Abstract: Machine learning systems and methods are disclosed for prediction of wound healing, such as for diabetic foot ulcers or other wounds, and for assessment implementations such as segmentation of images into wound regions and non-wound regions. Systems for assessing or predicting wound healing can include a light detection element configured to collect light of at least a first wavelength reflected from a tissue region including a wound, and one or more processors configured to generate an image based on a signal from the light detection element having pixels depicting the tissue region, determine reflectance intensity values for at least a subset of the pixels, determine one or more quantitative features of the subset of the plurality of pixels based on the reflectance intensity values, and generate a predicted or assessed healing parameter associated with the wound over a predetermined time interval.

Abstract: Optical proximity correction (OPC) is a technique used to compensate for optical distortions, process effects, or both, by modifying a pattern that is used during lithography. A reference OPC model is used to create an OPC design layout pattern based on pre-distorting a desired design layout pattern associated with an integrated circuit (IC). The OPC design layout pattern is used when the IC is produced, such that the fabricated IC ideally matches the desired design layout pattern. The present invention relates to using a regression OPC model to create estimated fragment movements of the desired design layout pattern. The estimated fragment movements are then provided as initial fragment movements to the reference OPC model, which then creates the OPC design layout pattern. The initial fragment movements provided by the regression OPC model may reduce the number of iterations needed by the reference OPC model, thereby reducing computation time.