Patents by Inventor Peng Zang

Peng Zang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Top coat for lithography processes
    Publication number: 20070196773
    Abstract: The present invention provides a top coat composition comprising a silicon-containing polymer prepared by hydrolysis and condensation of at least one silica source; a solvent; optionally a catalyst; and optionally water, wherein the silicon-containing polymer depolymerizes upon exposure to an aqueous base-containing solution.
    Type: Application
    Filed: February 15, 2007
    Publication date: August 23, 2007
    Inventors: Scott Weigel, Peng Zang, Thomas Braymer, Gene Parris