Patents by Inventor Paul van Dijk

Paul van Dijk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200218169
    Abstract: Methods and associated apparatus for reconstructing a free-form geometry of a substrate, the method including: positioning the substrate on a substrate holder configured to retain the substrate under a retaining force that deforms the substrate from its free-form geometry; measuring a height map of the deformed substrate; and reconstructing the free-form geometry of the deformed substrate based on an expected deformation of the substrate by the retaining force and the measured height map.
    Type: Application
    Filed: August 8, 2018
    Publication date: July 9, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Richard Johannes Franciscus VAN HAREN, Leon Paul VAN DIJK, IIya MALAKHOVSKY, Ronald Henricus Johannes OTTEN, Mahdi SADEGHINIA
  • Publication number: 20200050117
    Abstract: A method and control system for determining stress in a substrate. The method includes determining a measured position difference between a measured position of at least one first feature and a measured position of at least one second feature which have been applied on a substrate, and determining local stress in the substrate from the measured position difference.
    Type: Application
    Filed: February 7, 2018
    Publication date: February 13, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Richard Johannes Franciscus VAN HAREN, Leon Paul VAN DIJK, Ilya MALAKHOVSKY, Ronald Henricus Johannes OTTEN
  • Patent number: 10545410
    Abstract: A lithographic process includes clamping a substrate onto a substrate support, measuring positions across the clamped substrate, and applying a pattern to the clamped substrate using the positions measured. A correction is applied to the positioning of the applied pattern in localized regions of the substrate, based on recognition of a warp-induced characteristic in the positions measured across the substrate. The correction may be generated by inferring one or more shape characteristics of the warped substrate using the measured positions and other information. Based on the one or more inferred shape characteristics, a clamping model is applied to simulate deformation of the warped substrate in response to clamping. A correction is calculated based on the simulated deformation.
    Type: Grant
    Filed: February 7, 2017
    Date of Patent: January 28, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Hakki Ergun Cekli, Masashi Ishibashi, Leon Paul Van Dijk, Richard Johannes Franciscus Van Haren, Xing Lan Liu, Reiner Maria Jungblut, Cedric Marc Affentauschegg, Ronald Henricus Johannes Otten
  • Patent number: 10474045
    Abstract: A method of characterizing a deformation of a plurality of substrates is described. The method includes: measuring, for a plurality of n different alignment measurement parameters ? and for a plurality of substrates, a position of the alignment marks; determining a positional deviation as the difference between the n alignment mark position measurements and a nominal alignment mark position; grouping the positional deviations into data sets; determining an average data set; subtracting the average data set from the data sets to obtain a plurality of variable data sets; performing a blind source separation method on the variable data sets, thereby decomposing the variable data sets into a set of eigenwafers representing principal components of the variable data sets; and subdividing the set of eigenwafers into a set of mark deformation eigenwafers and a set of substrate deformation eigenwafers.
    Type: Grant
    Filed: June 28, 2016
    Date of Patent: November 12, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Franciscus Godefridus Casper Bijnen, Arie Jeffrey Den Boef, Richard Johannes Franciscus Van Haren, Patricius Aloysius Jacobus Tinnemans, Alexander Ypma, Irina Anatolievna Lyulina, Edo Maria Hulsebos, Hakki Ergün Cekli, Xing Lan Liu, Loek Johannes Petrus Verhees, Victor Emanuel Calado, Leon Paul Van Dijk
  • Publication number: 20190294059
    Abstract: A method of determining a pellicle compensation correction which compensates for a distortion of a patterning device resultant from mounting of a pellicle onto the patterning device. The method includes determining a pellicle induced distortion from a first shape associated with the patterning device without the pellicle mounted and a second shape associated with the patterning device with the pellicle mounted, the pellicle induced distortion describing the distortion of the patterning device due to the pellicle being mounted. The determined pellicle induced distortion is then used to calculate the pellicle compensation correction for a lithographic exposure step using the patterning device.
    Type: Application
    Filed: May 16, 2017
    Publication date: September 26, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Leon Paul VAN DIJK, Victor Emanuel CALADO, Willem Seine Christian ROELOFS, Richard Johannes Franciscus VAN HAREN
  • Publication number: 20190285992
    Abstract: A method to change an etch parameter of a substrate etching process, the method including: making a first measurement of a first metric associated with a structure on a substrate before being etched; making a second measurement of a second metric associated with a structure on a substrate after being etched; and changing the etch parameter based on a difference between the first measurement and the second measurement.
    Type: Application
    Filed: November 6, 2017
    Publication date: September 19, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Richard Johannes Franciscus VAN HAREN, Victor Emanuel CALADO, Leon Paul VAN DIJK, Roy WERKMAN, Everhardus Cornelis MOS, Jochem Sebastiaan WILDENBERG, Marinus JOCHEMSEN, Bijoy RAJASEKHARAN, Erik JENSEN, Adam Jan URBANCZYK
  • Publication number: 20190250523
    Abstract: A method of determining an optimal operational parameter setting of a metrology system is described. Free-form substrate shape measurements are performed. A model is applied, transforming the measured warp to modeled warp scaling values. Substrates are clamped to a chuck, causing substrate deformation. Alignment marks of the substrates are measured using an alignment system with four alignment measurement colors. Scaling values thus obtained are corrected with the modeled warp scaling values to determine corrected scaling values. An optimal alignment measurement color is determined, based on the corrected scaling values. Optionally, scaling values are selected that were measured using the optimal alignment measurement color and a substrate grid is determined using the selected scaling values. A substrate may be exposed using the determined substrate grid to correct exposure of the substrate.
    Type: Application
    Filed: October 17, 2017
    Publication date: August 15, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Leon Paul VAN DIJK, Victor Emanuel CALADO, Xing Lan LIU, Richard Johannes Franciscus VAN HAREN
  • Publication number: 20190079411
    Abstract: A lithographic process includes clamping a substrate onto a substrate support, measuring positions across the clamped substrate, and applying a pattern to the clamped substrate using the positions measured. A correction is applied to the positioning of the applied pattern in localized regions of the substrate, based on recognition of a warp-induced characteristic in the positions measured across the substrate. The correction may be generated by inferring one or more shape characteristics of the warped substrate using the measured positions and other information. Based on the one or more inferred shape characteristics, a clamping model is applied to simulate deformation of the warped substrate in response to clamping. A correction is calculated based on the simulated deformation.
    Type: Application
    Filed: February 7, 2017
    Publication date: March 14, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hakki Ergun CEKLI, Masashi ISHIBASHI, Leon Paul VAN DIJK, Richard Johannes Franciscus VAN HAREN, Xing Lan LIU, Reiner Maria JUNGBLUT, Cedric Marc AFFENTAUSCHEGG, Ronald Henricus Johannes OTTEN
  • Publication number: 20190041758
    Abstract: A method for determining a mechanical property of a layer applied to a substrate and associated control system for controlling a lithographic process. The method includes obtaining measured out-of-plane deformation of the substrate, the out-of-plane deformation including deformation normal to a substrate plane defined by, or parallel to, a substrate surface. The measured out-of-plane deformation is fitted to a second order polynomial in two coordinates associated with the substrate plane and the mechanical property (e.g. anisotropic Young's moduli) of the layer is determined based on characteristics of the fitted second order polynomial. The mechanical property of the layer can be used to calibrate an in-plane distortion model of the substrate for predicting in-plane distortion based on the measured out-of-plane deformation.
    Type: Application
    Filed: July 18, 2018
    Publication date: February 7, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Leon Paul VAN DIJK, Mahdi SADEGHINIA, Richard Johannes Franciscus VAN HAREN, Ilya MALAKHOVSKY, Ronald Henricus Johannes OTTEN
  • Publication number: 20180149205
    Abstract: A spherical roller bearing having an inner ring, an outer ring, first and second roller sets disposed therebetween, and a guide element for guiding the rollers of at least one roller set. The guide element is rotational about a bearing axis of rotation during bearing operation. The bearing further includes a generator, arranged between the first and second roller sets, which includes a magnetic rotor with alternating polarities in circumferential direction and a stator having at least one stator coil. The magnetic rotor is mounted to the guide element, while the stator is mounted to a common outer raceway of the outer ring, radially opposite from the magnetic rotor. In accordance with the invention, the stator has the form of an annular band. The at least one stator coil is formed by a flat conductor provided on a flexible printed circuit board.
    Type: Application
    Filed: November 29, 2017
    Publication date: May 31, 2018
    Inventors: Nicolaas Simon Willem Den Haak, Georgo Angelis, Paul van Dijk
  • Patent number: 8243453
    Abstract: Cooling arrangement for an electrically conductive element in an electrical installation. A casting body (3) is provided for electrically isolating the electrically conductive element (2). The casting body has an outer wall, part of which forms a contact surface 5 (5) for contact with a heat conducting surface (1) of the electrical installation. The outer wall of the casting body (3) is provided with an electrically conductive layer (4; 7) at its outer surface.
    Type: Grant
    Filed: April 16, 2008
    Date of Patent: August 14, 2012
    Assignee: Eaton Electric B.V.
    Inventors: Marcel Berend Paul Van Dijk, Arend Jan Willem Lammers, Gerard Cornelis Schoonenberg, Frederik Paul Schoten, Johannes Josephus Gerardus Van Thiel, Brad Robert Leccia
  • Patent number: 8242399
    Abstract: An operating mechanism operates a multi-pole circuit breaker assembly. For each circuit breaker in the multi-pole circuit breaker assembly, the following elements are provided: a connection assembly for connection to an operating shaft of the circuit breaker, an actuator for changing between an ON and OFF state of the operating mechanism, a translation assembly for transferring a movement of the actuator to the connection assembly, and a compression spring exerting a force on the operating shaft in the ON state of the operating mechanism. The force exerted by the compression spring is adjustable by a force setting assembly in a continuous manner.
    Type: Grant
    Filed: September 11, 2008
    Date of Patent: August 14, 2012
    Assignee: Eaton Electric B.V.
    Inventors: Marcel Berend Paul van Dijk, Gerhardus Leonardus Nitert, Ronald Johannes Wilms
  • Publication number: 20100188819
    Abstract: Cooling arrangement for an electrically conductive element in an electrical installation. A casting body (3) is provided for electrically isolating the electrically conductive element (2). The casting body has an outer wall, part of which forms a contact surface 5 (5) for contact with a heat conducting surface (1) of the electrical installation. The outer wall of the casting body (3) is provided with an electrically conductive layer (4; 7) at its outer surface.
    Type: Application
    Filed: April 16, 2008
    Publication date: July 29, 2010
    Applicant: EATON ELECTRIC B.V.
    Inventors: Marcel Berend Paul Van Dijk, Arend Jan Willem Lammers, Gerard Cornelis schoonenberg, Frederik Paul Schoten, Johannes Josephus Gerardus Van Thiel, Brad Robert Leccia
  • Publication number: 20090071811
    Abstract: An operating mechanism operates a multi-pole circuit breaker assembly. For each circuit breaker in the multi-pole circuit breaker assembly, the following elements are provided: a connection assembly for connection to an operating shaft of the circuit breaker, an actuator for changing between an ON and OFF state of the operating mechanism, a translation assembly for transferring a movement of the actuator to the connection assembly, and a compression spring exerting a force on the operating shaft in the ON state of the operating mechanism. The force exerted by the compression spring is adjustable by a force setting assembly in a continuous manner.
    Type: Application
    Filed: September 11, 2008
    Publication date: March 19, 2009
    Applicant: Eaton Electrics B.V.
    Inventors: MARCEL BEREND PAUL van DIJK, GERHARDUS LEONARDUS NITERT, RONALD JOHANNES WILMS
  • Publication number: 20050227890
    Abstract: The present invention relates to a detergent composition comprising colored particles which are added at such a particle size, color and level that they are not noticeable to consumers. Such colored particle are added at less than 0.5% by weight of the total detergent composition and are characterized by Particle Size Distribution between 250 and 1250 ?m, and by a Hunter color L value greater of from 40 to 100. The colored particle comprises a colored detergent ingredient which is a hueing agent.
    Type: Application
    Filed: April 8, 2005
    Publication date: October 13, 2005
    Applicant: The Procter & Gamble Company
    Inventors: Paul Van Dijk, Serge Thooft
  • Patent number: 5663136
    Abstract: A process for the continuous preparation of a granular detergent composition or component having a bulk density greater than 650 g/l which comprises the steps of: i) dispersing a detergent active paste throughout a powder stream in a high speed mixer with a residence time of from 2 seconds to 30 seconds, ii) forming an agglomerate in a moderate speed mixer/agglomerator with a residence time of less than 2 minutes, in which, optionally, a finely divided powder may be added, iii) drying and/or cooling. Granular detergent compositions which are made by this process, and which have excellent solubility properties especially with respect to dispensing and rate of dissolution are also described.
    Type: Grant
    Filed: January 30, 1995
    Date of Patent: September 2, 1997
    Assignee: The Procter & Gamble Company
    Inventors: Paul Van Dijk, Jose Luis Vega, Haydn Guy William Dickenson
  • Patent number: 5529710
    Abstract: A high active detergent paste composition which is suitable for making detergent granules which have an excellent white appearance making them suitable for use in consumer products. The paste compositions comprise a dye or optical brightener.
    Type: Grant
    Filed: January 13, 1995
    Date of Patent: June 25, 1996
    Assignee: The Procter & Gamble Company
    Inventors: Paul Van Dijk, Jose L. Vega, Benny De Ryck
  • Patent number: 5486303
    Abstract: A process for preparing high density detergent agglomerates having a density of at least 650 g/l is provided. The process comprises the steps of: (a) charging a viscous surfactant paste into a mixer/densifier wherein the surfactant paste has a viscosity of from about 5,000 cps to about 100,000 cps and contains at least about 5% water; (b) adding from about 1% to about 70% of an anhydrous material into the surfactant paste just prior to entrance into the mixer/densifier to absorb at least a minor amount of the water from the surfactant paste; and (c) agglomerating the surfactant paste and the anhydrous material in the mixer/densifier so as to form detergent agglomerates having a density of at least about 650 g/l. The detergent agglomerates have high surfactant levels.
    Type: Grant
    Filed: August 3, 1994
    Date of Patent: January 23, 1996
    Assignee: The Procter & Gamble Company
    Inventors: Scott W. Capeci, James W. Osborn, Adrian J. W. Angell, Paul van Dijk
  • Patent number: 5366652
    Abstract: A process for preparing high density detergent agglomerates having a density of at least 650 g/l is provided. The process comprises the steps of: (a) charging a viscous surfactant paste into a mixer/densifier wherein the surfactant paste has a viscosity of from about 10,000 cps to about 100,000 cps and contains at least about 10% water; (b) adding from about 1% to about 20% of an anhydrous material into the surfactant paste just prior to entrance into the mixer/densifier to absorb at least a minor amount of the water from the surfactant paste; and (c) agglomerating the surfactant paste and the anhydrous material in the mixer/densifier so as to form detergent agglomerates having a density of at least about 650 g/l. The detergent agglomerates have high surfactant levels.
    Type: Grant
    Filed: August 27, 1993
    Date of Patent: November 22, 1994
    Assignee: The Procter & Gamble Company
    Inventors: Scott W. Capeci, James W. Osborn, Adrian J. W. Angell, Paul van Dijk