Patents by Inventor Paulus Albertus Maria GASSELING

Paulus Albertus Maria GASSELING has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and method of manufacturing a device
    Patent number: 9606445
    Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.
    Type: Grant
    Filed: July 30, 2013
    Date of Patent: March 28, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Arthur Winfried Eduardus Minnaert, Marcel Johannus Elisabeth Hubertus Muitjens, Andrei Mikhailovich Yakunin, Luigi Scaccabarozzi, Hans Joerg Mallmann, Kurstat Bal, Carlo Cornelis Maria Luijten, Han-Kwang Nienhuys, Alexander Marinus Arnoldus Huijberts, Paulus Albertus Maria Gasseling, Pedro Julian Rizo Diago, Maarten Van Kampen, Nicolaas Aldegonda Jan Maria Van Aerle
  • Lithographic Apparatus and Method of Manufacturing a Device
    Publication number: 20150192861
    Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.
    Type: Application
    Filed: July 30, 2013
    Publication date: July 9, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Arthur Winfried Eduardus Minnaert, Johannus Elisabeth Hubertus Muitjens, Andrei Mikhailovich Yakunin, Luigi Scaccabarozzi, Hans Joerg Mallmann, Kurstat Bal, Carlo Cornelis Maria Luijten, Han-Kwang Nienhuys, Alexander Marinus Arnoldus Huijberts, Paulus Albertus Maria Gasseling, Pedro Julian Rizo Diago, Maarten Van Kampen, Nicolaas Aldegonda Jan Maria Van Aerle
  • Lithographic apparatus and component with repeating structure having increased thermal accommodation coefficient
    Patent number: 8970818
    Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, and a projection system configured to project a patterned radiation beam onto a target portion of the substrate. A surface of a component of the lithographic apparatus that is in a vacuum environment in use is provided with a repeating structure configured to increase the effective thermal accommodation coefficient of the surface.
    Type: Grant
    Filed: May 23, 2012
    Date of Patent: March 3, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Han-Kwang Nienhuys, Franciscus Johannes Joseph Janssen, Sven Pekelder, Roger Wilhelmus Antonius Henricus Schmitz, Alexander Marinus Arnoldus Huijberts, Paulus Albertus Maria Gasseling
  • LITHOGRAPHIC APPARATUS AND COMPONENT
    Publication number: 20120300187
    Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, and a projection system configured to project a patterned radiation beam onto a target portion of the substrate. A surface of a component of the lithographic apparatus that is in a vacuum environment in use is provided with a repeating structure configured to increase the effective thermal accommodation coefficient of the surface.
    Type: Application
    Filed: May 23, 2012
    Publication date: November 29, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Han-Kwang NIENHUYS, Franciscus Johannes Joseph JANSSEN, Sven PEKELDER, Roger Wilhelmus Antonius Henricus SCHMITZ, Alexander Marinus Arnoldus HUIJBERTS, Paulus Albertus Maria GASSELING