Patents by Inventor Paul Van Wijnen

Paul Van Wijnen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic processing cell, lithographic apparatus, track and device manufacturing method
    Publication number: 20050206868
    Abstract: A rework station and a metrology device(s) are incorporated into a lithographic processing cell so that a faulty substrate can be reworked directly and reprocessed without, for example, an overhead involved in changing masks, etc.
    Type: Application
    Filed: October 15, 2004
    Publication date: September 22, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Stefan Kruijswijk, Rard De Leeuw, Paul Luehrmann, Wim Tel, Paul Van Wijnen, Kars Troost