Abstract: An alternating phase shift mask for use with extreme ultraviolet lithography is provided. A substrate with a planar top surface is used as a base for the phase shift mask. A spacer layer serves as a Fabry-Perot cavity for controlling the phase shift difference between two adjacent surfaces of the phase shift mask and controlling the reflectivity from the top of the second multilayer. A protective layer serves as an etch stop layer to protect a first multilayer region in certain regions of the phase shift mask, while other regions of the phase shift mask utilize a second multilayer region for achieving a phase shift difference. Some embodiments may further include an absorber layer region to provide areas with no reflectance, in addition to the areas of alternating phase shift. Embodiments of the present invention may be used to monitor the focus and aberration of a lithography tool.

Abstract: An apparatus and method is provided for removing smudges (624) including oils and dust from portable electronic displays (110, 150, 200, 300, 334). The apparatus comprises a display device (600, 700, 800, 900) positioned within a housing (102, 104), having a surface (601) viewable through an opening in the housing (102, 104) and a susceptibility to receiving contaminants (624). Gradients are formed on the display device (600, 700, 800, 900) for providing a differential surface tension that causes the smudges (624) to migrate across the viewable surface of the display device (600, 700, 800, 900). The gradients may be, for example, thermal (604, 605), electrical (702, 708), optical (804), or surface wettability (904).

Abstract: A portable electronic device (32, 50, 60, 90) and method is provided wherein the portable electronic device embodies a flexible structural form that may be made rigid for use. The portable electronic device (32, 50, 60, 90) comprises a housing (10) including a plurality of blocks (12, 82) contiguously positioned between first and second films (14, 16, 84). One of an electrorheological or a magnetorheological material (18, 86) is positioned between each of the plurality of blocks (12, 82). Electronics positioned within the housing (10) include circuitry for applying one of an electric field and a magnetic field to the respective electrorheological and magnetorheological material (18, 86).

Abstract: A method is provided for patterning monolithically integrated features having a 1:1 ratio. The method comprises forming a first etch barrier layer (18) over a base layer (14) and applying (52) a template (20) to pattern (52) first printed features (26) in the first etch barrier layer (18). The first etch barrier layer (18) is etched (54) to form second printed features (32) in the base layer (14). A second etch barrier layer (34) is formed over the base layer (14) and the template (20) is applied to pattern (58) third printed features (38) in the second etch barrier layer (34). The second etch barrier layer (34) is etched (60) to form fourth printed features (42) in the base layer (14).

Abstract: A method is provided for fabricating a fuel cell that requires only front side alignment techniques to fabricate gas access holes. The method comprises etching the front side of a substrate (12) to provide a channel (24, 26), and forming a pedestal (54, 88) on the front side of the substrate, wherein the pedestal (54, 88) comprises an anode side (56, 89) defining a fuel region (68, 102) aligned with the channel (24, 26). An electrolyte (46, 96) is positioned between the anode side (56, 89) and a cathode side (58, 90), and the fuel region (68, 102) is capped with an insulator (66, 98). A portion of the substrate (12) is removed from a back side to expose the channel (24, 26).

Abstract: A method for fabricating a patterning mask is disclosed in which a membrane layer is deposited on a first surface of a substrate. Patterned and unpatterned portions of the substrate are then defined on a second surface of the substrate. A majority of the thickness of substrate in the unpatterned portions is then dry etched to partially define a strut having sidewalls that are substantially perpendicular to the first surface. Wet etching is then performed to etch through the remaining thickness of the substrate to expose the bottom surface of the membrane layer and completely define the strut. Scattering elements may then be formed over the membrane layer. In one embodiment, the substrate is silicon and has a (110) orientation and an edge of the silicon struts is aligned to a {111} plane. In another embodiment, an edge of the silicon struts is aligned to a {221} plane.