Patents by Inventor Paul Wenk
Paul Wenk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5032606Abstract: 4-Acylresorcinol ethers of the formula ##STR1## in which R.sub.1 is lower alkyl, R.sub.2 is fluorinated lower alkyl, R.sub.3 is hydrogen, lower alkoxy, trifluoromethyl or halogen, alk is an alkylene or hydroxyalkylene radical which is uninterrupted or interrupted by oxygen, one of the radicals R.sub.4, R.sub.5 and R.sub.7 is a group of the formula --NH--C(.dbd.O)--R.sub.8, a radical R.sub.4 or R.sub.5 which differs from this is a radical R.sub.9 and a radical R.sub.7 which differs from this is a radical R.sub.10, R.sub.6 is hydrogen, lower alkyl, trifluoromethyl, halogen, carboxyl which is free, esterified or amidated, cyano or lower alkanoyl, R.sub.8 is carboxyl which is free, esterified or amidated or 5-tetrazolyl, R.sub.9 is hydrogen, lower alkyl, lower alkoxy, halogen or trifluoromethyl and R.sub.10 is hydrogen, lower alkyl, lower alkoxy, halogen, trifluoromethyl, cyano or carboxyl which is free, esterified or amidated, and their salts have antiallergic and antiinflammatory properties.Type: GrantFiled: May 23, 1990Date of Patent: July 16, 1991Assignee: Ciba-Geigy CorporationInventors: Andreas Beck, Alfred Sallmann, Robert W. Lang, Paul Wenk
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Patent number: 4863942Abstract: Novel 4-acylresorcinol ethers of the formula ##STR1## in which R.sub.1 represents lower alkyl, R.sub.2 represents lower alkyl, lower alkenyl or lower alkynyl, R.sub.3 represents hydrogen, lower alkoxy, trifluoromethyl or halogen, alk represents an alkylene radical, one of the radicals R.sub.4, R.sub.5 and R.sub.7 is a group of the formula --NH--C(.dbd.O)--R.sub.8, a radical R.sub.4 or R.sub.5 that is other than a group of the formula --NH--C(.dbd.0)--R.sub.8 is a radical R.sub.9 and a radical R.sub.7 that is other than a group of the formula --NH--C(.dbd.0)--R.sub.8 is a radical R.sub.10, R.sub.6 represents hydrogen, lower alkyl, halogen, trifluoromethyl, optionally esterified or amidated carboxy, cyano or lower alkanoyl, R.sub.8 represents optionally esterified or amidated carboxy, or 5-tetrazolyl, R.sub.9 represents hydrogen, lower alkyl, lower alkoxy, halogen or trifluoromethyl, and R.sub.Type: GrantFiled: September 25, 1986Date of Patent: September 5, 1989Assignee: Ciba-Geigy CorporationInventors: Paul Wenk, Alfred Sallmann, Andreas Beck
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Patent number: 4820726Abstract: 4-Acylresorcinol esthers of the formula ##STR1## in which R.sub.1 is lower alkyl, R.sub.2 is fluorinated lower alkyl, R.sub.3 is hydrogen, lower alkoxy, trifluoromethyl or halogen, alk is an alkylene or hydroxyalkylene radical which is uninterrupted or interrupted by oxygen, one of the radicals R.sub.4, R.sub.5 and R.sub.7 is a group of the formula --NH--C(.dbd.O)--R.sub.8, a radical R.sub.4 or R.sub.5 which differs from this is a radical R.sub.9 and a radical R.sub.7 which differs from this is a radical R.sub.10, R.sub.6 is hydrogen, lower alkyl, trifluoromethyl, halogen, carboxyl which is free, esterified or amidated, cyano or lower alkanoyl, R.sub.8 is carboxyl which is free, esterified or amidated or 5-tetrazolyl, R.sub.9 is hydrogen, lower alkyl, lower alkoxy, halogen or trifluoromethyl and R.sub.10 is hydrogen, lower alkyl, lower alkoxy, halogen, trifluoromethyl, cyano or carboxyl which is free, esterified or amidated, and their salts have antiallergic and antiinflammatory properties.Type: GrantFiled: January 14, 1987Date of Patent: April 11, 1989Assignee: Ciba-Geigy CorporationInventors: Andreas Beck, Alfred Sallmann, Robert W. Lang, Paul Wenk
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Patent number: 4808604Abstract: Novel 4-acylresorcinol ethers of the formula ##STR1## in which R.sub.1 is lower alkyl, alk is a hydroxyalkylene radical which can be interrupted by oxygen and R.sub.2 is 5-tetrazolyl, it being possible for the ring A to be additionally substituted by a lower alkyl, lower alkenyl, lower alkynyl, lower alkoxy and/or halogen and for the ring B to be additionally substituted by lower alkyl, lower alkanoyl, lower alkoxy, lower alkoxycarbonyl, carboxyl, cyano, carbamyl, halogen and/or trifluoromethyl, and salts thereof have antiallergic properties and can be used as active compounds for medicaments. They are prepared by methods known as per se.Type: GrantFiled: June 1, 1987Date of Patent: February 28, 1989Assignee: Ciba-Geigy CorporationInventors: Andreas Beck, Alfred Sallmann, Paul Wenk
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Patent number: 4670604Abstract: 4-Acylresorcinol ethers of the formula ##STR1## in which R.sub.1 is lower alkyl, R.sub.2 is fluorinated lower alkyl, R.sub.3 is hydrogen, lower alkoxy, trifluoromethyl or halogen, alk is an alkylene or hydroxyalkylene radical which is uninterrupted or interrupted by oxygen, one of the radicals R.sub.4, R.sub.5 and R.sub.7 is a group of the formula --NH--C(.dbd.O)--R.sub.8, a radical R.sub.4 or R.sub.5 which differs from this is a radical R.sub.9 and a radical R.sub.7 which differs from this is a radical R.sub.10, R.sub.6 is hydrogen, lower alkyl, trifluoromethyl, halogen, carboxyl which is free, esterified or amidated, cyano or lower alkanoyl, R.sub.8 is carboxyl which is free, esterified or amidated or 5-tetrazolyl, R.sub.9 is hydrogen, lower alkyl, lower alkoxy, halogen or trifluoromethyl and R.sub.10 is hydrogen, lower alkyl, lower alkoxy, halogen, trifluoromethyl, cyano or carboxyl which is free, esterified or amidated, and their salts have antiallergic and antiinflammatory properties.Type: GrantFiled: November 22, 1985Date of Patent: June 2, 1987Assignee: Ciba-Geigy CorporationInventors: Andreas Beck, Alfred Sallmann, Robert W. Lang, Paul Wenk
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Patent number: 4558043Abstract: Benzofurans or 2,3-dihydrobenzofurans of the formula ##STR1## in which R.sub.1 represents hydrogen or an aliphatic radical,R.sub.2 represents an amino group disubstituted by a bivalent aliphatic radical which is optionally interrupted by at least one hetero atom,and the aromatic ring may be additionally substituted,and the salts thereof, have anti-inflammatory and/or analgesic activities.Type: GrantFiled: July 11, 1984Date of Patent: December 10, 1985Assignee: Ciba Geigy CorporationInventors: Paul Wenk, Werner Breitenstein, Marcus Baumann
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Patent number: 4514415Abstract: The invention relates to novel lactones, especially benzofuranones of the general formula ##STR1## in which R.sub.1 represents hydrogen or an aliphatic radical, R.sub.2 represents an amino group di-substituted by two monovalent hydrocarbon radicals, and the aromatic ring A may be additionally substituted, and their salts and/or isomers, processes for the manufacture of compounds of the formula (I) and their salts and isomers, pharmaceutical preparations containing these compounds, and their use as the active ingredients of medicaments and/or for the manufacture of pharmaceutical preparations.Type: GrantFiled: October 21, 1982Date of Patent: April 30, 1985Assignee: Ciba Geigy CorporationInventors: Paul Wenk, Werner Breitenstein, Marcus Baumann
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Patent number: 4451462Abstract: The invention relates to novel furans, especially benzofuranones of the general formula ##STR1## in which R.sub.1 represents hydrogen or an aliphatic radical, R.sub.2 represents an amino group di-substituted by a divalent hydrocarbon radical, and the aromatic ring A may be additionally substituted, and their salts and/or isomers, processes for the manufacture of compounds of the formula (I) and their salts and isomers, pharmaceutical preparations containing these compounds, and their use as the active ingredients of anti-inflammatory agents or analgesics and/or for the manufacture of pharmaceutical preparations.Type: GrantFiled: October 17, 1983Date of Patent: May 29, 1984Assignee: Ciba-Geigy CorporationInventors: Paul Wenk, Werner Breitenstein, Marcus Baumann
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Patent number: 4426380Abstract: The invention relates to novel furans, especially benzofuranones of the general formula ##STR1## in which R.sub.1 represents hydrogen or an aliphatic radical, R.sub.2 represents an amino group di-substituted by a divalent hydrocarbon radical, and the aromatic ring A may be additionally substituted, and their salts and/or isomers, processes for the manufacture of compounds of the formula (I) and their salts and isomers, pharmaceutical preparations containing these compounds, and their use as the active ingredients of medicaments as anti-inflammatory agents, analgesics or light-screening agents and/or for the manufacture of pharmaceutical preparations.Type: GrantFiled: October 21, 1982Date of Patent: January 17, 1984Assignee: Ciba-Geigy CorporationInventors: Paul Wenk, Werner Breitenstein, Marcus Baumann