Abstract: A non-volatile memory device includes a floating-node memory cell disposed in an integrated circuit (IC). The memory cell includes a floating-node, a control node, an erase node, a source node, and a drain node. The memory device also includes a high-voltage input node for coupling to an external programmable high-voltage source external to the IC. The memory device also includes a high-voltage switch circuit coupled to the high-voltage input node for providing a voltage signal for performing hot-electron programming of charges to the floating node and tunneling erase of charges from the floating node.

Abstract: A floating-node memory device includes a metal-oxide-semiconductor (MOS) transistor including a first polysilicon gate, a source region, and a drain region in a first well region, a tunneling device including a second polysilicon gate in a second well region, and a metal-insulator-metal (MIM) capacitor including a conductive top plate and a bottom plate formed in a metal interconnect layer. The floating-node device includes a floating-node comprising the first polysilicon gate, the second polysilicon gate, and the conductive top plate of the MIM capacitor coupled together, a control node at the bottom plate of the MIM capacitor, an erase node in the second well region, a source node at the source region of the MOS transistor, and a drain node at the drain region of the MOS transistor.

Abstract: Ion implanted resistors formed in the body of a crystalline silicon substrate. The resistors have a different conductivity type from that of the silicon substrate. The sheet resistance and temperature dependence of the resistor layer is determined by the dose of the implant. Temperature variation can be optimized to be less than 2% over the temperature range ?40 C to +85 C. Furthermore, the temperature variation at room temperature (˜25 C) can be reduced to nearly zero.

Abstract: The apparatus and method for forming de-coupling capacitors on top of SOC VLSI chip. The introduced large amount of de-coupling capacitor is intended to solve the power delivery problem of highly integrated and powered VLSI chip, especially in the Silicon-On-Insulator (SOI) technology. This invention proposes a design scheme which could utilize virtually unused area to build efficient de-coupling capacitors without introducing additional manufacture cost. This design scheme is especially effective when the VLSI technology is scaled down further.

Abstract: Ion implanted resistors formed in the body of a crystalline silicon substrate. The resistors have a different conductivity type from that of the silicon substrate. The sheet resistance and temperature dependence of the resistor layer is determined by the dose of the implant. Temperature variation can be optimized to be less than 2% over the temperature range −40 C to +85 C. Furthermore, the temperature variation at room temperature (˜25 C) can be reduced to nearly zero.

Abstract: Ion implanted resistors formed in the body of a crystalline silicon substrate. The resistors have a different conductivity type from that of the silicon substrate. The sheet resistance and temperature dependence of the resistor layer is determined by the dose of the implant. Temperature variation can be optimized to be less than 2% over the temperature range −40 C to +85 C. Furthermore, the temperature variation at room temperature (˜25 C) can be reduced to nearly zero.

Abstract: Ion implanted resistors formed in the body of a crystalline silicon substrate. The resistors have a different conductivity type from that of the silicon substrate. The sheet resistance and temperature dependence of the resistor layer is determined by the dose of the implant. Temperature variation can be optimized to be less than 2% over the temperature range −40C to +85C. Furthermore, the temperature variation at room temperature (˜25C) can be reduced to nearly zero.

Abstract: The apparatus and method for forming de-coupling capacitors on top of SOC VLSI chip. The introduced large amount of de-coupling capacitor is intended to solve the power delivery problem of highly integrated and powered VLSI chip, especially in the Silicon-On-Insulator (SOI) technology. This invention proposes a design scheme which could utilize virtually unused area to build efficient de-coupling capacitors without introducing additional manufacture cost. This design scheme is especially effective when the VLSI technology is scaled down further.