Patents by Inventor Peer MUKINOVIC

Peer MUKINOVIC has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and device for depositing a layer containing a group five element in a process chamber and subsequent cleaning of the process chamber
    Patent number: 12723309
    Abstract: A method for depositing layers containing a group five element on a substrate, in which process gas is fed into a process chamber. After depositing the layer, the process chamber is cleaned as follows. The process chamber is heated to a first cleaning temperature. After reaching the first cleaning temperature, a halogen or a halogen compound is fed into the process chamber in a first cleaning step. After the first cleaning step, the process chamber is brought to a second cleaning temperature. After reaching the second cleaning temperature, O2 is fed into the process chamber in a second cleaning step. After the second cleaning step, the process chamber is brought to a third cleaning temperature. After reaching the third cleaning temperature, substantially only H2 is fed into the process chamber in a third cleaning step. After the third cleaning step, the process chamber is cooled.
    Type: Grant
    Filed: December 1, 2022
    Date of Patent: September 1, 2026
    Assignee: AIXTRON SE
    Inventors: Ilio Miccoli, Hassan Larhrib, Peer Mukinovic
  • METHOD AND DEVICE FOR DEPOSITING A LAYER CONTAINING A GROUP FIVE ELEMENT IN A PROCESS CHAMBER AND SUBSEQUENT CLEANING OF THE PROCESS CHAMBER
    Publication number: 20250019823
    Abstract: A method for depositing layers containing a group five element on a substrate, in which process gas is fed into a process chamber. After depositing the layer, the process chamber is cleaned as follows. The process chamber is heated to a first cleaning temperature. After reaching the first cleaning temperature, a halogen or a halogen compound is fed into the process chamber in a first cleaning step. After the first cleaning step, the process chamber is brought to a second cleaning temperature. After reaching the second cleaning temperature, O2 is fed into the process chamber in a second cleaning step. After the second cleaning step, the process chamber is brought to a third cleaning temperature. After reaching the third cleaning temperature, substantially only H2 is fed into the process chamber in a third cleaning step. After the third cleaning step, the process chamber is cooled.
    Type: Application
    Filed: December 1, 2022
    Publication date: January 16, 2025
    Inventors: Ilio MICCOLI, Hassan LARHRIB, Peer MUKINOVIC