Patents by Inventor Pei-Ming D. Chow

Pei-Ming D. Chow has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Focal plane imaging array with internal calibration source
    Patent number: 5438336
    Abstract: A focal plane imaging array (FPIA) (16) for use in a direct detection imaging device (10) for conducting radiometric imaging at microwave and millimeter-wave frequencies is disclosed as having an internal electronic calibration source (36). The plurality of energy detecting pixel elements (14) which comprise the FPIA (16) include a detection circuit (34) and a calibration circuit (36). The calibration circuit (36) is uni-directionally coupled to the detection circuit (34) to allow a known calibration signal "pulse" to be introduced into the detection circuit (34). The calibration pulse is processed by the pixel detection circuit and the output signal is compared with the pixel's responsivity value. Adjustments in the pixel gain and sensitivity may then be made as appropriate.
    Type: Grant
    Filed: November 12, 1993
    Date of Patent: August 1, 1995
    Assignee: TRW Inc.
    Inventors: Paul S. C. Lee, Pei-Ming D. Chow, John J. Berenz, Jay S. Pearlman, Wayne W. Lam
  • Dimension monitoring technique for semiconductor fabrication
    Patent number: 4639142
    Abstract: A method of visually monitoring the change in dimensions of elements on a surface of a semiconductor body during processing is provided. A fixed pattern of scale images on the surface with a predetermined distance between images, together with a wedge-shaped element is provided on the surface. The wedge element has an apex adjacent one of the images and extends in a direction along other ones of the images. The semiconductor body is processed and the dimensions of the wedge-shaped element (as well as the scale image) change. One may then subsequently visually inspect the wedge shaped element with respect to the pattern of images to determine the extent of the change in dimension of the wedge shaped element during processing.
    Type: Grant
    Filed: April 13, 1983
    Date of Patent: January 27, 1987
    Assignee: Rockwell International Corporation
    Inventors: Pei-Ming D. Chow, Keh-Fei C. Chi
  • Mask alignment measurement structure for semiconductor fabrication
    Patent number: 4571538
    Abstract: A method of quantitatively measuring the relative alignment of elements on a surface of a semiconductor body formed by two sequential masking steps during processing is provided. A fixed pattern of rectangular images are formed on a first mask; and a fixed pattern of repeating U-shaped images are formed on a second mask. The semiconductor body is processed so that the rectangular images on the first mask align with the U-shaped images on the second mask. An electrical probe is applied to opposed ends of the boustrophederal pattern formed and the electrical resistance measured to determine a parameter related to the relative alignment of elements on the semiconductor body.
    Type: Grant
    Filed: April 25, 1983
    Date of Patent: February 18, 1986
    Assignee: Rockwell International Corporation
    Inventor: Pei-Ming D. Chow