Abstract: The present disclosure describes a method of patterning a semiconductor wafer using extreme ultraviolet lithography (EUVL). The method includes receiving an EUVL mask that includes a substrate having a low temperature expansion material, a reflective multilayer over the substrate, a capping layer over the reflective multilayer, and an absorber layer over the capping layer. The method further includes patterning the absorber layer to form a trench on the EUVL mask, wherein the trench has a first width above a target width. The method further includes treating the EUVL mask with oxygen plasma to reduce the trench to a second width, wherein the second width is below the target width. The method may also include treating the EUVL mask with nitrogen plasma to protect the capping layer, wherein the treating of the EUVL mask with the nitrogen plasma expands the trench to a third width at the target width.

Abstract: A system includes a mask. The system further includes a pellicle frame attached to the mask. The pellicle frame includes a check valve, wherein the check valve is configured to permit gas flow from a first side of the pellicle from to a second side of the pellicle frame. The pellicle frame further includes a flat bottom surface having only a single recess therein, wherein the flat bottom surface is free of an adhesive. The system further includes a gasket within the single recess.

Abstract: A pellicle for an extreme ultraviolet (EUV) photomask includes a pellicle frame and a main membrane attached to the pellicle frame. The main membrane includes a plurality of nanotubes, and each of the plurality of nanotubes is covered by a coating layer containing Si and one or more metal elements.

Abstract: In a method of cleaning a photo mask, the photo mask is placed on a support such that a pattered surface faces down, and an adhesive sheet is applied to edges of a backside surface of the photo mask.

Abstract: A method includes forming a test pattern and a reference pattern in an absorption layer of a photomask structure. The test pattern has a first trench and a second trench, the reference pattern has a third trench and a fourth trench, the test pattern and the reference pattern have substantially the same dimension in a top view, and the second trench is deeper than the first trench, the third trench, and the fourth trench. The method further includes emitting a light beam to the test pattern to obtain a first interference pattern reflected from the test pattern, emitting the light beam to the reference pattern to obtain a second interference pattern reflected from the reference pattern; and comparing the first interference pattern with the second interference pattern to obtain a measured complex refractive index of the absorption layer.

Abstract: In a method of manufacturing a pellicle for an extreme ultraviolet (EUV) photomask, a nanotube layer including a plurality of carbon nanotubes is formed, the nanotube layer is attached to a pellicle frame, and a solvent dipping treatment is performed to the nanotube layer by applying bubbles in a solvent to the nanotube layer.

Abstract: A mobile apparatus with automatic detection and communication of voice and digital data. The mobile apparatus has a voice module for processing a voice signal and communication means for serial transmission and reception of a digital data signal. Also, the mobile apparatus includes a connector, a processor and a selection unit. The connector has a first, second and third terminal used to receive and transmit a first, second and third signal respectively. The processor detects the third signal periodically and employs conversion means for converting the first signal into a voltage value to set a selection signal when the third signal is detected at a predetermined state. According to the selection signal, the selection unit establishes a first path between the connector and the communication means or establishes a second path between the connector and the voice module to pass the first and the second signals.

Abstract: A mobile apparatus with automatic detection and communication of voice and digital data. The mobile apparatus has a voice module for processing a voice signal and communication means for serial transmission and reception of a digital data signal. Also, the mobile apparatus includes a connector, a processor and a selection unit. The connector has a first, second and third terminal used to receive and transmit a first, second and third signal respectively. The processor detects the third signal periodically and employs conversion means for converting the first signal into a voltage value to set a selection signal when the third signal is detected at a predetermined state. According to the selection signal, the selection unit establishes a first path between the connector and the communication means or establishes a second path between the connector and the voice module to pass the first and the second signals.