Patents by Inventor Peilei ZHANG

Peilei ZHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11175248
    Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam apparatus for inspecting a wafer including an improved scanning mechanism for detecting fast-charging defects is disclosed. An improved charged particle beam inspection apparatus may include a charged particle beam source that delivers charged particles to an area of the wafer and scans the area. The improved charged particle beam apparatus may further include a controller including a circuitry to produce multiple images of the area over a time sequence, which are compared to detect fast-charging defects.
    Type: Grant
    Filed: September 18, 2019
    Date of Patent: November 16, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Long Ma, Chih-Yu Jen, Zhonghua Dong, Peilei Zhang, Wei Fang, Chuan Li
  • Publication number: 20200088659
    Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam apparatus for inspecting a wafer including an improved scanning mechanism for detecting fast-charging defects is disclosed. An improved charged particle beam inspection apparatus may include a charged particle beam source that delivers charged particles to an area of the wafer and scans the area. The improved charged particle beam apparatus may further include a controller including a circuitry to produce multiple images of the area over a time sequence, which are compared to detect fast-charging defects.
    Type: Application
    Filed: September 18, 2019
    Publication date: March 19, 2020
    Inventors: Long MA, Chih-Yu JEN, Zhonghua DONG, Peilei ZHANG, Wei FANG, Chuan LI