Patents by Inventor Pei-Lin Chang
Pei-Lin Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7279093Abstract: The present invention discloses a module for processing foaming wastewater containing organic compounds. The UV/ozone oxidation removal module mainly includes an ozone generator, an ozone injector, an ozone dissolution tank, a gas-liquid separator, an ozone destruct unit, a UV reaction tank, a recycling pipeline. The gas-liquid separator contains a stainless tank with an adsorbent inside, preferably activated carbon, for removing foams and a portion of ozone, so that foams are prevented from entering and adversely affecting the ozone destruct unit, and thus a foaming organic wastewater can be treated with the UV/ozone oxidation removal module of the present invention.Type: GrantFiled: January 24, 2005Date of Patent: October 9, 2007Assignee: Industrial Technology Research InstituteInventors: Kon-Tsu Kin, Pei-Lin Chang, Kuang-An Yang
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Publication number: 20070151582Abstract: A supercritical fluid washing method and system in which a supercritical fluid washing system employs a supercritical fluid to clean the surface of materials possessing surface microstructures, and where a supercritical fluid is used to soak, wash, and dry elements; the element surface may include nanometer pores or high aspect ratio microstructures. This supercritical fluid washing method is able to remove impurities or water vapor from the surface of elements.Type: ApplicationFiled: December 7, 2006Publication date: July 5, 2007Applicant: Industrial Technology Research InstituteInventors: Kon-Tsu Kin, Chiou-Mei Chen, Pei-Lin Chang, Yi-Ching Chen
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Publication number: 20070144974Abstract: A method and system for reducing trace organic matter from ultrapure water is applied to removal of trace organic matter from ultrapure water having a total organic carbon (TOC) level less than 1ppb, so as to avoid leaching of trace organic matter from the ion exchange resin used in the system. The trace organic matter in the ultrapure water is degraded into charged ions, and further treated with a continuous electrodeionization unit to remove the charged ions, so as to reduce the TOC level and increase the resistance value of the ultrapure water.Type: ApplicationFiled: December 18, 2006Publication date: June 28, 2007Inventors: Kon-Tsu Kin, Pei-Lin Chang, Chien-Hung Chen, Chiou-Mei Chen
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Publication number: 20070134437Abstract: A surface treatment method for material with surface microstructure includes the steps of subjecting the material surface to a dry-type free-radical oxidation treatment, and using a supercritical fluid to purge the surface of the material with surface microstructure, so as to remove oxidized and bond-broken small molecules from the material surface. The surface microstructure may include nanoholes or high-aspect-ratio microstructures. Small molecules or moistures in the nanoholes or the high-aspect-ratio microstructures are carried by the supercritical fluid away from the material with surface microstructure.Type: ApplicationFiled: December 11, 2006Publication date: June 14, 2007Inventors: Kon-Tsu Kin, Pei-Lin Chang, Chiou-Mei Chen, Yi-Ching Chen
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Patent number: 7124764Abstract: The present invention discloses a method for removing impurities from a porous material by flowing a supercritical fluid with or without a modifier therein over a to-be-cleaned porous material having pores at the nanometer level under suitable temperatures and pressures, so that the supercritical fluid migrates into the pores at the nanometer level and removes impurities entrapped therein. The method of the present invention uses the physical and chemical properties of the supercritical fluid and optionally the modifier to clean the porous material without using an acid or alkaline solvent. The method of the present invention conserves water, and is both a highly efficient and environmentally friendly cleaning technique.Type: GrantFiled: December 29, 2004Date of Patent: October 24, 2006Assignee: Industrial Technology Research InstituteInventors: Kon-Tsu Kin, Chiou-Mei Chen, Pei-Lin Chang, Hsiao-Fen Cheng
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Publication number: 20060137718Abstract: The present invention discloses a method for removing impurities from a porous material by flowing a supercritical fluid with or without a modifier therein over a to-be-cleaned porous material having pores at the nanometer level under suitable temperatures and pressures, so that the supercritical fluid migrates into the pores at the nanometer level and removes impurities entrapped therein. The method of the present invention uses the physical and chemical properties of the supercritical fluid and optionally the modifier to clean the porous material without using an acid or alkaline solvent. The method of the present invention conserves water, and is both a highly efficient and environmentally friendly cleaning technique.Type: ApplicationFiled: December 29, 2004Publication date: June 29, 2006Applicant: Industrial Technology Research InstituteInventors: Kon-Tsu Kin, Chiou-Mei Chen, Pei-Lin Chang, Hsiao-Fen Cheng
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Patent number: 6991733Abstract: In order to reduce a total organic carbon (TOC) in ultrapure water to a level less than 1 ppb, several cycles of ozone contact/UV irradiation treatments are carried out in sequence. Preferably, the first cycle further includes an ion exchange treatment which is applied to the resulting UV irradiation water.Type: GrantFiled: May 25, 2004Date of Patent: January 31, 2006Assignee: Industrial Technology Research InstituteInventors: Kon-Tsu Kin, Pei-Lin Chang, Farhang Shadman, Hsiao-Fen Cheng
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Publication number: 20050263458Abstract: In order to reduce a total organic carbon (TOC) in ultrapure water to a level less than 1 ppb, several cycles of ozone contact/UV irradiation treatments are carried out in sequence. Preferably, the first cycle further includes an ion exchange treatment which is applied to the resulting UV irradiation water.Type: ApplicationFiled: May 25, 2004Publication date: December 1, 2005Applicant: Industrial Technology Research InstituteInventors: Kon-Tsu Kin, Pei-Lin Chang, Farhang Shadman, Hsiao-Fen Cheng
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Publication number: 20050126972Abstract: The present invention discloses a module for processing foaming wastewater containing organic compounds. The UV/ozone oxidation removal module mainly includes an ozone generator, an ozone injector, an ozone dissolution tank, a gas-liquid separator, an ozone destruct unit, a UV reaction tank, a recycling pipeline. The gas-liquid separator contains a stainless tank with an adsorbent inside, preferably activated carbon, for removing foams and a portion of ozone, so that foams are prevented from entering and adversely affecting the ozone destruct unit, and thus a foaming organic wastewater can be treated with the UV/ozone oxidation removal module of the present invention.Type: ApplicationFiled: January 24, 2005Publication date: June 16, 2005Applicant: Industrial Technology Research InstituteInventors: Kon-Tsu Kin, Pei-Lin Chang, Kuang-An Yang
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Publication number: 20050121398Abstract: The present invention relates to a process and a system for processing waste water containing organic compounds. The system includes a UV/ozone oxidation removal module, or one or more removal modules connected in series whereas such a serial connection can be continuous or discontinuous. A UV/ozone oxidation removal module mainly includes an ozone generator, an ozone injector, an ozone dissolution tank, an ozone decomposition device, a UV reaction tank, a recycling pipeline. The efficiency of the UV/ozone oxidation removal module is controlled by the recycling ratio, the ozone concentration, and the intensity of UV light.Type: ApplicationFiled: January 10, 2005Publication date: June 9, 2005Applicant: Industrial Technology Research InstituteInventors: Kon-Tsu Kin, Pei-Lin Chang
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Patent number: 6893559Abstract: The present invention relates to a process and a system for processing waste water containing organic compounds. The system includes a UV/ozone oxidation removal module, or one or more removal modules connected in series whereas such a serial connection can be continuous or discontinuous. A UV/ozone oxidation removal module mainly includes an ozone generator, an ozone injector, an ozone dissolution tank, an ozone decomposition device, a UV reaction tank, a recycling pipeline. The efficiency of the UV/ozone oxidation removal module is controlled by the recycling ratio, the ozone concentration, and the intensity of UV light.Type: GrantFiled: December 6, 2002Date of Patent: May 17, 2005Assignee: Industrial Technology Research InstituteInventors: Kon-Tsu Kin, Pei-Lin Chang
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Publication number: 20030106855Abstract: The present invention relates to a process and a system for processing waste water containing organic compounds. The system includes a UV/ozone oxidation removal module, or one or more removal modules connected in series whereas such a serial connection can be continuous or discontinuous. A UV/ozone oxidation removal module mainly includes an ozone generator, an ozone injector, an ozone dissolution tank, an ozone decomposition device, a UV reaction tank, a recycling pipeline. The efficiency of the UV/ozone oxidation removal module is controlled by the recycling ratio, the ozone concentration, and the intensity of UV light.Type: ApplicationFiled: December 6, 2002Publication date: June 12, 2003Applicant: Industrial Technology Research InstituteInventors: Kon-Tsu Kin, Pei-Lin Chang