Patents by Inventor Pen-Li HUNG

Pen-Li HUNG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Chemical vapor deposition tool and operating method thereof
    Patent number: 10879049
    Abstract: A chemical vapor deposition (CVD) tool includes a processing chamber, a remote plasma system, a first gas source, a second gas source, a first gas passage and a second gas passage. The remote plasma system is connected to the processing chamber. The first gas passage connects the first gas source, the remote plasma system and the processing chamber. The second gas passage connects the second gas source and the processing chamber, and bypasses the remote plasma system.
    Type: Grant
    Filed: July 30, 2015
    Date of Patent: December 29, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chien-Ta Lee, Pen-Li Hung, Yu-Shan Shih
  • CHEMICAL VAPOR DEPOSITION TOOL AND OPERATING METHOD THEREOF
    Publication number: 20170032940
    Abstract: A chemical vapor deposition (CVD) tool includes a processing chamber, a remote plasma system, a first gas source, a second gas source, a first gas passage and a second gas passage. The remote plasma system is connected to the processing chamber. The first gas passage connects the first gas source, the remote plasma system and the processing chamber. The second gas passage connects the second gas source and the processing chamber, and bypasses the remote plasma system.
    Type: Application
    Filed: July 30, 2015
    Publication date: February 2, 2017
    Inventors: Chien-Ta LEE, Pen-Li HUNG, Yu-Shan SHIH