Patents by Inventor Paulus Wilhelmus Leonardus Van Dijk

Paulus Wilhelmus Leonardus Van Dijk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electronically-steered Ku-band phased array antenna comprising an integrated photonic beamformer
    Patent number: 9397397
    Abstract: A phased-array antenna that includes a photonic beamformer is disclosed. In some embodiments, a front stage of electrical-domain processing applies a 16-to-1 signal-combination ratio, a single stage of photonic beamforming applies a 4-to-1 signal-combination ratio, and a passive, electrical-domain, signal combiner applies a 32-to-1 signal-combination ratio.
    Type: Grant
    Filed: October 3, 2012
    Date of Patent: July 19, 2016
    Assignee: Universiteit Twente
    Inventors: Willem Paul Beeker, Chris Gerardus Hermanus Roeloffzen, Leimeng Zhuang, Johannes Wilhelmus Eikenbroek, Paul Klatser, Paulus Wilhelmus Leonardus van Dijk
  • Lithographic method and carrier substrate
    Patent number: 8029973
    Abstract: A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic substrate may be handled by a conventional lithographic apparatus.
    Type: Grant
    Filed: November 24, 2008
    Date of Patent: October 4, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Wilhelmus Johannes Maria De Laat, Cheng-Qun Gui, Peter Theodorus Maria Giesen, Paulus Wilhelmus Leonardus Van Dijk, Erwin Rinaldo Meinders, Maria Peter
  • Lithographic method and patterning device
    Patent number: 7879514
    Abstract: A lithographic method includes patterning a beam of radiation with a patterning device. The patterning device includes at least two image patterning portions and at least two metrology mark patterning portions. The method also includes projecting at least two image portions of the patterned beam of radiation sequentially onto target portions of a substrate such that the projected image portions are substantially adjacent to each other on the substrate and collectively form a composite image on the substrate. The method also includes projecting a metrology mark onto the substrate outside of the area of the composite image at the same time as projecting each of at least two of the image portions, and measuring the alignment of the metrology marks to determine the relative positions of the at least two image portions.
    Type: Grant
    Filed: August 4, 2006
    Date of Patent: February 1, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Geoffrey Norman Phillipps, Cheng-Qun Gui, Rudy Jan Maria Pellens, Paulus Wilhelmus Leonardus Van Dijk
  • Lithographic apparatus and method
    Patent number: 7626681
    Abstract: According to an aspect of the present invention, there is provided a lithographic apparatus that includes a substrate carrier arranged to hold a substrate in position using an electrostatic force. The substrate carrier is provided with an integral power source. The apparatus also includes a substrate table for holding the substrate carrier.
    Type: Grant
    Filed: December 28, 2005
    Date of Patent: December 1, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Budiman Sutedja, Rudy Jan Maria Pellens, Johannes Paulus Adrianus Maria Van Den Heuvel, Paulus Wilhelmus Leonardus Van Dijk
  • LITHOGRAPHIC METHOD AND CARRIER SUBSTRATE
    Publication number: 20090170025
    Abstract: A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic substrate may be handled by a conventional lithographic apparatus.
    Type: Application
    Filed: November 24, 2008
    Publication date: July 2, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wilhelmus Johannes Maria DE LAAT, Cheng-Qun GUI, Peter Theodorus Maria GIESEN, Paulus Wilhelmus Leonardus VAN DIJK, Erwin Rinaldo MEINDERS, Maria PETER
  • Lithographic method and patterning device
    Publication number: 20080032203
    Abstract: A lithographic method includes patterning a beam of radiation with a patterning device. The patterning device includes at least two image patterning portions and at least two metrology mark patterning portions. The method also includes projecting at least two image portions of the patterned beam of radiation sequentially onto target portions of a substrate such that the projected image portions are substantially adjacent to each other on the substrate and collectively form a composite image on the substrate. The method also includes projecting a metrology mark onto the substrate outside of the area of the composite image at the same time as projecting each of at least two of the image portions, and measuring the alignment of the metrology marks to determine the relative positions of the at least two image portions.
    Type: Application
    Filed: August 4, 2006
    Publication date: February 7, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Geoffrey Norman Phillipps, Cheng-Qun Gui, Rudy Jan Maria Pellens, Paulus Wilhelmus Leonardus Van Dijk