Patents by Inventor Pavel ALEXEEV

Pavel ALEXEEV has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for producing a reflecting optical element of a projection exposure apparatus and reflecting optical element for a projection exposure apparatus, projection lens and projection exposure apparatus
    Patent number: 11415892
    Abstract: A method for producing a reflecting optical element for a projection exposure apparatus (1). The element has a substrate (30) with a substrate surface (31), a protection layer (38) and a layer partial system (39) suitable for the EUV wavelength range. The method includes: (a) measuring the substrate surface (31), (b) irradiating the substrate (30) with electrons (36), and (c) tempering the substrate (30). Furthermore, an associated reflective optical element for the EUV wavelength range, a projection lens with a mirror (18, 19, 20) as reflective optical element, and a projection exposure apparatus (1) including such a projection lens.
    Type: Grant
    Filed: January 12, 2021
    Date of Patent: August 16, 2022
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Matthias Kaes, Steffen Bezold, Matthias Manger, Christoph Petri, Pavel Alexeev, Walter Pauls
  • METHOD FOR PRODUCING A REFLECTING OPTICAL ELEMENT OF A PROJECTION EXPOSURE APPARATUS AND REFLECTING OPTICAL ELEMENT FOR A PROJECTION EXPOSURE APPARATUS, PROJECTION LENS AND PROJECTION EXPOSURE APPARATUS
    Publication number: 20210157244
    Abstract: A method for producing a reflecting optical element for a projection exposure apparatus (1). The element has a substrate (30) with a substrate surface (31), a protection layer (38) and a layer partial system (39) suitable for the EUV wavelength range. The method includes: (a) measuring the substrate surface (31), (b) irradiating the substrate (30) with electrons (36), and (c) tempering the substrate (30). Furthermore, an associated reflective optical element for the EUV wavelength range, a projection lens with a mirror (18, 19, 20) as reflective optical element, and a projection exposure apparatus (1) including such a projection lens.
    Type: Application
    Filed: January 12, 2021
    Publication date: May 27, 2021
    Inventors: Matthias KAES, Steffen BEZOLD, Matthias MANGER, Christoph PETRI, Pavel ALEXEEV, Walter PAULS