Patents by Inventor Pei-Yi Su

Pei-Yi Su has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9707571
    Abstract: A method of providing a liquid over a substrate is provided. The method includes providing the liquid over the substrate via a first opening of a flow path formed in a spray nozzle. The method further includes sucking back the liquid away from the first opening of the flow path. The method also includes holding the chemical solution in the flow path to keep a front surface of the chemical solution located in a tapered flow path section of the flow path.
    Type: Grant
    Filed: December 30, 2014
    Date of Patent: July 18, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD
    Inventors: Shih-Jhang Tian, Pei-Yi Su, Yi-Ming Dai
  • Publication number: 20170123328
    Abstract: A photolithography tool includes at least one process chamber, at least one front opening unified pod (FOUP) stage, at least one moving mechanism, and an image sensor. The moving mechanism is configured to move the wafer from the process chamber to the FOUP stage. The image sensor is configured to capture the image of the wafer on the moving mechanism.
    Type: Application
    Filed: October 30, 2015
    Publication date: May 4, 2017
    Inventors: Chia-Feng LIAO, Chun-Hsien LIN, Pei-Yi SU, Yi-Ming DAI, Chung-Hsing LEE, Chien-Ko LIAO, Chun-Yung CHANG, Nan-Jung CHEN, Pei-Yuan WU, Hsien-Mao HUANG
  • Publication number: 20160184839
    Abstract: A method of providing a liquid over a substrate is provided. The method includes providing the liquid over the substrate via a first opening of a flow path formed in a spray nozzle. The method further includes sucking back the liquid away from the first opening of the flow path. The method also includes holding the chemical solution in the flow path to keep a front surface of the chemical solution located in a tapered flow path section of the flow path.
    Type: Application
    Filed: December 30, 2014
    Publication date: June 30, 2016
    Inventors: Shih-Jhang TIAN, Pei-Yi SU, Yi-Ming DAI
  • Patent number: 9269135
    Abstract: Defect management systems and methods are disclosed. A system for managing defects on an object includes an automatic defect classification (ADC) module, a lithographic plane review (LPR) module, and a defect progression monitor (DPM) module in communication with the ADC module and the LPR module. The DPM module is adapted to obtain information regarding a defect disposed on the object from the ADC module and the LPR module and determine if a repair or cleaning is needed of the object.
    Type: Grant
    Filed: March 1, 2012
    Date of Patent: February 23, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yan-Wei Tien, Pei-Yi Su, You-Hong Huang, Ching-Cheng Wang
  • Publication number: 20160002300
    Abstract: A pharmaceutical composition for use in killing and/or inhibiting the growth and/or proliferation of a microorganism in a subject in need thereof, or for treating a subject afflicted with a microbial infection is disclosed. The composition comprises: (a) an effective amount of an isolated peptide, wherein the peptide comprises the arginine-rich carboxy-terminal region of hepatitis B virus core protein (HBc) and exhibits an antimicrobial activity; and (b) a pharmaceutically acceptable carrier. The peptide exhibits an activity against Gram-negative bacteria, Gram-positive bacteria, and/or fungi.
    Type: Application
    Filed: February 5, 2014
    Publication date: January 7, 2016
    Applicant: Academia Sinica
    Inventors: Chiaho Shih, Heng-Li Chen, Pei-Yi Su
  • Publication number: 20130231769
    Abstract: Defect management systems and methods are disclosed. A system for managing defects on an object includes an automatic defect classification (ADC) module, a lithographic plane review (LPR) module, and a defect progression monitor (DPM) module in communication with the ADC module and the LPR module. The DPM module is adapted to obtain information regarding a defect disposed on the object from the ADC module and the LPR module and determine if a repair or cleaning is needed of the object.
    Type: Application
    Filed: March 1, 2012
    Publication date: September 5, 2013
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yan-Wei Tien, Pei-Yi Su, You-Hong Huang, Ching-Cheng Wang