Patents by Inventor Paul Z. Wirth
Paul Z. Wirth has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240071802Abstract: A robot apparatus with variable end effector pitch is provided suitable for accommodating varying pitches, e.g., between two adjacent processing chambers or between two adjacent load lock chambers. The robot apparatus may operate in dual substrate handling mode, single substrate handling mode, or a combination thereof. The robot apparatus may also be an off-axis robot. A variety of robot apparatuses according to various embodiments, electronic device processing systems including such robot apparatuses, and methods of use thereof are described.Type: ApplicationFiled: August 16, 2023Publication date: February 29, 2024Inventors: Paul Z. Wirth, Damon K. Cox, Rajkumar Thanu, Karuppasamy Muthukamatchi, Jeffrey C. Hudgens
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Patent number: 11837478Abstract: A process chamber includes one or more vertical walls at least partially defining a chamber portion of the process chamber, and multiple zones located about a periphery of the one or more vertical walls, wherein one or more of the multiple zones extends from a top to a bottom of the one or more vertical walls. The process chamber further includes a plurality of temperature control devices, each thermally coupled to the one or more vertical walls in one of the multiple zones, and a controller coupled to the plurality of temperature control devices and configured to set temperatures of one or more of the plurality of temperature control devices to obtain temperature uniformity within 2% across a substrate located in the chamber portion.Type: GrantFiled: July 29, 2021Date of Patent: December 5, 2023Assignee: Applied Materials, Inc.Inventor: Paul Z. Wirth
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Patent number: 11791172Abstract: Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A valve upstream of a shared volume is controlled by at least two pressurizing sequences during a process it the processing chamber. The first pressurizing sequence opens and closes the upstream valve a first number of cycles and the second pressurizing sequence opens and closes the upstream valve less frequently after the first number of cycles. The open/close timing of the second pressurizing sequence occurs less frequently than the open/close timing of the first pressurizing sequence.Type: GrantFiled: June 18, 2020Date of Patent: October 17, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Mauro Cimino, Arkaprava Dan, Paul Z. Wirth
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Publication number: 20230195072Abstract: A method includes receiving first sensor data associated with a first iteration of a first recipe operation of a substrate processing recipe. The method further includes determining disturbance data, the disturbance data being a difference between the first sensor data and first setpoint data of the first recipe operation. The method further includes determining, based at least in part on the disturbance data, a first actuation value associated with one or more components of a processing chamber. Actuation of the one or more components according to the first actuation value compensates for the disturbance data. The method further includes causing the actuation of the one or more components based on the first actuation value during a subsequent iteration of the first recipe operation of the substrate processing recipe to compensate for the disturbance data.Type: ApplicationFiled: December 22, 2021Publication date: June 22, 2023Inventors: Atilla Kilicarslan, Raechel Chu-Hui Tan, Brooke Elise Montgomery, Paul Z. Wirth
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Patent number: 11590662Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a transfer apparatus having a central hub including a shaft extending at a distal end through the transfer region housing into the transfer region. The transfer apparatus may include a lateral translation apparatus coupled with an exterior surface of the transfer region housing, and configured to provide at least one direction of lateral movement of the shaft. The systems may also include an end effector coupled with the shaft within the transfer region. The end effector may include a plurality of arms having a number of arms equal to a number of substrate supports of the plurality of substrate supports in the transfer region.Type: GrantFiled: September 13, 2021Date of Patent: February 28, 2023Assignee: Applied Materials, Inc.Inventors: Paul Z. Wirth, Charles T. Carlson, Jason M. Schaller
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Patent number: 11582378Abstract: A depth measuring apparatus includes a camera assembly configured to capture a plurality of images of a target at a plurality of distances from the target. The depth measuring apparatus further includes a controller configured to, for each of a plurality of regions within the plurality of images: determine corresponding gradient values within the plurality of images; determine a corresponding maximum gradient value from the corresponding gradient values; and determine, based on the corresponding maximum gradient value, a depth measurement for a region of the plurality of regions.Type: GrantFiled: June 7, 2021Date of Patent: February 14, 2023Assignee: Applied Materials, Inc.Inventors: Ozkan Celik, Patricia A. Schulze, Gregory J. Freeman, Paul Z. Wirth, Tommaso Vercesi
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Patent number: 11415230Abstract: Disclosed are a slit valve apparatus and a method for controlling a slit valve. The slit valve apparatus includes a slit valve assembly and a servo-control system in communication with the slit valve assembly. The slit valve assembly includes at least one gate able to transition between an open position and a closed position, at least one pneumatic actuator, at least one proportional pneumatic valve including a plurality of controllers, and a continuous position sensor. The servo-control system includes a centralized controller that generates a control signal and adjusts the movement of the at least one gate based on the position trajectory for the gate, a linear position measurement of the gate from the continuous position sensor, and fluid pressure/flow measurements from the plurality of controllers.Type: GrantFiled: March 31, 2020Date of Patent: August 16, 2022Assignee: Applied Material, Inc.Inventors: Paul Z. Wirth, Ofer Amir, Michael C. Kuchar
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Publication number: 20220009106Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a transfer apparatus having a central hub including a shaft extending at a distal end through the transfer region housing into the transfer region. The transfer apparatus may include a lateral translation apparatus coupled with an exterior surface of the transfer region housing, and configured to provide at least one direction of lateral movement of the shaft. The systems may also include an end effector coupled with the shaft within the transfer region. The end effector may include a plurality of arms having a number of arms equal to a number of substrate supports of the plurality of substrate supports in the transfer region.Type: ApplicationFiled: September 13, 2021Publication date: January 13, 2022Applicant: Applied Materials, Inc.Inventors: Paul Z. Wirth, Charles T. Carlson, Jason M. Schaller
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Publication number: 20210398823Abstract: Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A valve upstream of a shared volume is controlled by at least two pressurizing sequences during a process it the processing chamber. The first pressurizing sequence opens and closes the upstream valve a first number of cycles and the second pressurizing sequence opens and closes the upstream valve less frequently after the first number of cycles. The open/close timing of the second pressurizing sequence occurs less frequently than the open/close timing of the first pressurizing sequence.Type: ApplicationFiled: June 18, 2020Publication date: December 23, 2021Applicant: Applied Materials, Inc.Inventors: Mauro Cimino, Arkaprava Dan, Paul Z. Wirth
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Publication number: 20210358777Abstract: A process chamber includes one or more vertical walls at least partially defining a chamber portion of the process chamber, and multiple zones located about a periphery of the one or more vertical walls, wherein one or more of the multiple zones extends from a top to a bottom of the one or more vertical walls. The process chamber further includes a plurality of temperature control devices, each thermally coupled to the one or more vertical walls in one of the multiple zones, and a controller coupled to the plurality of temperature control devices and configured to set temperatures of one or more of the plurality of temperature control devices to obtain temperature uniformity within 2% across a substrate located in the chamber portion.Type: ApplicationFiled: July 29, 2021Publication date: November 18, 2021Inventor: Paul Z. Wirth
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Publication number: 20210301929Abstract: Disclosed are a slit valve apparatus and a method for controlling a slit valve. The slit valve apparatus includes a slit valve assembly and a servo-control system in communication with the slit valve assembly. The slit valve assembly includes at least one gate able to transition between an open position and a closed position, at least one pneumatic actuator, at least one proportional pneumatic valve including a plurality of controllers, and a continuous position sensor. The servo-control system includes a centralized controller that generates a control signal and adjusts the movement of the at least one gate based on the position trajectory for the gate, a linear position measurement of the gate from the continuous position sensor, and fluid pressure/flow measurements from the plurality of controllers.Type: ApplicationFiled: March 31, 2020Publication date: September 30, 2021Inventors: Paul Z. Wirth, Ofer Amir, Michael C. Kuchar
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Publication number: 20210295547Abstract: A depth measuring apparatus includes a camera assembly configured to capture a plurality of images of a target at a plurality of distances from the target. The depth measuring apparatus further includes a controller configured to, for each of a plurality of regions within the plurality of images: determine corresponding gradient values within the plurality of images; determine a corresponding maximum gradient value from the corresponding gradient values; and determine, based on the corresponding maximum gradient value, a depth measurement for a region of the plurality of regions.Type: ApplicationFiled: June 7, 2021Publication date: September 23, 2021Inventors: Ozkan Celik, Patricia A. Schulze, Gregory J. Freeman, Paul Z. Wirth, Tommaso Vercesi
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Patent number: 11117265Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a transfer apparatus having a central hub including a shaft extending at a distal end through the transfer region housing into the transfer region. The transfer apparatus may include a lateral translation apparatus coupled with an exterior surface of the transfer region housing, and configured to provide at least one direction of lateral movement of the shaft. The systems may also include an end effector coupled with the shaft within the transfer region. The end effector may include a plurality of arms having a number of arms equal to a number of substrate supports of the plurality of substrate supports in the transfer region.Type: GrantFiled: July 7, 2020Date of Patent: September 14, 2021Assignee: Applied Materials, Inc.Inventors: Paul Z. Wirth, Charles T. Carlson, Jason M. Schaller
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Patent number: 11107709Abstract: A temperature-controllable process chamber configured to process substrates may include one or more vertical walls at least partially defining a chamber portion of the process chamber. Multiple zones may be located about a periphery of the one or more vertical walls and multiple temperature control devices are thermally coupled to the periphery of the one or more vertical walls in each of the multiple zones. A controller coupled to the temperature control devices may be configured to individually control temperatures of the multiple temperature control devices to obtain substantial temperature uniformity across a substrate located in the chamber portion. Other systems and methods of manufacturing substrates are disclosed.Type: GrantFiled: January 30, 2019Date of Patent: August 31, 2021Assignee: Applied Materials, Inc.Inventor: Paul Z. Wirth
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Patent number: 11032464Abstract: A depth measuring apparatus includes a camera assembly, a position sensor, and a controller. The camera assembly is configured to capture a plurality of images of a target at a plurality of distances from the target. The position sensor is configured to capture, for each of the plurality of images, corresponding position data associated with a relative distance between the camera assembly and the target. The controller is configured to, for each of a plurality of regions within the plurality of images: determine corresponding gradient values within the plurality of images; determine a corresponding maximum gradient value from the corresponding gradient values; and determine a depth measurement for the region based on the corresponding maximum gradient and the corresponding position data captured for an image from the plurality of images that includes the corresponding maximum gradient.Type: GrantFiled: October 30, 2019Date of Patent: June 8, 2021Assignee: Applied Materials, Inc.Inventors: Ozkan Celik, Patricia A. Schulze, Gregory J. Freeman, Paul Z. Wirth, Tommaso Vercesi
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Publication number: 20210008727Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a transfer apparatus having a central hub including a shaft extending at a distal end through the transfer region housing into the transfer region. The transfer apparatus may include a lateral translation apparatus coupled with an exterior surface of the transfer region housing, and configured to provide at least one direction of lateral movement of the shaft. The systems may also include an end effector coupled with the shaft within the transfer region. The end effector may include a plurality of arms having a number of arms equal to a number of substrate supports of the plurality of substrate supports in the transfer region.Type: ApplicationFiled: July 7, 2020Publication date: January 14, 2021Applicant: Applied Materials, Inc.Inventors: Paul Z. Wirth, Charles T. Carlson, Jason M. Schaller
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Publication number: 20200243354Abstract: A temperature-controllable process chamber configured to process substrates may include one or more vertical walls at least partially defining a chamber portion of the process chamber. Multiple zones may be located about a periphery of the one or more vertical walls and multiple temperature control devices are thermally coupled to the periphery of the one or more vertical walls in each of the multiple zones. A controller coupled to the temperature control devices may be configured to individually control temperatures of the multiple temperature control devices to obtain substantial temperature uniformity across a substrate located in the chamber portion. Other systems and methods of manufacturing substrates are disclosed.Type: ApplicationFiled: January 30, 2019Publication date: July 30, 2020Inventor: Paul Z. Wirth
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Publication number: 20200068119Abstract: A depth measuring apparatus includes a camera assembly, a position sensor, and a controller. The camera assembly is configured to capture a plurality of images of a target at a plurality of distances from the target. The position sensor is configured to capture, for each of the plurality of images, corresponding position data associated with a relative distance between the camera assembly and the target. The controller is configured to, for each of a plurality of regions within the plurality of images: determine corresponding gradient values within the plurality of images; determine a corresponding maximum gradient value from the corresponding gradient values; and determine a depth measurement for the region based on the corresponding maximum gradient and the corresponding position data captured for an image from the plurality of images that includes the corresponding maximum gradient.Type: ApplicationFiled: October 30, 2019Publication date: February 27, 2020Inventors: Ozkan Celik, Patricia A. Schulze, Gregory J. Freeman, Paul Z. Wirth, Tommaso Vercesi
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Publication number: 20190373162Abstract: A depth measuring apparatus includes (1) a camera and lens assembly that captures image data for a sequence of images of a target including a plurality of depth levels; (2) a motion stage on which the camera and lens assembly or the target is positioned; (3) a motor connected to the motion stage that causes relative movement between the camera and lens assembly and the target at defined incremental values; (4) a position sensor that captures position data on the camera and lens assembly or the target at each of the defined incremental values; and (5) a controller that processes the captured image data and captured position data using an image gradient method and optimal focal distance to determine depths of the plurality of depth levels. Numerous other aspects are provided.Type: ApplicationFiled: June 5, 2018Publication date: December 5, 2019Inventors: Ozkan Celik, Patricia A. Schulze, Gregory J. Freeman, Paul Z. Wirth, Tommaso Vercesi
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Patent number: D938373Type: GrantFiled: October 25, 2019Date of Patent: December 14, 2021Assignee: Applied Materials, Inc.Inventors: Jason M. Schaller, Benjamin Riordon, Mitchell DiSanto, Paul Forderhase, Gary Wyka, Jeffrey Hudgens, Paul Z. Wirth, Charles T. Carlson, Siva Chandrasekar, Michael Carrell, Venkata Raghavaiah Chowdhary Kode, Dmitry A. Dzilno, Juan Carlos Rocha-Alvarez