Patents by Inventor Paul van Dijk
Paul van Dijk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200218169Abstract: Methods and associated apparatus for reconstructing a free-form geometry of a substrate, the method including: positioning the substrate on a substrate holder configured to retain the substrate under a retaining force that deforms the substrate from its free-form geometry; measuring a height map of the deformed substrate; and reconstructing the free-form geometry of the deformed substrate based on an expected deformation of the substrate by the retaining force and the measured height map.Type: ApplicationFiled: August 8, 2018Publication date: July 9, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Richard Johannes Franciscus VAN HAREN, Leon Paul VAN DIJK, IIya MALAKHOVSKY, Ronald Henricus Johannes OTTEN, Mahdi SADEGHINIA
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Publication number: 20200050117Abstract: A method and control system for determining stress in a substrate. The method includes determining a measured position difference between a measured position of at least one first feature and a measured position of at least one second feature which have been applied on a substrate, and determining local stress in the substrate from the measured position difference.Type: ApplicationFiled: February 7, 2018Publication date: February 13, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Richard Johannes Franciscus VAN HAREN, Leon Paul VAN DIJK, Ilya MALAKHOVSKY, Ronald Henricus Johannes OTTEN
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Patent number: 10545410Abstract: A lithographic process includes clamping a substrate onto a substrate support, measuring positions across the clamped substrate, and applying a pattern to the clamped substrate using the positions measured. A correction is applied to the positioning of the applied pattern in localized regions of the substrate, based on recognition of a warp-induced characteristic in the positions measured across the substrate. The correction may be generated by inferring one or more shape characteristics of the warped substrate using the measured positions and other information. Based on the one or more inferred shape characteristics, a clamping model is applied to simulate deformation of the warped substrate in response to clamping. A correction is calculated based on the simulated deformation.Type: GrantFiled: February 7, 2017Date of Patent: January 28, 2020Assignee: ASML Netherlands B.V.Inventors: Hakki Ergun Cekli, Masashi Ishibashi, Leon Paul Van Dijk, Richard Johannes Franciscus Van Haren, Xing Lan Liu, Reiner Maria Jungblut, Cedric Marc Affentauschegg, Ronald Henricus Johannes Otten
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Patent number: 10474045Abstract: A method of characterizing a deformation of a plurality of substrates is described. The method includes: measuring, for a plurality of n different alignment measurement parameters ? and for a plurality of substrates, a position of the alignment marks; determining a positional deviation as the difference between the n alignment mark position measurements and a nominal alignment mark position; grouping the positional deviations into data sets; determining an average data set; subtracting the average data set from the data sets to obtain a plurality of variable data sets; performing a blind source separation method on the variable data sets, thereby decomposing the variable data sets into a set of eigenwafers representing principal components of the variable data sets; and subdividing the set of eigenwafers into a set of mark deformation eigenwafers and a set of substrate deformation eigenwafers.Type: GrantFiled: June 28, 2016Date of Patent: November 12, 2019Assignee: ASML Netherlands B.V.Inventors: Franciscus Godefridus Casper Bijnen, Arie Jeffrey Den Boef, Richard Johannes Franciscus Van Haren, Patricius Aloysius Jacobus Tinnemans, Alexander Ypma, Irina Anatolievna Lyulina, Edo Maria Hulsebos, Hakki Ergün Cekli, Xing Lan Liu, Loek Johannes Petrus Verhees, Victor Emanuel Calado, Leon Paul Van Dijk
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Publication number: 20190294059Abstract: A method of determining a pellicle compensation correction which compensates for a distortion of a patterning device resultant from mounting of a pellicle onto the patterning device. The method includes determining a pellicle induced distortion from a first shape associated with the patterning device without the pellicle mounted and a second shape associated with the patterning device with the pellicle mounted, the pellicle induced distortion describing the distortion of the patterning device due to the pellicle being mounted. The determined pellicle induced distortion is then used to calculate the pellicle compensation correction for a lithographic exposure step using the patterning device.Type: ApplicationFiled: May 16, 2017Publication date: September 26, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Leon Paul VAN DIJK, Victor Emanuel CALADO, Willem Seine Christian ROELOFS, Richard Johannes Franciscus VAN HAREN
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Publication number: 20190285992Abstract: A method to change an etch parameter of a substrate etching process, the method including: making a first measurement of a first metric associated with a structure on a substrate before being etched; making a second measurement of a second metric associated with a structure on a substrate after being etched; and changing the etch parameter based on a difference between the first measurement and the second measurement.Type: ApplicationFiled: November 6, 2017Publication date: September 19, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Richard Johannes Franciscus VAN HAREN, Victor Emanuel CALADO, Leon Paul VAN DIJK, Roy WERKMAN, Everhardus Cornelis MOS, Jochem Sebastiaan WILDENBERG, Marinus JOCHEMSEN, Bijoy RAJASEKHARAN, Erik JENSEN, Adam Jan URBANCZYK
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Publication number: 20190250523Abstract: A method of determining an optimal operational parameter setting of a metrology system is described. Free-form substrate shape measurements are performed. A model is applied, transforming the measured warp to modeled warp scaling values. Substrates are clamped to a chuck, causing substrate deformation. Alignment marks of the substrates are measured using an alignment system with four alignment measurement colors. Scaling values thus obtained are corrected with the modeled warp scaling values to determine corrected scaling values. An optimal alignment measurement color is determined, based on the corrected scaling values. Optionally, scaling values are selected that were measured using the optimal alignment measurement color and a substrate grid is determined using the selected scaling values. A substrate may be exposed using the determined substrate grid to correct exposure of the substrate.Type: ApplicationFiled: October 17, 2017Publication date: August 15, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Leon Paul VAN DIJK, Victor Emanuel CALADO, Xing Lan LIU, Richard Johannes Franciscus VAN HAREN
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Publication number: 20190079411Abstract: A lithographic process includes clamping a substrate onto a substrate support, measuring positions across the clamped substrate, and applying a pattern to the clamped substrate using the positions measured. A correction is applied to the positioning of the applied pattern in localized regions of the substrate, based on recognition of a warp-induced characteristic in the positions measured across the substrate. The correction may be generated by inferring one or more shape characteristics of the warped substrate using the measured positions and other information. Based on the one or more inferred shape characteristics, a clamping model is applied to simulate deformation of the warped substrate in response to clamping. A correction is calculated based on the simulated deformation.Type: ApplicationFiled: February 7, 2017Publication date: March 14, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Hakki Ergun CEKLI, Masashi ISHIBASHI, Leon Paul VAN DIJK, Richard Johannes Franciscus VAN HAREN, Xing Lan LIU, Reiner Maria JUNGBLUT, Cedric Marc AFFENTAUSCHEGG, Ronald Henricus Johannes OTTEN
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Publication number: 20190041758Abstract: A method for determining a mechanical property of a layer applied to a substrate and associated control system for controlling a lithographic process. The method includes obtaining measured out-of-plane deformation of the substrate, the out-of-plane deformation including deformation normal to a substrate plane defined by, or parallel to, a substrate surface. The measured out-of-plane deformation is fitted to a second order polynomial in two coordinates associated with the substrate plane and the mechanical property (e.g. anisotropic Young's moduli) of the layer is determined based on characteristics of the fitted second order polynomial. The mechanical property of the layer can be used to calibrate an in-plane distortion model of the substrate for predicting in-plane distortion based on the measured out-of-plane deformation.Type: ApplicationFiled: July 18, 2018Publication date: February 7, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Leon Paul VAN DIJK, Mahdi SADEGHINIA, Richard Johannes Franciscus VAN HAREN, Ilya MALAKHOVSKY, Ronald Henricus Johannes OTTEN
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Publication number: 20180149205Abstract: A spherical roller bearing having an inner ring, an outer ring, first and second roller sets disposed therebetween, and a guide element for guiding the rollers of at least one roller set. The guide element is rotational about a bearing axis of rotation during bearing operation. The bearing further includes a generator, arranged between the first and second roller sets, which includes a magnetic rotor with alternating polarities in circumferential direction and a stator having at least one stator coil. The magnetic rotor is mounted to the guide element, while the stator is mounted to a common outer raceway of the outer ring, radially opposite from the magnetic rotor. In accordance with the invention, the stator has the form of an annular band. The at least one stator coil is formed by a flat conductor provided on a flexible printed circuit board.Type: ApplicationFiled: November 29, 2017Publication date: May 31, 2018Inventors: Nicolaas Simon Willem Den Haak, Georgo Angelis, Paul van Dijk
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Patent number: 8243453Abstract: Cooling arrangement for an electrically conductive element in an electrical installation. A casting body (3) is provided for electrically isolating the electrically conductive element (2). The casting body has an outer wall, part of which forms a contact surface 5 (5) for contact with a heat conducting surface (1) of the electrical installation. The outer wall of the casting body (3) is provided with an electrically conductive layer (4; 7) at its outer surface.Type: GrantFiled: April 16, 2008Date of Patent: August 14, 2012Assignee: Eaton Electric B.V.Inventors: Marcel Berend Paul Van Dijk, Arend Jan Willem Lammers, Gerard Cornelis Schoonenberg, Frederik Paul Schoten, Johannes Josephus Gerardus Van Thiel, Brad Robert Leccia
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Patent number: 8242399Abstract: An operating mechanism operates a multi-pole circuit breaker assembly. For each circuit breaker in the multi-pole circuit breaker assembly, the following elements are provided: a connection assembly for connection to an operating shaft of the circuit breaker, an actuator for changing between an ON and OFF state of the operating mechanism, a translation assembly for transferring a movement of the actuator to the connection assembly, and a compression spring exerting a force on the operating shaft in the ON state of the operating mechanism. The force exerted by the compression spring is adjustable by a force setting assembly in a continuous manner.Type: GrantFiled: September 11, 2008Date of Patent: August 14, 2012Assignee: Eaton Electric B.V.Inventors: Marcel Berend Paul van Dijk, Gerhardus Leonardus Nitert, Ronald Johannes Wilms
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Publication number: 20100188819Abstract: Cooling arrangement for an electrically conductive element in an electrical installation. A casting body (3) is provided for electrically isolating the electrically conductive element (2). The casting body has an outer wall, part of which forms a contact surface 5 (5) for contact with a heat conducting surface (1) of the electrical installation. The outer wall of the casting body (3) is provided with an electrically conductive layer (4; 7) at its outer surface.Type: ApplicationFiled: April 16, 2008Publication date: July 29, 2010Applicant: EATON ELECTRIC B.V.Inventors: Marcel Berend Paul Van Dijk, Arend Jan Willem Lammers, Gerard Cornelis schoonenberg, Frederik Paul Schoten, Johannes Josephus Gerardus Van Thiel, Brad Robert Leccia
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Publication number: 20090071811Abstract: An operating mechanism operates a multi-pole circuit breaker assembly. For each circuit breaker in the multi-pole circuit breaker assembly, the following elements are provided: a connection assembly for connection to an operating shaft of the circuit breaker, an actuator for changing between an ON and OFF state of the operating mechanism, a translation assembly for transferring a movement of the actuator to the connection assembly, and a compression spring exerting a force on the operating shaft in the ON state of the operating mechanism. The force exerted by the compression spring is adjustable by a force setting assembly in a continuous manner.Type: ApplicationFiled: September 11, 2008Publication date: March 19, 2009Applicant: Eaton Electrics B.V.Inventors: MARCEL BEREND PAUL van DIJK, GERHARDUS LEONARDUS NITERT, RONALD JOHANNES WILMS
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Publication number: 20050227890Abstract: The present invention relates to a detergent composition comprising colored particles which are added at such a particle size, color and level that they are not noticeable to consumers. Such colored particle are added at less than 0.5% by weight of the total detergent composition and are characterized by Particle Size Distribution between 250 and 1250 ?m, and by a Hunter color L value greater of from 40 to 100. The colored particle comprises a colored detergent ingredient which is a hueing agent.Type: ApplicationFiled: April 8, 2005Publication date: October 13, 2005Applicant: The Procter & Gamble CompanyInventors: Paul Van Dijk, Serge Thooft
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Patent number: 5663136Abstract: A process for the continuous preparation of a granular detergent composition or component having a bulk density greater than 650 g/l which comprises the steps of: i) dispersing a detergent active paste throughout a powder stream in a high speed mixer with a residence time of from 2 seconds to 30 seconds, ii) forming an agglomerate in a moderate speed mixer/agglomerator with a residence time of less than 2 minutes, in which, optionally, a finely divided powder may be added, iii) drying and/or cooling. Granular detergent compositions which are made by this process, and which have excellent solubility properties especially with respect to dispensing and rate of dissolution are also described.Type: GrantFiled: January 30, 1995Date of Patent: September 2, 1997Assignee: The Procter & Gamble CompanyInventors: Paul Van Dijk, Jose Luis Vega, Haydn Guy William Dickenson
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Patent number: 5529710Abstract: A high active detergent paste composition which is suitable for making detergent granules which have an excellent white appearance making them suitable for use in consumer products. The paste compositions comprise a dye or optical brightener.Type: GrantFiled: January 13, 1995Date of Patent: June 25, 1996Assignee: The Procter & Gamble CompanyInventors: Paul Van Dijk, Jose L. Vega, Benny De Ryck
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Patent number: 5486303Abstract: A process for preparing high density detergent agglomerates having a density of at least 650 g/l is provided. The process comprises the steps of: (a) charging a viscous surfactant paste into a mixer/densifier wherein the surfactant paste has a viscosity of from about 5,000 cps to about 100,000 cps and contains at least about 5% water; (b) adding from about 1% to about 70% of an anhydrous material into the surfactant paste just prior to entrance into the mixer/densifier to absorb at least a minor amount of the water from the surfactant paste; and (c) agglomerating the surfactant paste and the anhydrous material in the mixer/densifier so as to form detergent agglomerates having a density of at least about 650 g/l. The detergent agglomerates have high surfactant levels.Type: GrantFiled: August 3, 1994Date of Patent: January 23, 1996Assignee: The Procter & Gamble CompanyInventors: Scott W. Capeci, James W. Osborn, Adrian J. W. Angell, Paul van Dijk
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Patent number: 5366652Abstract: A process for preparing high density detergent agglomerates having a density of at least 650 g/l is provided. The process comprises the steps of: (a) charging a viscous surfactant paste into a mixer/densifier wherein the surfactant paste has a viscosity of from about 10,000 cps to about 100,000 cps and contains at least about 10% water; (b) adding from about 1% to about 20% of an anhydrous material into the surfactant paste just prior to entrance into the mixer/densifier to absorb at least a minor amount of the water from the surfactant paste; and (c) agglomerating the surfactant paste and the anhydrous material in the mixer/densifier so as to form detergent agglomerates having a density of at least about 650 g/l. The detergent agglomerates have high surfactant levels.Type: GrantFiled: August 27, 1993Date of Patent: November 22, 1994Assignee: The Procter & Gamble CompanyInventors: Scott W. Capeci, James W. Osborn, Adrian J. W. Angell, Paul van Dijk