Patents by Inventor Peiran Gao

Peiran Gao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8201110
    Abstract: Optical proximity correction (OPC) is a technique used to compensate for optical distortions, process effects, or both, by modifying a pattern that is used during lithography. A reference OPC model is used to create an OPC design layout pattern based on pre-distorting a desired design layout pattern associated with an integrated circuit (IC). The OPC design layout pattern is used when the IC is produced, such that the fabricated IC ideally matches the desired design layout pattern. The present invention relates to using a regression OPC model to create estimated fragment movements of the desired design layout pattern. The estimated fragment movements are then provided as initial fragment movements to the reference OPC model, which then creates the OPC design layout pattern. The initial fragment movements provided by the regression OPC model may reduce the number of iterations needed by the reference OPC model, thereby reducing computation time.
    Type: Grant
    Filed: April 14, 2009
    Date of Patent: June 12, 2012
    Assignee: The Regents of the University of California
    Inventors: Allan Gu, Avideh Zakhor, Peiran Gao