Patents by Inventor Pen-Shan Chao

Pen-Shan Chao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9288907
    Abstract: A microelectronic 3D packaging structure and a method of manufacturing the same are introduced. The microelectronic 3D packaging structure includes a first board with a plurality of a first edges and disposed with a first electronic device; a second board with a plurality of a second edges and disposed with a second electronic device, wherein at least one second edge of the second board is jointed to at least one first edge of the first board to form a joint line; and a joint connection portion disposed at the joint line of the two adjacent boards and adapted to function as a connection path for transmitting signals.
    Type: Grant
    Filed: March 18, 2014
    Date of Patent: March 15, 2016
    Assignee: NATIONAL CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Shao-Chung Hu, Kuo-Yang Horng, Ling-Yueh Yang, Wei-Ching Liu, Pen-Shan Chao, Kun-Feng Chen, Louis Lu-Chen Hsu
  • Publication number: 20150271921
    Abstract: A microelectronic 3D packaging structure and a method of manufacturing the same are introduced. The microelectronic 3D packaging structure includes a first board with a plurality of a first edges and disposed with a first electronic device; a second board with a plurality of a second edges and disposed with a second electronic device, wherein at least one second edge of the second board is jointed to at least one first edge of the first board to form a joint line; and a joint connection portion disposed at the joint line of the two adjacent boards and adapted to function as a connection path for transmitting signals.
    Type: Application
    Filed: March 18, 2014
    Publication date: September 24, 2015
    Applicant: CHUNG-SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY ARMAMENTS BUREAU, M.N.D.
    Inventors: SHAO-CHUNG HU, KUO-YANG HORNG, LING-YUEH YANG, WEI-CHING LIU, PEN-SHAN CHAO, KUN-FENG CHEN, LOUIS LU-CHEN HSU
  • Publication number: 20120181691
    Abstract: The present invention relates to a package structure, a packaging substrate and a chip. The package structure includes: a chip including a plurality of electrode pads on a surface thereof; a packaging substrate including a plurality of first conductive pads on a surface thereof; and a plurality of connecting units through which the electrode pads electrically communicate with the first conductive pads, in which the chip or the packaging substrate further includes a first surface finish layer over the electrode pads or the first conductive pads, and the first surface finish layer includes a Ni—Pd alloy layer. Accordingly, the surface finish method applied in a package structure, a packaging substrate and a chip has advantages of simple manufacture, low cost and high reliability.
    Type: Application
    Filed: June 23, 2011
    Publication date: July 19, 2012
    Applicant: National Tsing Hua University
    Inventors: Jenq-Gong DUH, Pen-Shan CHAO
  • Publication number: 20080255659
    Abstract: A MEMS-based fabrication process is disclosed to fabricate a hollow seamless drug-eluting stent. This stent fabrication process is characterized by using a photolithography process, a composite electroplating process, and a polishing process to mass-produce drug-eluting seamless stents. Combining a multi-layers photolithography process with a multi-layers composite electroforming process could make the formation of micro-holes, micro-caves, or micro-trenches integrated with this hollow seamless eluting-stent for any anti-thrombosis drug loading or filling.
    Type: Application
    Filed: October 29, 2007
    Publication date: October 16, 2008
    Inventors: Jung-Tang Huang, Pen-Shan Chao, Hou-Jun Hsu
  • Publication number: 20070184579
    Abstract: This invention is characteristic of combining an electroplating process with a polishing process to uniformly fabricate multi-layer flip chip copper pillar. All kinds of flip chip copper pillar with varied shapes and sizes are able to be defined by using multi-layer photolithography process commonly utilized in the semiconductor processes. After that, use both exposure and alignment procedures to accurately define multi-layer photoresist's patterns on the substrate. Some designated metallic materials are then electroplated on those completed well-defined patterns during the last photolithography process by means of an electroplating process. A polishing process follows the electroplating to level the rugged solder bumps, resulted from the impact on the certain changeable and inevitable electroplating parameters.
    Type: Application
    Filed: February 6, 2007
    Publication date: August 9, 2007
    Inventors: Jung-Tang Huang, Pen-Shan Chao, Hou-Jun Hsu