Patents by Inventor Paulus Maria Liebregts

Paulus Maria Liebregts has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device and device manufacturing method
    Publication number: 20060158628
    Abstract: A immersion lithographic apparatus is disclosed in which one or more liquid diverters are positioned in a space surrounded by a liquid confinement structure. A function of the liquid diverter(s) is to hinder the formation of one or more recirculation zones of immersion liquid which may lead to variations in refractive index of the immersion liquid in the space and thereby imaging errors.
    Type: Application
    Filed: January 12, 2006
    Publication date: July 20, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Paulus Maria Liebregts, Johannes Wilhelmus Jacobs, Tammo Uitterdijk