Abstract: A method to determine a process window is disclosed. First, a pattern data is provided. Second, a bias set is determined. Then, a resizing procedure is performed on the pattern data in accordance with the bias set to obtain a usable final resized pattern to be a target pattern of changed area. The final resized pattern is consistent with a minimum spacing rule, a contact to poly rule and a contact to metal rule. Accordingly, the target pattern is output.

Abstract: A method of verifying a layout pattern comprises separately steps of obtaining a simulated pattern at a lower portion of a film by using a layout pattern as a mask to transfer the layout pattern to the film, and obtaining a simulated pattern at an upper portion of the film by using the layout pattern as a mask to transfer the layout pattern to the film. The layout pattern is verified according to the upper and lower simulated patterns.

Abstract: A method for amending layout patterns is disclosed. First, a layout pattern after an optical proximity correction is provided, which is called an amended pattern. Later, a positive sizing procedure and a negative sizing procedure are respectively performed on the amended pattern to respectively obtain a positive sizing pattern and a negative sizing pattern. Then, the positive sizing pattern and the negative sizing pattern are respectively verified to know whether they are useable. Afterwards, the useable positive sizing pattern and the negative sizing pattern are output for the manufacture of a reticle when they are verified to be useable.

Abstract: A method to determine a process window is disclosed. First, a pattern data is provided. Second, a bias set is determined. Then, a resizing procedure is performed on the pattern data in accordance with the bias set to obtain a usable final resized pattern to be a target pattern of changed area. The final resized pattern is consistent with a minimum spacing rule, a contact to poly rule and a contact to metal rule. Accordingly, the target pattern is output.

Abstract: A method for correcting a photomask pattern is provided. The correcting method performs a verification of a focus-exposure matrix (FEM) and an overlay variation on a layout area having contact holes or vias in a layout pattern so as to generate a hint information. The layout pattern of the photomask is corrected according to the hint information to prevent the contact holes or vias from being exposed in arrangement to corresponding metal layer, poly layer, or diffusion layer.

Abstract: A method for amending layout patterns is disclosed. First, a layout pattern after an optical proximity correction is provided, which is called an amended pattern. Later, a positive sizing procedure and a negative sizing procedure are respectively performed on the amended pattern to respectively obtain a positive sizing pattern and a negative sizing pattern. Then, the positive sizing pattern and the negative sizing pattern are respectively verified to know whether they are useable. Afterwards, the useable positive sizing pattern and the negative sizing pattern are output for the manufacture of a reticle when they are verified to be useable.

Abstract: The present invention is to provide a system for enabling a user to know whereabouts of his or her missing mobile phone, which comprises a mobile phone and a remote controller. The mobile phone comprises a control module including a wireless transceiver unit for receiving a wireless search signal transmitted from the remote controller and adapted to convert the received wireless search signal into an instruction for controlling an output unit of the mobile phone consisting of a light emitting unit, a drive unit, an audio unit, and/or a display unit to generate corresponding light, vibration, sound, and/or display characters for alerting the user. The remote controller comprises a button which, when pressed by the user, causes the remote controller to generate the wireless search signal and transmit the same to the mobile phone for executing the corresponding instruction.

Abstract: A method of verifying a layout pattern comprises separately steps of obtaining a simulated pattern at a lower portion of a film by using a layout pattern as a mask to transfer the layout pattern to the film, and obtaining a simulated pattern at an upper portion of the film by using the layout pattern as a mask to transfer the layout pattern to the film. The layout pattern is verified according to the upper and lower simulated patterns.

Abstract: A portable electronic device including a first body, a second body, and at least one speaker is provided. The second body is pivotally connected to one side edge of the first body, such that the second body is selectively rotated to cover the first body, or to form an angle with respect to the first body. The speaker is movably disposed on an upper surface of the first body, and can be moved relative to the first body. Thus, the speaker can be moved and fixed to a predetermined position to achieve optimized output sound quality.

Abstract: A method for correcting a photomask pattern is provided. The correcting method performs a verification of a focus-exposure matrix (FEM) and an overlay variation on a layout area having contact holes or vias in a layout pattern so as to generate a hint information. The layout pattern of the photomask is corrected according to the hint information to prevent the contact holes or vias from being exposed in arrangement to corresponding metal layer, poly layer, or diffusion layer.

Abstract: A portable electronic device including a first body, a second body, and at least one speaker is provided. The second body is pivotally connected to one side edge of the first body, such that the second body is selectively rotated to cover the first body, or to form an angle with respect to the first body. The speaker is movably disposed on an upper surface of the first body, and can be moved relative to the first body. Thus, the speaker can be moved and fixed to a predetermined position to achieve optimized output sound quality.

Abstract: The present invention is to provide a system for enabling a user to know whereabouts of his or her missing mobile phone, which comprises a mobile phone and a remote controller. The mobile phone comprises a control module including a wireless transceiver unit for receiving a wireless search signal transmitted from the remote controller and adapted to convert the received wireless search signal into an instruction for controlling an output unit of the mobile phone consisting of a light emitting unit, a drive unit, an audio unit, and/or a display unit to generate corresponding light, vibration, sound, and/or display characters for alerting the user. The remote controller comprises a button which, when pressed by the user, causes the remote controller to generate the wireless search signal and transmit the same to the mobile phone for executing the corresponding instruction.