Abstract: The invention describes a heating system (100) and a corresponding method of heating a heating surface (180) of an object (150, 950) to a processing temperature of at least 100° C., wherein the heating system (100) comprises semiconductor light sources (115), and wherein the heating system (100) is adapted to heat an area element of the heating surface (180) with at least 50 semiconductor light sources (115) at the same time. The heating system (100) may be part of a reactor for processing semiconductor structures. The light emitted by means of the semiconductor light sources (115) overlaps at the heating surface (180). Differences of the characteristic of one single semiconductor light source (115) may be blurred at the heating surface (180) such that a homogeneous temperature distribution across a processing surface of a, for example, wafer may be enabled.

Abstract: The invention relates to a lighting apparatus (1) comprising an array (2) of light sources (3) emitting emission cones (4) with edges (5) which intersect in an intersection plane and a lens unit (7) for homogenizing the intensity distribution in the far field. The array of the light sources and the lens unit are arranged such that i) the emission cones traverse the lens unit and ii) the distance (s) between the array of the light sources and the lens unit deviates from the sum of or the difference between a) the focal length f of the lens unit and b) the distance t between the intersection plane and the array (2) of the light sources (3) by 20 percent or less. This configuration leads to an intermixture of the emission cones in the far field such that the intensity distribution in the far field is substantially homogeneous.

Abstract: An apparatus (1) for profiling the depth of a surface of a target object (30), having a two-dimensional array of lasers (5), an optical device (15) for projecting a two-dimensional illumination pattern (31) onto an area of the surface of the target object, an image capture device (10) arranged to capture an image of the two-dimensional illumination pattern projected onto the area of the surface of the target object and a processor (25) configured to process the captured image in order to reconstruct a depth profile of the two-dimensional area of the surface of the target object from the image captured by the image capture device.

Abstract: The invention describes a heating system (100) and a corresponding method of heating a heating surface (180) of an object (150, 950) to a processing temperature of at least 100° C., wherein the heating system (100) comprises semiconductor light sources (115), and wherein the heating system (100) is adapted to heat an area element of the heating surface (180) with at least 50 semiconductor light sources (115) at the same time. The heating system (100) may be part of a reactor for processing semiconductor structures. The light emitted by means of the semiconductor light sources (115) overlaps at the heating surface (180). Differences of the characteristic of one single semiconductor light source (115) may be blurred at the heating surface (180) such that a homogeneous temperature distribution across a processing surface of a, for example, wafer may be enabled.

Abstract: The invention describes a method of heating a preform (1) characterized by a radius (R), a material thickness (t), and a material absorption spectrum, which method comprises the steps of selecting, depending on a desired temperature profile, a desired effective absorption coefficient for the preform (1) on the basis of the preform radius (R) and material thickness (t); generating a laser radiation beam (L) comprising radiation with a wavelength spectrum compiled on the basis of absorption coefficients of the absorption spectrum to satisfy the effective absorption coefficient and directing the laser radiation beam (L) at the preform (1) to heat the preform (1). The invention further describes a driving arrangement (7) for controlling a laser radiation generating unit (9) of a preform heating system (10), a preform heating system (10), and a computer program.

Abstract: An apparatus (1) for profiling the depth of a surface of a target object (30), having a two-dimensional array of lasers (5), an optical device (15) for projecting a two-dimensional illumination pattern (31) onto an area of the surface of the target object, an image capture device (10) arranged to capture an image of the two-dimensional illumination pattern projected onto the area of the surface of the target object and a processor (25) configured to process the captured image in order to reconstruct a depth profile of the two-dimensional area of the surface of the target object from the image captured by the image capture device.

Abstract: The invention relates to a lighting apparatus (1) comprising an array (2) of light sources (3) emitting emission cones (4) with edges (5) which intersect in an intersection plane and a lens unit (7) for homogenizing the intensity distribution in the far field. The array of the light sources and the lens unit are arranged such that i) the emission cones traverse the lens unit and ii) the distance (s) between the array of the light sources and the lens unit deviates from the sum of or the difference between a) the focal length f of the lens unit and b) the distance t between the intersection plane and the array (2) of the light sources (3) by 20 percent or less. This configuration leads to an intermixture of the emission cones in the far field such that the intensity distribution in the far field is substantially homogeneous.

Abstract: In this method an arc-length control value, indicating the current length of a discharge arc of the gas-discharge lamp (1), is monitored and the lamp (1) is driven in a first operation mode (OMP) with a first current wave-shape when the arc-length control value indicates that the arc-length is higher than a switching threshold, which first current wave-shape is selected to result in a tip (31) growing on an electrode (30) of the lamp (1), and the lamp (1) is driven in a second operation mode (OMn) with a second current wave-shape when the arc-length control value indicates that the arc-length is lower than a switching threshold, which second current wave-shape is selected such that the tip (31) on the electrode (30) is at least partly melted back.

Abstract: The invention describes a method of heating a preform (1) characterized by a radius (R), a material thickness (t), and a material absorption spectrum, which method comprises the steps of selecting, depending on a desired temperature profile, a desired effective absorption coefficient for the preform (1) on the basis of the preform radius (R) and material thickness (t); generating a laser radiation beam (L) comprising radiation with a wavelength spectrum compiled on the basis of absorption coefficients of the absorption spectrum to satisfy the effective absorption coefficient and directing the laser radiation beam (L) at the preform (1) to heat the preform (1). The invention further describes a driving arrangement (7) for controlling a laser radiation generating unit (9) of a preform heating system (10), a preform heating system (10), and a computer program.

Abstract: The invention describes a method for operation of a mercury vapour discharge lamp (1) in an image rendering system (30), wherein during a total operation time necessary for the presentation of an image content (C), the lamp (1) is deliberately operated in a saturated operating regime at least over a part of the total operation time according to a brightness parameter (BP) of the content (C), in which saturated operating regime mercury is condensed in an arc tube (2) of the lamp (1), and, at least over another part of the operation time, the lamp (1) is driven in an unsaturated operating regime, in which essentially the entire mercury evaporates. Thereby, the duration of the operation periods in the saturated and the unsaturated operation regime are chosen so that no significant blackening of the walls of the arc tube (2) arises during the total operation time of the lamp.

Abstract: The invention describes a method of driving a discharge lamp (1), wherein a blackening value (N) is determined, which blackening value (N) represents a level of blackening of the interior of the lamp (1), and a recovery parameter (2, T) is calculate based on the blackening value (N). When the lamp power is increased above the saturation power level, the lamp (1) is driven according to the recovery parameter (2, T) for the duration of a specific recovery time. The invention further describes a driving arrangement (70, 70?), and a projector system (10) comprising a high-pressure discharge lamp (1) and such a driving arrangement (70, 70?).

Abstract: A high-pressure mercury vapor discharge lamp (1) comprising an envelope (2) of high temperature resistant material having a discharge vessel (3) and two electrodes (5, 6) extending from two seal portions (4) into the discharge vessel (3), the two electrodes having an electrode gap (de) smaller than or equal to 2.5 mm, preferably smaller than or equal to 1.5 mm, is described. The discharge vessel (3) contains a filling which essentially comprises the following substances: rare gas, oxygen, halogen consisting of chlorine, bromine, iodine, or a mixture thereof, as well as mercury in a quantity greater than or equal to 0.15 mg/mm3. The seal portions (4) have a cross-sectional area of between 6 mm2 and 20 mm2, preferably approximately 10 mm2. A method of manufacturing such a high-pressure mercury vapor discharge lamp (1) and a projector system for such a high-pressure mercury vapor discharge lamp (1) are also described.

Abstract: A high-pressure mercury vapor discharge lamp (1) comprising an envelope (2) of high temperature resistant material having a discharge vessel (3) and two electrodes (5, 6) extending from two seal portions (4) into the discharge vessel (3), the two electrodes having an electrode gap (de) smaller than or equal to 2.5 mm, preferably smaller than or equal to 1.5 mm, is described. The discharge vessel (3) contains a filling which essentially comprises the following substances: rare gas, oxygen, halogen consisting of chlorine, bromine, iodine, or a mixture thereof, as well as mercury in a quantity greater than or equal to 0.15 mg/mm3? The seal portions (4) have a cross-sectional area of between 6 mm2 and 20 mm2, preferably approximately 10 mm2. A method of manufacturing such a high-pressure mercury vapor discharge lamp (1) and a projector system for such a high-pressure mercury vapor discharge lamp (1) are also described.

Abstract: The invention describes a method of driving a gas-discharge lamp (1), wherein the lamp (1) is driven at any one time using one of a number of driving schemes, and wherein the lamp (1) is driven at a nominal operating power (Pnom) or at a reduced operating power (Pdim). When the lamp is being driven at the nominal operating power (Pnom), a driving scheme switch-over occurs according to a relationship between a first target voltage (VT1) and the operating voltage of the lamp (1), and, when the lamp is being driven at the reduced operating power (Pdim), a driving scheme switch-over occurs according to a relationship between a second target voltage (VT2) and the operating voltage of the lamp (1), which second target voltage (VT2) is determined on the basis of the reduced operating power (Pdim). The invention further describes a driving unit (10) for driving a gas-discharge lamp (1) according to this method.

Abstract: In this method an arc-length control value, indicating the current length of a discharge arc of the gas-discharge lamp (1), is monitored and the lamp (1) is driven in a first operation mode (OMP) with a first current wave-shape when the arc-length control value indicates that the arc-length is higher than a switching threshold, which first current wave-shape is selected to result in a tip (31) growing on an electrode (30) of the lamp (1), and the lamp (1) is driven in a second operation mode (OMn) with a second current wave-shape when the arc-length control value indicates that the arc-length is lower than a switching threshold, which second current wave-shape is selected such that the tip (31) on the electrode (30) is at least partly melted back.

Abstract: The invention describes a method of driving a discharge lamp (1), wherein a blackening value (N) is determined, which blackening value (N) represents a level of blackening of the interior of the lamp (1), and a recovery parameter (2, T) is calculate based on the blackening value (N). When the lamp power is increased above the saturation power level, the lamp (1) is driven according to the recovery parameter (2, T) for the duration of a specific recovery time. The invention further describes a driving arrangement (70, 70), and a projector system (10) comprising a high-pressure discharge lamp (1) and such a driving arrangement (70, 70).

Abstract: A method and a circuit arrangement operate a discharge lamp, such as a high-intensity discharge lamp (HID) or ultra high performance lamps (UHP). The discharge lamp has first and second operating phases with a higher first or a lower second frequency of the lamp's alternating current (AC). The operating phases are activated alternatively at defined intervals and for defined periods of time, in order to achieve a stable arc discharge and only a low burnout or rise in burning voltage of the lamp during its life by configuring certain forms of electrode tips.

Abstract: The invention describes a method for operation of a mercury vapour discharge lamp (1) in an image rendering system (30), wherein during a total operation time necessary for the presentation of an image content (C), the lamp (1) is deliberately operated in a saturated operating regime at least over a part of the total operation time according to a brightness parameter (BP) of the content (C), in which saturated operating regime mercury is condensed in an arc tube (2) of the lamp (1), and, at least over another part of the operation time, the lamp (1) is driven in an unsaturated operating regime, in which essentially the entire mercury evaporates. Thereby, the duration of the operation periods in the saturated and the unsaturated operation regime are chosen so that no significant blackening of the walls of the arc tube (2) arises during the total operation time of the lamp.

Abstract: Methods for preventing blackening of a gas filled arc tube of a mercury vapour discharge lamp. Lamp voltage and slope, as well as lamp current and slope are analyzed to determine the state of mercury saturation of the gas in the arc tube. A first control signal is sent to alter the lamp power and a second control signal is sent to alter the level of cooling of the lamp according to the state of mercury saturation. Methods for driving a mercury vapour discharge lamp using a monitoring arrangement and analyzing unit to dynamically control the lamp power and the level of cooling of the lamp are described.

Abstract: A method and a circuit arrangement for operating a discharge lamp, in particular during the first hours of operation after lamp manufacture, are described. The method and the circuit arrangement are provided in particular for high-pressure gas discharge lamps (HID or high intensity discharge lamps or UHP or ultra high performance lamps). Furthermore, a lighting unit with a discharge lamp and such a circuit arrangement and a projection system with a projection display and such a lighting unit are described. Switching-over between various modes of operation with different operating frequencies serves to avoid that the burning voltage of the lamp drops into a region of a minimum voltage of a lamp driver unit below which the latter can no longer drive the lamp with its rated power or a desired power.