Patents by Inventor PEI-YI LlU

PEI-YI LlU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of Fabricating an Integrated Circuit with a Pattern Density-Outlier-Treatment for Optimized Pattern Density Uniformity
    Publication number: 20150371821
    Abstract: The present disclosure provides one embodiment of an IC method. First pattern densities (PDs) of a plurality of templates of an IC design layout are received. Then a high PD outlier template and a low PD outlier template from the plurality of templates are identified. The high PD outlier template is split into multiple subsets of template and each subset of template carries a portion of PD of the high PD outlier template. A PD uniformity (PDU) optimization is performed to the low PD outlier template and multiple individual exposure processes are applied by using respective subset of templates.
    Type: Application
    Filed: September 11, 2014
    Publication date: December 24, 2015
    Inventors: Jyuh-Fuh Lin, CHENG-HUNG CHEN, PEI-YI LlU, WEN-CHUAN WANG, SHY-JAY LIN, BURN JENG LIN