Patents by Inventor Pavel Stejskal

Pavel Stejskal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12117406
    Abstract: A method and apparatus for detection of charged particles in spectroscopy. Charged particles, received from an energy dispersive spectroscopic analyser as a charged particle beam, are accelerated towards a detector. The accelerated charged particles are received at an array of detecting pixels, the array of detecting pixels forming the detector. The charged particles arriving at the detector have a spread in the energy dispersive direction.
    Type: Grant
    Filed: November 9, 2020
    Date of Patent: October 15, 2024
    Assignees: VG Systems Limited, FEI Company
    Inventors: Bryan Barnard, Pavel Stejskal
  • Patent number: 12099024
    Abstract: A method of analyzing a sample imaged by electron backscatter diffraction. The method comprises identifying a plurality of Kikuchi bands in an electron backscatter diffraction image of a position on the sample. The method further comprises forming, for each identified Kikuchi band, a respective vector representation of said Kikuchi band based at least in part on an estimate of the position on the sample. A configuration of the sample is determined by identifying a particular set of expected vector representations from a plurality of sets of expected vector representations as matching the vector representations of the plurality of identified Kikuchi bands.
    Type: Grant
    Filed: March 3, 2020
    Date of Patent: September 24, 2024
    Assignees: FEI Company, VG Systems Limited
    Inventors: Austin Penrose Day, Christopher James Stephens, Pavel Stejskal, Martin Petrek
  • Patent number: 11976388
    Abstract: A method and associated device and system are provided for recording trash in a fiber preparation system having a plurality of cleaning points and a transport line that is connected to the cleaning points and is guided into a central container connected to a negative pressure source for generating transport air. The trash is suctioned from each cleaning point through the transport line with the transport air to the central container and is feed separately from each cleaning point to the central container. In the central container, the trash is separated from the transport air and transferred into a scale for weighing. With the trash located on the scale, an optical recording of the trash is made with a camera directed to an interior of the scale.
    Type: Grant
    Filed: August 4, 2021
    Date of Patent: May 7, 2024
    Assignee: Maschinenfabrik Rieter AG
    Inventors: Tobias Wolfer, Petr Cevona, Pavel Stejskal
  • Patent number: 11676795
    Abstract: The invention relates to system and method of inspecting a specimen with a plurality of charged particle beamlets. The method comprises the steps of providing a specimen, providing a plurality of charged particle beamlets and focusing said plurality of charged particle beamlets onto said specimen, and detecting a flux of radiation emanating from the specimen in response to said irradiation by said plurality of charged particle beamlets.
    Type: Grant
    Filed: March 3, 2021
    Date of Patent: June 13, 2023
    Assignee: FEI Company
    Inventors: Pavel Stejskal, Bohuslav Sed'a, Petr Hlavenka, Libor Novák, Jan Stopka
  • Publication number: 20220381713
    Abstract: A method and apparatus for detection of charged particles in spectroscopy. Charged particles, received from an energy dispersive spectroscopic analyser as a charged particle beam, are accelerated towards a detector. The accelerated charged particles are received at an array of detecting pixels, the array of detecting pixels forming the detector. The charged particles arriving at the detector have a spread in the energy dispersive direction.
    Type: Application
    Filed: November 9, 2020
    Publication date: December 1, 2022
    Inventors: Bryan Barnard, Pavel Stejskal
  • Publication number: 20220136985
    Abstract: A method of analyzing a sample imaged by electron backscatter diffraction. The method comprises identifying a plurality of Kikuchi bands in an electron backscatter diffraction image of a position on the sample. The method further comprises forming, for each identified Kikuchi band, a respective vector representation of said Kikuchi band based at least in part on an estimate of the position on the sample. A configuration of the sample is determined by identifying a particular set of expected vector representations from a plurality of sets of expected vector representations as matching the vector representations of the plurality of identified Kikuchi bands.
    Type: Application
    Filed: March 3, 2020
    Publication date: May 5, 2022
    Applicants: VG SYSTEMS LIMITED, FEI Company
    Inventors: Austin Penrose DAY, Christopher James STEPHENS, Pavel STEJSKAL, Martin PETREK
  • Publication number: 20220042213
    Abstract: A method and associated device and system are provided for recording trash in a fiber preparation system having a plurality of cleaning points and a transport line that is connected to the cleaning points and is guided into a central container connected to a negative pressure source for generating transport air. The trash is suctioned from each cleaning point through the transport line with the transport air to the central container and is feed separately from each cleaning point to the central container. In the central container, the trash is separated from the transport air and transferred into a scale for weighing. With the trash located on the scale, an optical recording of the trash is made with a camera directed to an interior of the scale.
    Type: Application
    Filed: August 4, 2021
    Publication date: February 10, 2022
    Inventors: Tobias Wolfer, Petr Cevona, Pavel Stejskal
  • Patent number: 11195693
    Abstract: Dynamic band contrast image (DBCI) is constructed with scattering patterns acquired at multiple scanning locations of a sample using a charged particle beam. Each pixel of the DBCI is generated by integrating the corresponding scattering pattern along a diffraction band. The DBCI includes charged particle channeling condition and can be used for detecting sample defects.
    Type: Grant
    Filed: May 29, 2020
    Date of Patent: December 7, 2021
    Assignee: FEI Company
    Inventors: Tomá{hacek over (s)} Vystav{hacek over (e)}l, Pavel Stejskal
  • Publication number: 20210375582
    Abstract: Dynamic band contrast image (DBCI) is constructed with scattering patterns acquired at multiple scanning locations of a sample using a charged particle beam. Each pixel of the DBCI is generated by integrating the corresponding scattering pattern along a diffraction band. The DBCI includes charged particle channeling condition and can be used for detecting sample defects.
    Type: Application
    Filed: May 29, 2020
    Publication date: December 2, 2021
    Applicant: FEI Company
    Inventors: Tomás Vystavêl, Pavel Stejskal
  • Publication number: 20210296088
    Abstract: The invention relates to system and method of inspecting a specimen with a plurality of charged particle beamlets. The method comprises the steps of providing a specimen, providing a plurality of charged particle beamlets and focusing said plurality of charged particle beamlets onto said specimen, and detecting a flux of radiation emanating from the specimen in response to said irradiation by said plurality of charged particle beamlets.
    Type: Application
    Filed: March 3, 2021
    Publication date: September 23, 2021
    Applicant: FEI Company
    Inventors: Pavel Stejskal, Bohuslav Sed'a, Petr Hlavenka, Libor Novák, Jan Stopka
  • Patent number: 11114275
    Abstract: Various methods and systems are provided for acquiring electron backscatter diffraction patterns. In one example, a first scan is performed by directing a charged particle beam towards multiple impact points within a ROI and detecting particles scattered from the multiple impact points. A signal quality of each impact point of the multiple impact points is calculated based on the detected particles. A signal quality of the ROI is calculated based on the signal quality of each impact point. Responsive to the signal quality of the ROI lower than a threshold signal quality, a second scan of the ROI is performed. A structural image of the sample may be formed based on detected particles from both the first scan and the second scan.
    Type: Grant
    Filed: July 2, 2019
    Date of Patent: September 7, 2021
    Assignee: FEI Company
    Inventors: Pavel Stejskal, Christopher J. Stephens
  • Patent number: 10978272
    Abstract: The invention relates to a method of determining the thickness of a sample. According to this method, a diffraction pattern image of a sample of a first material is obtained. Said diffraction pattern image comprises at least image values representative for the diffraction pattern obtained for said sample. A slope of said image values is then determined. The slope is compared to a relation between the thickness of said first material and the slope of image value of a corresponding diffraction pattern image of said first material. The determined slope and said relation are used to determine the thickness of said sample.
    Type: Grant
    Filed: September 23, 2019
    Date of Patent: April 13, 2021
    Assignee: FEI Company
    Inventors: Tomas Vystavel, Pavel Stejskal, Marek Uncovsky
  • Patent number: 10937627
    Abstract: An electron microscope comprising: A specimen holder, for holding a specimen; An electron beam column, for producing an array of electron beams and concurrently irradiating an array of target areas of said specimen therewith; A scanning assembly, for producing relative scanning motion of said beam array with respect to the specimen; A detector, for detecting radiation emanating from the specimen in response to said irradiation, wherein said detector is: A backscattered electron detector that can be disposed proximal to the specimen at a side thereof facing said electron beam column; Provided with an array of apertures that allow passage of said electron beams from said column to the specimen; Provided with a functionally sub-divided detection surface that enables segregated detection of a backscattered electron flux produced by each individual beam.
    Type: Grant
    Filed: May 28, 2019
    Date of Patent: March 2, 2021
    Assignee: FEI Company
    Inventors: Pavel Stejskal, Petr Hlavenka, Bohuslav Sed'a
  • Publication number: 20210005420
    Abstract: Various methods and systems are provided for acquiring electron backscatter diffraction patterns. In one example, a first scan is performed by directing a charged particle beam towards multiple impact points within a ROI and detecting particles scattered from the multiple impact points. A signal quality of each impact point of the multiple impact points is calculated based on the detected particles. A signal quality of the ROI is calculated based on the signal quality of each impact point. Responsive to the signal quality of the ROI lower than a threshold signal quality, a second scan of the ROI is performed. A structural image of the sample may be formed based on detected particles from both the first scan and the second scan.
    Type: Application
    Filed: July 2, 2019
    Publication date: January 7, 2021
    Applicant: FEI Company
    Inventors: Pavel Stejskal, Christopher J. Stephens
  • Publication number: 20200135427
    Abstract: The invention relates to a method of determining the thickness of a sample. According to this method, a diffraction pattern image of a sample of a first material is obtained. Said diffraction pattern image comprises at least image values representative for the diffraction pattern obtained for said sample. A slope of said image values is then determined. The slope is compared to a relation between the thickness of said first material and the slope of image value of a corresponding diffraction pattern image of said first material. The determined slope and said relation are used to determine the thickness of said sample.
    Type: Application
    Filed: September 23, 2019
    Publication date: April 30, 2020
    Applicant: FEI Company
    Inventors: Tomas Vystavel, Pavel Stejskal, Marek Uncovsky
  • Publication number: 20190378681
    Abstract: An electron microscope comprising: A specimen holder, for holding a specimen; An electron beam column, for producing an array of electron beams and concurrently irradiating an array of target areas of said specimen therewith; A scanning assembly, for producing relative scanning motion of said beam array with respect to the specimen; A detector, for detecting radiation emanating from the specimen in response to said irradiation, wherein said detector is: A backscattered electron detector that can be disposed proximal to the specimen at a side thereof facing said electron beam column; Provided with an array of apertures that allow passage of said electron beams from said column to the specimen; Provided with a functionally sub-divided detection surface that enables segregated detection of a backscattered electron flux produced by each individual beam.
    Type: Application
    Filed: May 28, 2019
    Publication date: December 12, 2019
    Applicant: FEI Company
    Inventors: Pavel Stejskal, Petr Hlavenka, Bohuslav Sed'a
  • Patent number: 9958403
    Abstract: A method of investigating a specimen using X-ray tomography, comprising (a) mounting the specimen to a specimen holder, (b) irradiating the specimen with a beam of X-rays along a first line of sight through the specimen, and (c) detecting a flux of X-rays transmitted through the specimen and forming a first image. Then (d) repeating the steps (b) and (c) for a series of different lines of sight through the specimen, thereby producing a corresponding series of images.
    Type: Grant
    Filed: October 9, 2017
    Date of Patent: May 1, 2018
    Assignee: FEI Company
    Inventors: Pavel Stejskal, Marek Un{hacek over (c)}ovský, Tomá{hacek over (s)} Vystav{hacek over (e)}l, Alan Frank de Jong, Bart Buijsse, Pierre Bleuet
  • Publication number: 20180100815
    Abstract: A method of investigating a specimen using X-ray tomography, comprising (a) mounting the specimen to a specimen holder, (b) irradiating the specimen with a beam of X-rays along a first line of sight through the specimen, and (c) detecting a flux of X-rays transmitted through the specimen and forming a first image. Then (d) repeating the steps (b) and (c) for a series of different lines of sight through the specimen, thereby producing a corresponding series of images.
    Type: Application
    Filed: October 9, 2017
    Publication date: April 12, 2018
    Applicant: FEI Company
    Inventors: Pavel Stejskal, Marek Uncovský, Tomás Vystavel, Alan Frank de Jong, Bart Buijsse, Pierre Bleuet
  • Patent number: 9618463
    Abstract: The invention relates to a method of acquiring an Energy Backscattering Pattern image of a sample in a charged particle apparatus, the sample showing a flat surface, the charged particle apparatus equipped with an electron column for producing a finely focused electron beam, a position sensitive detector for detecting EBSP patterns, and a sample holder for holding and positioning the sample, the method comprising the steps of: Positioning the sample with respect to the electron beam, Directing the electron beam to an impact point on the sample, thereby causing backscattered electrons to irradiate the detector, and Acquiring the signal from the detector while the beam is kept stationary, in which The detector is equipped to selectively detect electrons with an energy above a predefined threshold, and The signal of the electrons with an energy above said threshold is used to form an EBSP image.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: April 11, 2017
    Assignee: FEI Company
    Inventors: Marek Un{hacek over (c)}ovský, Pavel Stejskal, Tomá{hacek over (s)} Vystav{hacek over (e)}l
  • Publication number: 20160054240
    Abstract: The invention relates to a method of acquiring an Energy Backscattering Pattern image of a sample in a charged particle apparatus, the sample showing a flat surface, the charged particle apparatus equipped with an electron column for producing a finely focused electron beam, a position sensitive detector for detecting EBSP patterns, and a sample holder for holding and positioning the sample, the method comprising the steps of: Positioning the sample with respect to the electron beam, Directing the electron beam to an impact point on the sample, thereby causing backscattered electrons to irradiate the detector, and Acquiring the signal from the detector while the beam is kept stationary, in which The detector is equipped to selectively detect electrons with an energy above a predefined threshold, and The signal of the electrons with an energy above said threshold is used to form an EBSP image.
    Type: Application
    Filed: August 24, 2015
    Publication date: February 25, 2016
    Applicant: FEI Company
    Inventors: Marek Uncovský, Pavel Stejskal, Tomás Vystavel