Abstract: A case for computing devices includes an interface which provides connection to a plurality of auxiliary hardware resources. The plurality of auxiliary hardware resources may be mounted in the case. The case may also include space to accommodate the computing device in the case frame. As computing demands increase for the computing device, the computing device may be connected to the case frame's interface, which via an electrical bus, connects the computing device to one or more of the auxiliary hardware resources in the case. In some embodiments, the auxiliary hardware resources may be accessed by the user on-demand. In some embodiments, a cooling fan may cool the ambient temperature of the case and/or individual auxiliary pieces of hardware.

Abstract: Hybrid sol-gel materials are provided, which may be produced by the reaction of an alkyl or dialkyl substituted trialkoxysilane or dialkoxysilane reacting with a silane diol, wherein said alkyl group has from 1 to 8 carbon atoms. A process is also provided for patterning the sol-gel spin-on glass material by: a) coating a substrate with the spin-on glass material; b) exposing the coated substrate of step a) to UV illumination in a desired pattern; c) post-exposure baking the coated substrate of step b) at a temperature from 100° C. to 120° C. for 30 to 60 minutes; d) cooling the coated substrate of step c) to room temperature; e) removing the non-exposed areas of the coating on the coated substrate of step d); f) drying the coated substrate of step e); g) hard baking the coated substrate of step f) at a temperature from 120° C. and 150° C. for 1 to 3 hours.

Abstract: Hybrid sol-gel materials are provided, which may be produced by the reaction of an alkyl or dialkyl substituted trialkoxysilane or dialkoxysilane reacting with a silane diol, wherein said alkyl group has from 1 to 8 carbon atoms. A process is also provided for patterning the sol-gel spin-on glass material by: a) coating a substrate with the spin-on glass material; b) exposing the coated substrate of step a) to UV illumination in a desired pattern; c) post-exposure baking the coated substrate of step b) at a temperature from 100° C. to 120° C. for 30 to 60 minutes; d) cooling the coated substrate of step c) to room temperature; e) removing the non-exposed areas of the coating on the coated substrate of step d); f) drying the coated substrate of step e); g) hard baking the coated substrate of step f) at a temperature from 120° C. and 150° C. for 1 to 3 hours.

Abstract: The present invention relates to the coagglomeration of random vinyl substituted aromatic/C4-C6 conjugated diolefin polymers With sulfur. Said coagglomerate is storage stable and easily blended with asphalt under a variety of mixing conditions. Further, polymer/asphalt blends prepared with the sulfur coagglomerated polymers show improved storage stability against phase separation.

Abstract: The present invention relates to the coagglomeration of random vinyl substituted aromatic/C4-C6 conjugated diolefin polymers with sulfur. Said coagglomerate is storage stable and easily blended with asphalt under a variety of mixing conditions. Further, polymer/asphalt blends prepared with the sulfur coagglomerated polymers show improved storage stability against phase separation.

Abstract: The present invention relates to the coagglomeration of random vinyl substituted aromatic/C.sub.4 -C.sub.6 conjugated diolefin polymers with sulfur. Said coagglomerate is storage stable and easily blended with asphalt under a variety of mixing conditions. Further, polymer/asphalt blends prepared with the sulfur coagglomerated polymers show improved storage stability against phase separation.