Abstract: This application discloses ZnO film transistor-based immunosensors (ZnO-bioTFT), 2T biosensor arrays formed from two integrated ZnO-bioTFTs, 1T1R-based nonvolatile memory (NVM) arrays formed from ZnO-bioTFT (T) integrated with ZnO-based resistive switches (R), as well as integrated bioTFT (IBTFT) sensor systems formed from 2T biosensor arrays and 1T1R NVM arrays. Through biofunctionalization, these biosensors can perform immunosensing with high sensitivity and selectivity, and therefore have a wide range of applications, for example, in detecting target biomolecules or small molecules, and potential application in cancer diagnosis and treatment.

Abstract: A dynamic and noninvasive method of monitoring the adhesion and proliferation of biological cells through multimode operation (acoustic and optical) using a ZnO nanostructure-modified quartz crystal microbalance (ZnOnano-QCM) biosensor is disclosed.

Abstract: A dynamic and noninvasive method of monitoring the adhesion and proliferation of biological cells through multimode operation (acoustic and optical) using a ZnO nanostructure-modified quartz crystal microbalance (ZnOnano-QCM) biosensor is disclosed.

Abstract: A grating fabrication process utilizes real-time measurement of a grating characteristic (such as, for example, grating period chirp, reflectivity, group delay) as a feedback error signal to modify the writing process and improve the characteristics of the finished grating. A test beam is launched through the optical medium during the writing process (or at the end of an initial writing process) and a particular characteristic is measured and used to generate a “corrective” apodization refractive index profile that can be incorporated with the grating to improve its characteristics. The improvements may be applied to a phase (or amplitude) mask used to write the grating (etching, local deformation, coating changes, for example), or the grating itself may be corrected using additional UV exposure, non-uniform annealing, non-uniform heating, and/or non-uniform tension—these techniques applied separately or in an intermittent sequence.

Abstract: A grating fabrication process utilizes real-time measurement of a grating characteristic (such as, for example, grating period chirp, reflectivity, group delay) as a feedback error signal to modify the writing process and improve the characteristics of the finished grating. A test beam is launched through the optical medium during the writing process (or at the end of an initial writing process) and a particular characteristic is measured and used to generate a “corrective” apodization refractive index profile that can be incorporated with the grating to improve its characteristics. The improvements may be applied to a phase (or amplitude) mask used to write the grating (etching, local deformation, coating changes, for example), or the grating itself may be corrected using additional UV exposure, non-uniform annealing, non-uniform heating, and/or non-uniform tension—these techniques applied separately or in an intermittent sequence.