Patents by Inventor Paulus Liebregts

Paulus Liebregts has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060127811
    Abstract: A device manufacturing method includes projecting a patterned beam of radiation through an optics compartment and a channel that provides an open connection between the optics compartment and a substrate compartment onto a substrate, maintaining an ionized flush gas at a higher pressure in the channel than in the substrate compartment and in the optics compartment during the projecting, intercepting particles that emanate from the substrate with the ionized flush gas, pumping the flush gas carrying the intercepted particles from the substrate compartment using a pump coupled to a gas outlet coupled to at least one of the compartments, and establishing an electrical potential difference between a wall of the channel and the outlet and/or a rotor of the pump so that the outlet and/or the rotor of the pump attracts positively charged ions that stem from the flush gas in the channel.
    Type: Application
    Filed: December 9, 2004
    Publication date: June 15, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Josephina Moors, Robertus Jacobus Van Ballegoij, Vadim Banine, Gert-Jan Heerens, Frederik Elisabeth Heuts, Johannes Wilhelmus Jacobs, Paulus Liebregts, Hendrik Johannes Neerhof
  • Publication number: 20060109442
    Abstract: A lithographic apparatus includes an illumination system configured to provide a beam of radiation and projection system configured to project the radiation beam onto a target portion of a substrate. At least one of the illumination system and the projection system includes a focusing element for reflecting or refracting the beam. A plurality of stop discs is provided, each having an aperture therethrough, together with a disc positioner configured to place one of the stop discs adjacent the focusing element to control the numerical aperture (NA) of the projection system or illumination system. The apparatus further includes a disc changer configured to select one of the stop discs and provide the selected stop disc to the disc positioner, the disc changer being external to the projection system or illumination system.
    Type: Application
    Filed: November 24, 2004
    Publication date: May 25, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Erik Loopstra, Petrus Bartray, Antonius Van Dijsseldonk, Paulus Liebregts
  • Publication number: 20060007414
    Abstract: A lithographic apparatus is disclosed. The apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. A projection system is configured to project the patterned radiation beam onto a target portion of a substrate. A first vacuum environment contains the projection system, a second vacuum environment contains the patterning device support, and a separator separates the first and second vacuum environments. The separator includes an aperture for passing the projection beam from the first vacuum environment towards the patterning device and/or vice-versa. The patterning device forms at least part of a seal for substantially sealing the aperture of the separator.
    Type: Application
    Filed: July 12, 2004
    Publication date: January 12, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bernardus Antonius Luttikhuis, Petrus Bartray, Johannes Henricus Jacobs, Thijs Harink, Paulus Liebregts
  • Publication number: 20050139784
    Abstract: A lithographic apparatus includes an illumination system for providing a beam of radiation. The lithographic apparatus further includes: a support structure for supporting patterning device, the patterning device serving to impart the beam with a pattern in its cross-section; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic apparatus includes a vacuum system in which at least the illumination system and the substrate table are present. The vacuum system includes at least two separate vacuum modules. A first vacuum module includes at least the projection system and/or the illumination system. A second vacuum module includes the substrate table. At least two of the vacuum modules are connected to each other via a closable connection.
    Type: Application
    Filed: December 24, 2003
    Publication date: June 30, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Pertrus Bartray, Mustafa Amhaouch, Angelo Van Engelen, Paulus Liebregts, Tim Meesters
  • Publication number: 20050068511
    Abstract: A lithographic apparatus uses the control signal from a computer to drive two spatial light modulators to pattern two separate projection beams for projection onto two substrates.
    Type: Application
    Filed: November 23, 2004
    Publication date: March 31, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Paulus Liebregts, Arno Bleeker, Erik Loopstra, Harry Borggreve
  • Publication number: 20050018157
    Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a substrate support for supporting at least one substrate, a radiation system for providing at least one beam of radiation, and a vacuum chamber. The vacuum chamber includes a patterning device and/or a projection system. The patterning device is arranged for patterning the beam of radiation according to a desired pattern, and the projection system is arranged for projecting the patterned beam of radiation onto a target portion of the substrate. The apparatus also includes at least one thermal shield for thermally conditioning at least part of the apparatus. The thermal shield includes particle transmission channels for transmitting particles through the shield, from a first side of the shield to a second side of the shield.
    Type: Application
    Filed: June 25, 2004
    Publication date: January 27, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wilhelmus Box, Johannes Wilhelmus Jacobs, Paulus Liebregts, Thijs Harink