by a user terminal in a distributed (e.g., cellular-type) wireless communication system. In accordance with one aspect, hysteresis is adaptively determined as a function of the variance of receive signal strength fluctuations. In turn, an adaptive hysteresis factor can be obtained and used for a subsequent handover decision, for example, based on a cost function that takes into account the hysteresis. In accordance with another aspect, base station selection depends on a number of criteria, such as received signal strength, base station load, and estimated distance between a receiving user terminal and one or more base stations.
    Type: Grant
    Filed: June 25, 2003
    Date of Patent: June 17, 2008
    Assignee: ArrayComm, LLC
    Inventor: Paul Petrus
  • Patent number: 7362799
    Abstract: Embodiments of the present invention provide methods and apparatuses for determining a parameter value for each of a plurality of communication signals received concurrently as a composite signal. The parameter value of each communication signal is within a corresponding parameter value set. Each parameter value set is disjoint from every other parameter value set. The parameter value for a particular communication signal is estimated by searching over the parameter value set corresponding to the particular communication signal. For one embodiment, the composite signal is received at a base station receiver of a SMDA/TMDA system that includes an array of spatially distributed antenna elements. To recover multiple communication signals at once, an embodiment of the invention segments the timing search window into disjoint intervals and invokes an instance of a basic receiver module for each timing search window.
    Type: Grant
    Filed: June 27, 2002
    Date of Patent: April 22, 2008
    Assignee: ArrayComm LLC
    Inventor: Paul Petrus
  • Patent number: 7269389
    Abstract: According to an embodiment of the invention, a method and apparatus are described to receive a signal, determine a quality of the received signal, and transmit a power control message, with a selected size, to request a modification in transmission power, the power control message being based at least in part on the quality of the received signal.
    Type: Grant
    Filed: July 3, 2002
    Date of Patent: September 11, 2007
    Assignee: Arraycomm, LLC
    Inventors: Paul Petrus, Sundar G. Sankaran
  • Patent number: 7257101
    Abstract: According to an embodiment of the invention, a method and apparatus are described to receive a signal, determine a quality of the received signal, and transmit a power control message, with a selected size, the power control message being based at least in part on the quality of the received signal. The power control message requests a modification in transmission power or indicates the deviation of the signal quality from a reference signal quality.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: August 14, 2007
    Assignee: Arraycomm, LLC
    Inventors: Paul Petrus, Sundar G. Sankaran