Patents by Inventor Paul Ruengrit Pinsukanjana

Paul Ruengrit Pinsukanjana has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6075588
    Abstract: An integrated dual beam multi-channel optical-based flux monitor and method of monitoring atomic absorption of a plurality of atomic species during epitaxial growth. Light from multiple sources is simultaneously passed through a region of deposition of material such that atomic absorption takes place. The light that passed through the region is then compared to light in a reference arm that did not pass through a region of atomic absorption. From this comparison the growth of an epitaxial layer can be carefully controlled.
    Type: Grant
    Filed: May 31, 1996
    Date of Patent: June 13, 2000
    Assignee: The Regents of the University of California
    Inventors: Paul Ruengrit Pinsukanjana, Arthur Charles Gossard, Andrew William Jackson, Jan Arild Tofte, Scott Arlen Chalmers
  • Patent number: 6038017
    Abstract: An integrated dual beam multi-channel optical-based flux monitor and method of monitoring atomic absorption of a plurality of atomic species during epitaxial deposition. Light from multiple sources is simultaneously passed through a region of deposition of material such that atomic absorption takes place. The light that passed through the region is then compared to light in a reference arm that did not pass through a region of atomic absorption. From this comparison the deposition of an epitaxial layer can be carefully monitored and controlled.
    Type: Grant
    Filed: April 22, 1999
    Date of Patent: March 14, 2000
    Inventors: Paul Ruengrit Pinsukanjana, Arthur Charles Gossard, Andrew William Jackson, Jan Arild Tofte, John H. English
  • Patent number: 5936716
    Abstract: An integrated dual beam multi-channel optical-based flux monitor and method of monitoring atomic absorption of a plurality of atomic species during epitaxial deposition. Light from multiple sources is simultaneously passed through a region of deposition of material such that atomic absorption takes place. The light that passed through the region is then compared to light in a reference arm that did not pass through a region of atomic absorption. From this comparison the deposition of an epitaxial layer can be carefully monitored and controlled.
    Type: Grant
    Filed: February 27, 1997
    Date of Patent: August 10, 1999
    Inventors: Paul Ruengrit Pinsukanjana, Arthur Charles Gossard, Andrew William Jackson, Jan Arild Tofte, John H. English