Patents by Inventor Paul VanAdrichem

Paul VanAdrichem has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for modeling an apodization effect in an optical lithography system
    Patent number: 7681172
    Abstract: One embodiment of the present invention provides a system that accurately predicts an apodization effect in an optical lithography system for manufacturing an integrated circuit. During operation, the system starts by collecting an apodization-effect-induced spatial transmission profile from the optical lithography system. The system then constructs an apodization model based on the spatial transmission profile. Next, the system enhances a lithography model for the optical lithography system by incorporating the apodization model into the lithography model, wherein the enhanced lithography model accurately predicts the effects of apodization on the optical lithography system.
    Type: Grant
    Filed: January 29, 2007
    Date of Patent: March 16, 2010
    Assignee: Synopsys, Inc.
    Inventors: Qiaolin Zhang, Paul VanAdrichem, Laurent Depre, Qiliang Yan
  • Method and apparatus for modeling an apodization effect in an optical lithography system
    Publication number: 20080184192
    Abstract: One embodiment of the present invention provides a system that accurately predicts an apodization effect in an optical lithography system for manufacturing an integrated circuit. During operation, the system starts by collecting an apodization-effect-induced spatial transmission profile from the optical lithography system. The system then constructs an apodization model based on the spatial transmission profile. Next, the system enhances a lithography model for the optical lithography system by incorporating the apodization model into the lithography model, wherein the enhanced lithography model accurately predicts the effects of apodization on the optical lithography system.
    Type: Application
    Filed: January 29, 2007
    Publication date: July 31, 2008
    Inventors: Qiaolin Zhang, Paul VanAdrichem, Laurent Depre, Qiliang Yan