Patents by Inventor Payam Tayebati
Payam Tayebati has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20180181007Abstract: An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.Type: ApplicationFiled: November 1, 2017Publication date: June 28, 2018Inventors: Bernhard Gellrich, Jens Kugler, Thomas Ittner, Stefan Hembacher, Karl-Heinz Schimitzek, Payam Tayebati, Hubert Holderer
-
Patent number: 9810996Abstract: An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.Type: GrantFiled: November 3, 2014Date of Patent: November 7, 2017Assignee: Carl Zeiss SMT GmbHInventors: Bernhard Gellrich, Jens Kugler, Thomas Ittner, Stefan Hembacher, Karl-Heinz Schimitzek, Payam Tayebati, Hubert Holderer
-
Publication number: 20150109591Abstract: An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.Type: ApplicationFiled: November 3, 2014Publication date: April 23, 2015Inventors: Bernhard Gellrich, Jens Kugler, Thomas Ittner, Stefan Hembacher, Karl-Heinz Schimitzek, Payam Tayebati, Hubert Holderer
-
Patent number: 8902401Abstract: An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.Type: GrantFiled: December 12, 2012Date of Patent: December 2, 2014Assignee: Carl Zeiss SMT GmbHInventors: Bernhard Gellrich, Jens Kugler, Thomas Ittner, Stefan Hembacher, Karl-Heinz Schimitzek, Payam Tayebati, Hubert Holderer
-
Patent number: 8891172Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.Type: GrantFiled: March 11, 2009Date of Patent: November 18, 2014Assignee: Carl Zeiss SMT GmbHInventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner
-
Patent number: 8508854Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.Type: GrantFiled: December 13, 2010Date of Patent: August 13, 2013Assignee: Carl Zeiss SMT GmbHInventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner
-
Patent number: 8363206Abstract: An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.Type: GrantFiled: November 7, 2008Date of Patent: January 29, 2013Assignee: Carl Zeiss SMT GmbHInventors: Bernhard Gellrich, Jens Kugler, Thomas Ittner, Stefan Hembacher, Karl-Heinz Schimitzek, Payam Tayebati, Hubert Holderer
-
Patent number: 8325322Abstract: The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.Type: GrantFiled: February 4, 2010Date of Patent: December 4, 2012Assignee: Carl Zeiss SMT GmbHInventors: Markus Hauf, Ulrich Schoenhoff, Payam Tayebati, Michael Thier, Tilmann Heil, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner, Aksel Goehnermeier, Dirk Hellweg
-
Patent number: 7990622Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.Type: GrantFiled: October 1, 2010Date of Patent: August 2, 2011Assignee: Carl Zeiss SMT GmbHInventors: Olaf Conradi, Boris Bittner, Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi, Baerbel Schwaer, Jochen Weber, Hubert Holderer, Payam Tayebati
-
Publication number: 20110080569Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.Type: ApplicationFiled: December 13, 2010Publication date: April 7, 2011Applicant: Carl Zeiss SMT GmbHInventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner
-
Publication number: 20110019169Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.Type: ApplicationFiled: October 1, 2010Publication date: January 27, 2011Applicant: CARL ZEISS SMT AGInventors: Olaf Conradi, Boris Bittner, Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi, Baerbel Schwaer, Jochen Weber, Hubert Holderer, Payam Tayebati
-
Patent number: 7830611Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.Type: GrantFiled: January 9, 2008Date of Patent: November 9, 2010Assignee: Carl Zeiss SMT AGInventors: Olaf Conradi, Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi, Baerbel Schwaer, Jochen Weber, Hubert Holderer, Payam Tayebati, Boris Bittner
-
Publication number: 20100201958Abstract: The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.Type: ApplicationFiled: February 4, 2010Publication date: August 12, 2010Applicant: Carl Zeiss SMT AGInventors: Markus Hauf, Ulrich Schoenhoff, Payam Tayebati, Michael Thier, Tilmann Heil, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner, Aksel Goehnermeier, Dirk Hellweg
-
Publication number: 20090257032Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.Type: ApplicationFiled: March 11, 2009Publication date: October 15, 2009Applicant: CARL ZEISS SMT AGInventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner
-
Publication number: 20090135385Abstract: An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.Type: ApplicationFiled: November 7, 2008Publication date: May 28, 2009Applicant: CARL ZEISS SMT AGInventors: Bernhard Gellrich, Jens Kugler, Thomas Ittner, Stefan Hembacher, Karl-Heinz Schimitzek, Payam Tayebati, Hubert Holderer
-
Publication number: 20080239503Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.Type: ApplicationFiled: January 9, 2008Publication date: October 2, 2008Applicant: CARL ZEISS SMT AGInventors: Olaf Conradi, Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi, Baerbel Schwaer, Jochen Weber, Hubert Holderer, Payam Tayebati, Boris Bittner