Patents by Inventor PeiYan Lin

PeiYan Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6686257
    Abstract: A method for transferring an epitaxy layer is provided. The method includes steps of (a) providing a first substrate, (b) forming a first epitaxy layer on the first substrate, (c) forming a masking layer having at least a pattern on the first epitaxy layer, (d) forming a second epitaxy layer on the masking layer, (e) bonding a second substrate to the second epitaxy layer, and (f) removing the masking layer and separating the second epitaxy layer from the first epitaxy layer, thereby the second epitaxy layer being transferred to the second substrate.
    Type: Grant
    Filed: October 4, 2002
    Date of Patent: February 3, 2004
    Assignee: National Chiao Tung University
    Inventors: YewChung Sermon Wu, PeiYan Lin
  • Publication number: 20040014297
    Abstract: A method for transferring an epitaxy layer is provided. The method includes steps of (a) providing a first substrate, (b) forming a first epitaxy layer on the first substrate, (c) forming a masking layer having at least a pattern on the first epitaxy layer, (d) forming a second epitaxy layer on the masking layer, (e) bonding a second substrate to the second epitaxy layer, and (f) removing the masking layer and separating the second epitaxy layer from the first epitaxy layer, thereby the second epitaxy layer being transferred to the second substrate.
    Type: Application
    Filed: October 4, 2002
    Publication date: January 22, 2004
    Applicant: National Chiao Tung University
    Inventors: YewChung Sermon Wu, PeiYan Lin