Patents by Inventor Paul Z. Wirth

Paul Z. Wirth has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200068119
    Abstract: A depth measuring apparatus includes a camera assembly, a position sensor, and a controller. The camera assembly is configured to capture a plurality of images of a target at a plurality of distances from the target. The position sensor is configured to capture, for each of the plurality of images, corresponding position data associated with a relative distance between the camera assembly and the target. The controller is configured to, for each of a plurality of regions within the plurality of images: determine corresponding gradient values within the plurality of images; determine a corresponding maximum gradient value from the corresponding gradient values; and determine a depth measurement for the region based on the corresponding maximum gradient and the corresponding position data captured for an image from the plurality of images that includes the corresponding maximum gradient.
    Type: Application
    Filed: October 30, 2019
    Publication date: February 27, 2020
    Inventors: Ozkan Celik, Patricia A. Schulze, Gregory J. Freeman, Paul Z. Wirth, Tommaso Vercesi
  • Publication number: 20190373162
    Abstract: A depth measuring apparatus includes (1) a camera and lens assembly that captures image data for a sequence of images of a target including a plurality of depth levels; (2) a motion stage on which the camera and lens assembly or the target is positioned; (3) a motor connected to the motion stage that causes relative movement between the camera and lens assembly and the target at defined incremental values; (4) a position sensor that captures position data on the camera and lens assembly or the target at each of the defined incremental values; and (5) a controller that processes the captured image data and captured position data using an image gradient method and optimal focal distance to determine depths of the plurality of depth levels. Numerous other aspects are provided.
    Type: Application
    Filed: June 5, 2018
    Publication date: December 5, 2019
    Inventors: Ozkan Celik, Patricia A. Schulze, Gregory J. Freeman, Paul Z. Wirth, Tommaso Vercesi
  • Patent number: 10498948
    Abstract: A depth measuring apparatus includes (1) a camera and lens assembly that captures image data for a sequence of images of a target including a plurality of depth levels; (2) a motion stage on which the camera and lens assembly or the target is positioned; (3) a motor connected to the motion stage that causes relative movement between the camera and lens assembly and the target at defined incremental values; (4) a position sensor that captures position data on the camera and lens assembly or the target at each of the defined incremental values; and (5) a controller that processes the captured image data and captured position data using an image gradient method and optimal focal distance to determine depths of the plurality of depth levels. Numerous other aspects are provided.
    Type: Grant
    Filed: June 5, 2018
    Date of Patent: December 3, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Ozkan Celik, Patricia A. Schulze, Gregory J. Freeman, Paul Z. Wirth, Tommaso Vercesi
  • Patent number: 10453725
    Abstract: A dual-blade robot having overlapping frog-leg linkages is disclosed. The robot includes first and second arms, coplanar with each other and each rotatably coupled to a first blade, in a frog-leg configuration, and third and fourth arms, coplanar with each other and each rotatably coupled to a second blade, in a frog-leg configuration, where the third and fourth arms are vertically offset from the first and second arms. The third and fourth arms are configured to overlap at least a portion of the first and second arms when the first and second blades are in a retracted position. Methods of operating the robot and electronic device processing systems including the robot are provided, as are numerous other aspects.
    Type: Grant
    Filed: September 19, 2017
    Date of Patent: October 22, 2019
    Assignee: Applied Materials, Inc.
    Inventor: Paul Z. Wirth
  • Publication number: 20190088530
    Abstract: A dual-blade robot having overlapping frog-leg linkages is disclosed. The robot includes first and second arms, coplanar with each other and each rotatably coupled to a first blade, in a frog-leg configuration, and third and fourth arms, coplanar with each other and each rotatably coupled to a second blade, in a frog-leg configuration, where the third and fourth arms are vertically offset from the first and second arms. The third and fourth arms are configured to overlap at least a portion of the first and second arms when the first and second blades are in a retracted position. Methods of operating the robot and electronic device processing systems including the robot are provided, as are numerous other aspects.
    Type: Application
    Filed: September 19, 2017
    Publication date: March 21, 2019
    Inventor: Paul Z. Wirth
  • Patent number: 9799544
    Abstract: A robot assembly allowing remote actuation of a carriage supported robot. The robot assembly includes a track, a carriage moveable along the track, and a robot mounted to the carriage. The robot includes at least a first arm, and a first driven member coupled to the first arm. The robot assembly further includes a drive assembly having a first driving member, a first transmission member coupled to the first driving member and the first driven member, and a first drive motor coupled to the first driving member. The first drive motor is configured to move the first driving member causing remote rotation of the first driven member and rotation of the first arm. Substrate processing apparatus and methods of transporting a substrate within a substrate processing apparatus are also provided, as are numerous other aspects.
    Type: Grant
    Filed: October 23, 2015
    Date of Patent: October 24, 2017
    Assignee: Applied Materials, Inc.
    Inventor: Paul Z. Wirth
  • Publication number: 20170117171
    Abstract: A robot assembly allowing remote actuation of a carriage supported robot. The robot assembly includes a track, a carriage moveable along the track, and a robot mounted to the carriage. The robot includes at least a first arm, and a first driven member coupled to the first arm. The robot assembly further includes a drive assembly having a first driving member, a first transmission member coupled to the first driving member and the first driven member, and a first drive motor coupled to the first driving member. The first drive motor is configured to move the first driving member causing remote rotation of the first driven member and rotation of the first arm. Substrate processing apparatus and methods of transporting a substrate within a substrate processing apparatus are also provided, as are numerous other aspects.
    Type: Application
    Filed: October 23, 2015
    Publication date: April 27, 2017
    Inventor: Paul Z. Wirth
  • Patent number: 7934898
    Abstract: A wafer processing system has a wafer loading system accommodating sufficient wafer carriers to substantially maximize the processing speed capability of the processing system. Wafer carriers are placed into and removed from the loading system by one or two overhead carrier loading tracks. Carriers may be loaded or removed while other carriers are in work. One or more transfer robots may move wafers from the carriers to buffers. One or more process robots in a process module move wafers from buffers, or other locations, to processors in the process module.
    Type: Grant
    Filed: July 16, 2007
    Date of Patent: May 3, 2011
    Assignee: Semitool, Inc.
    Inventors: Randy A. Harris, Steve L. Eudy, Paul Z. Wirth
  • Publication number: 20090024244
    Abstract: A wafer processing system has a wafer loading system accommodating sufficient wafer carriers to substantially maximize the processing speed capability of the processing system. Wafer carriers are placed into and removed from the loading system by one or two overhead carrier loading tracks. Carriers may be loaded or removed while other carriers are in work. One or more transfer robots may move wafers from the carriers to buffers. One or more process robots in a process module move wafers from buffers, or other locations, to processors in the process module.
    Type: Application
    Filed: July 16, 2007
    Publication date: January 22, 2009
    Inventors: Randy A. Harris, Steve L. Eudy, Paul Z. Wirth
  • Publication number: 20090022574
    Abstract: A wafer loading system accommodates sufficient wafer carriers to substantially maximize the processing speed capability of wafer processing systems. Wafer carriers are placed into and removed from the loading system by one or two overhead carrier loading elements, such as overhead track systems. Carriers may be loaded or removed while other carriers are in work. One or more transfer robots may move wafers from the carriers to buffers. Methods of operating the loading system allow delivery and removal of wafers to and from the processing systems to meet or exceed the processing speeds of the processing systems.
    Type: Application
    Filed: July 16, 2007
    Publication date: January 22, 2009
    Inventors: Steve L. Eudy, Randy A. Harris, Paul Z. Wirth
  • Publication number: 20080203083
    Abstract: A thermal processor is adapted for annealing substrates. The processor has a sealed process chamber. Air is excluded from the process chamber during processing to avoid oxidation of substrate surfaces, such as copper surfaces. The substrate temperature is controlled by selectively positioning the substrate between a hot plate and a cold plate operating at steady state conditions. During loading and/or unloading, the air flow is induced over the substrate. This keeps the substrate at a temperature low enough to avoid oxidation, even though the heater may remain on.
    Type: Application
    Filed: February 28, 2007
    Publication date: August 28, 2008
    Inventor: Paul Z. Wirth
  • Patent number: 7337663
    Abstract: A system for processing a workpiece includes a base having a bowl or recess for holding a processing fluid. A sonic energy source, such as a megasonic transducer, provides sonic energy into a processing fluid in the bowl. A process head holds a workpiece. A process head lifter lowers the head holding the workpiece into the processing fluid in the bowl. Sonic energy is provided to the workpiece through the processing fluid, optionally while the processing head spins the workpiece. The processing fluid may include de-ionized water and an etchant.
    Type: Grant
    Filed: March 11, 2005
    Date of Patent: March 4, 2008
    Assignee: Semitool, Inc.
    Inventors: Paul Z. Wirth, Dana R. Scranton, Brian Aegerter
  • Patent number: 6969682
    Abstract: A system for processing wafers includes a robot moveable within an enclosure to load and unload workpieces into and out of workpiece processors. A processor includes an upper rotor having alignment pins, and a lower rotor having one or more openings for receiving the alignment pins to form a processing chamber around the workpiece. The alignment pins center the workpiece relative to a rotor spin axis and to an etch or drain groove in the upper rotor. A first fluid outlet delivers processing fluid to a central region of the workpiece. The processing fluid is distributed across the workpiece surface via centrifugal force generated by spinning the processing chamber. Purge gas is optionally delivered into the processing chamber through an annular opening around the first fluid outlet to help remove processing fluid from the processing chamber.
    Type: Grant
    Filed: October 24, 2003
    Date of Patent: November 29, 2005
    Assignee: Semitool, Inc.
    Inventors: Kyle M. Hanson, Paul Z. Wirth, Steven L. Peace, Jon Kuntz, Scott A. Bruner
  • Patent number: 6930046
    Abstract: A system and method for processing a workpiece, includes workpiece processors. A robot is moveable within an enclosure to load and unload workpieces into and out of the processors. A processor includes an upper rotor having a central air flow opening. The upper rotor is magnetically driven into engagement with a lower rotor to form a workpiece processing chamber. A moveable drain mechanism aligns different drain paths with the processing chamber so that different processing fluids may be removed from the processing chamber via different drain paths. A moveable nozzle positioned in the air flow opening distributes processing fluid to the workpiece. The processing fluid is distributed across the workpiece surface, via centrifugal force generated by spinning the processing chamber, and removed from the processing chamber via the moveable drain mechanism.
    Type: Grant
    Filed: October 21, 2003
    Date of Patent: August 16, 2005
    Assignee: Semitool, Inc.
    Inventors: Kyle M. Hanson, Eric Lund, Coby Grove, Steven L. Peace, Paul Z. Wirth, Scott A. Bruner, Jonathan Kuntz
  • Patent number: 6806194
    Abstract: A system for processing a workpiece includes a head attached to a head lifter. A workpiece is supported in the head between an upper rotor and a lower rotor. A base has a bowl for containing a liquid. The head is movable by the head lifter from a first position vertically above the bowl, to a second position where the workpiece is at least partially positioned in the bowl. The bowl has a contour section with a sidewall having a radius of curvature which increases adjacent to a drain outlet in the bowl, to help rapid draining of liquid from the bowl. The head has a load position, where the rotors are spaced apart by a first amount, and a process position, where the rotors are engaged and sealed against each other. For rapid evacuation of fluid, the head also has a fast drain position, where the rotors are moved apart sufficiently to create an annular drain gap.
    Type: Grant
    Filed: April 14, 2003
    Date of Patent: October 19, 2004
    Assignee: Semitool. Inc.
    Inventors: Paul Z. Wirth, Steven L. Peace, Erik Lund
  • Publication number: 20040129302
    Abstract: A system for processing wafers includes a robot moveable within an enclosure to load and unload workpieces into and out of workpiece processors. A processor includes an upper rotor having alignment pins, and a lower rotor having one or more openings for receiving the alignment pins to form a processing chamber around the workpiece. The alignment pins center the workpiece relative to a rotor spin axis and to an etch or drain groove in the upper rotor. A first fluid outlet delivers processing fluid to a central region of the workpiece. The processing fluid is distributed across the workpiece surface via centrifugal force generated by spinning the processing chamber. Purge gas is optionally delivered into the processing chamber through an annular opening around the first fluid outlet to help remove processing fluid from the processing chamber.
    Type: Application
    Filed: October 24, 2003
    Publication date: July 8, 2004
    Inventors: Kyle M. Hanson, Paul Z. Wirth, Steven L. Peace, Jon Kuntz, Scott A. Bruner
  • Publication number: 20040079403
    Abstract: A system and method for processing a workpiece, includes workpiece processors. A robot is moveable within an enclosure to load and unload workpieces into and out of the processors. A processor includes an upper rotor having a central air flow opening. The upper rotor is magnetically driven into engagement with a lower rotor to form a workpiece processing chamber. A moveable drain mechanism aligns different drain paths with the processing chamber so that different processing fluids may be removed from the processing chamber via different drain paths. A moveable nozzle positioned in the air flow opening distributes processing fluid to the workpiece. The processing fluid is distributed across the workpiece surface, via centrifugal force generated by spinning the processing chamber, and removed from the processing chamber via the moveable drain mechanism.
    Type: Application
    Filed: October 21, 2003
    Publication date: April 29, 2004
    Inventors: Kyle M. Hanson, Eric Lund, Coby Grove, Steven L. Peace, Paul Z. Wirth, Scott Bruner, Jonathan Kuntz
  • Patent number: 6680253
    Abstract: A system for processing a workpiece includes a base having a bowl or recess for holding a liquid. A process reactor or head holds a workpiece between an upper rotor and a lower rotor. A head lifter lowers the head holding the workpiece into contact with the liquid. The head spins the workpiece during or after contact with the liquid. The upper and lower rotors have side openings for loading and unloading a workpiece into the head. The rotors are axially moveable to align the side openings.
    Type: Grant
    Filed: July 16, 2001
    Date of Patent: January 20, 2004
    Assignee: Semitool, Inc.
    Inventors: Paul Z. Wirth, Steven L. Peace
  • Publication number: 20030176067
    Abstract: A system for processing a workpiece includes a head attached to a head lifter. A workpiece is supported in the head between an upper rotor and a lower rotor. A base has a bowl for containing a liquid. The head is movable by the head lifter from a first position vertically above the bowl, to a second position where the workpiece is at least partially positioned in the bowl. The bowl has a contour section with a sidewall having a radius of curvature which increases adjacent to a drain outlet in the bowl, to help rapid draining of liquid from the bowl. The head has a load position, where the rotors are spaced apart by a first amount, and a process position, where the rotors are engaged and sealed against each other. For rapid evacuation of fluid, the head also has a fast drain position, where the rotors are moved apart sufficiently to create an annular drain gap.
    Type: Application
    Filed: April 14, 2003
    Publication date: September 18, 2003
    Applicant: Semitool, Inc.
    Inventors: Paul Z. Wirth, Steven L. Peace, Erik Lund
  • Patent number: 6548411
    Abstract: A system for processing a workpiece includes a head attached to a head lifter. A workpiece is supported in the head between an upper rotor and a lower rotor. A base has a bowl for containing a liquid. The head is movable by the head lifter from a first position vertically above the bowl, to a second position where the workpiece is at least partially positioned in the bowl. The bowl has a contour section with a sidewall having a radius of curvature which increases adjacent to a drain outlet in the bowl, to help rapid draining of liquid from the bowl. The head has a load position, where the rotors are spaced apart by a first amount, and a process position, where the rotors are engaged and sealed against each other. For rapid evacuation of fluid, the head also has a fast drain position, where the rotors are moved apart sufficiently to create an annular drain gap.
    Type: Grant
    Filed: July 16, 2001
    Date of Patent: April 15, 2003
    Assignee: Semitool, Inc.
    Inventors: Paul Z. Wirth, Steven L. Peace, Erik Lund