Patents by Inventor Paulus Z. A. M. Van der Putte

Paulus Z. A. M. Van der Putte has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing semiconductor devices, in which material is deposited from a reaction gas, and apparatus for carrying out such a method
    Patent number: 4615909
    Abstract: A number of wafer slices of semiconductor material are heated in a reactor tube arranged inside a furnace tube with the reactor tube having openings through which a reaction gas is passed for depositing semiconductor material on the wafer slices. This is effected by producing in the furnace tube a flow of reaction gas along the outer side walls of the reactor tube and by passing only a part of this flow through the openings into the reactor tube. By using this method, particles of large size and different composition, which may be formed in the reaction gas, are prevented from being deposited on the wafer slices.
    Type: Grant
    Filed: April 15, 1985
    Date of Patent: October 7, 1986
    Assignee: U.S. Philips Corporation
    Inventors: Henri J. Thijssen, Antonius J. M. Uijen, Paulus Z. A. M. Van der Putte