Abstract: The present disclosure relates to the field of vapor deposition technologies, and discloses a vapor deposition method. The vapor deposition method includes: applying an exciting acoustic wave to the target, such that particles in a predetermined location of the target break away from the target and adhere to a predetermined region of the substrate when an energy of the particles is higher than an energy required for the particles to break away from the target. By using the vapor deposition method, losses of vapor deposition materials may be avoided, utilization of the vapor deposition materials may be increased, and thus costs may be reduced.

Abstract: The present disclosure relates to the field of vapor deposition technologies, and discloses a vapor deposition method. The vapor deposition method includes: applying an exciting acoustic wave to the target, such that particles in a predetermined location of the target break away from the target and adhere to a predetermined region of the substrate when an energy of the particles is higher than an energy required for the particles to break away from the target. By using the vapor deposition method, losses of vapor deposition materials may be avoided, utilization of the vapor deposition materials may be increased, and thus costs may be reduced.

Abstract: Disclosed are a composition for a black matrix and a method for preparing the same, a display substrate, and a display device. The composition for a black matrix comprises an adhesive, a light-shielding material, a solvent, a first dye and a monomer, wherein the light-shielding material comprises light-shielding particles, and an electrically insulating material and a base material with which the light-shielding particles are coated sequentially; and the adhesive, the first dye and the light-shielding material are bonded by the monomer.

Abstract: The present application proposes an improved position sensor, a conveying device comprising the same and a method for position correction by using the same. The position sensor includes at least two light emitters, a light receiver array and a pedestal, the pedestal having a central plane and at least two sloping surfaces tilting towards a center of the pedestal at opposite edges, the at least two light emitters being arranged on the at least two sloping surfaces respectively, and the light receiver array being arranged on the central plane of the pedestal.

Abstract: The present application proposes an improved position sensor, a conveying device comprising the same and a method for position correction by using the same. The position sensor includes at least two light emitters, a light receiver array and a pedestal, the pedestal having a central plane and at least two sloping surfaces tilting towards a center of the pedestal at opposite edges, the at least two light emitters being arranged on the at least two sloping surfaces respectively, and the light receiver array being arranged on the central plane of the pedestal.

Abstract: A coating device and a washing method for its nozzle are provided. The coating device including a barrel, a nozzle connected with the barrel, and a waste sump provided below the nozzle, wherein the coating device further includes a washing bath and a washing component, the washing bath is provided at a side of the waste sump, and the washing component is provided in the washing bath, and is configured to inject washing liquid and cleaning gas to the nozzle to wash the nozzle when the nozzle is moved to the top of the washing bath.

Abstract: The present disclosure provides a mask plate, an exposure device and an exposure method. The mask plate includes a base plate and a plurality of patterns with openings arranged on the base plate. The base plate includes a first region corresponding to a position where a developing agent has a low concentration in the case that a target substrate is to be developed, and a second region corresponding to a position where the developing agent has a high concentration in the case that the target substrate is to be developed. In the case that the target substrate is exposed using the mask plate, an amount of light beams passing through each pattern at the first region of the base plate is greater than an amount of the light beams passing through each pattern at the second region of the base plate.

Abstract: The present disclosure provides a mask plate, an exposure device and an exposure method. The mask plate includes a base plate and a plurality of patterns with openings arranged on the base plate. The base plate includes a first region corresponding to a position where a developing agent has a low concentration in the case that a target substrate is to be developed, and a second region corresponding to a position where the developing agent has a high concentration in the case that the target substrate is to be developed. In the case that the target substrate is exposed using the mask plate, an amount of light beams passing through each pattern at the first region of the base plate is greater than an amount of the light beams passing through each pattern at the second region of the base plate.

Abstract: Disclosed are a composition for a black matrix and a method for preparing the same, a display substrate, and a display device. The composition for a black matrix comprises an adhesive, a light-shielding material, a solvent, a first dye and a monomer, wherein the light-shielding material comprises light-shielding particles, and an electrically insulating material and a base material with which the light-shielding particles are coated sequentially; and the adhesive, the first dye and the light-shielding material are bonded by the monomer.

Abstract: A coating device and a washing method for its nozzle are provided. The coating device including a barrel, a nozzle connected with the barrel, and a waste sump provided below the nozzle, wherein the coating device further includes a washing bath and a washing component, the washing bath is provided at a side of the waste sump, and the washing component is provided in the washing bath, and is configured to inject washing liquid and cleaning gas to the nozzle to wash the nozzle when the nozzle is moved to the top of the washing bath.