Patents by Inventor Pei-Chung Hsu

Pei-Chung Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Phase shift mask for extreme ultraviolet lithography and method of fabricating same
    Patent number: 8765330
    Abstract: A mask and method of fabricating same are disclosed. In an example, a mask includes a substrate, a reflective multilayer coating disposed over the substrate, an Ag2O absorber layer disposed over the reflective multilayer coating, and a tantalum-containing absorber layer disposed over the Ag2O absorber layer. The tantalum-containing absorber layer is disposed over the Ag2O absorber layer outside a mask image region of the mask, such that the mask image region of the mask is free of the tantalum-containing absorber layer. In an example, the tantalum-containing absorber layer is disposed over the Ag2O absorber layer adjacent to the mask image region.
    Type: Grant
    Filed: August 1, 2012
    Date of Patent: July 1, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Tsung Shih, Pei-Chung Hsu, Shinn-Sheng Yu, Tsiao-Chen Wu, Yen-Cheng Lu, Shu-Hao Chang, Chia-Jen Chen, Hsin-Chang Lee, Anthony Yen