Patents by Inventor Penny Hung

Penny Hung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist recycling apparatus
    Patent number: 10663865
    Abstract: A method for removing air micro-bubbles from photoresist used to purge a new photoresist filter is disclosed. The method includes flowing photoresist through a photoresist filter to remove air trapped in the photoresist filter, where the trapped air forms air micro-bubbles in the photoresist; collecting, in a buffer tank, the photoresist with air micro-bubbles; removing, in the buffer tank, the air micro-bubbles from the photoresist; and transferring the photoresist without air micro-bubbles from the buffer tank to photolithography equipment.
    Type: Grant
    Filed: May 9, 2019
    Date of Patent: May 26, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chia-Ren Lin, Penny Hung, Hung-Chen Lin
  • PHOTORESIST RECYCLING APPARATUS
    Publication number: 20200004157
    Abstract: The present disclosure describes a method that can be used to remove air micro-bubbles from photoresist used to purge a new photoresist filter. For example, the method includes flowing photoresist through a photoresist filter to remove air trapped in the photoresist filter, where the trapped air forms air micro-bubbles in the photoresist; collecting, in a buffer tank, the photoresist with air micro-bubbles; removing, in the buffer tank, the air micro-bubbles from the photoresist; and transferring the photoresist without air micro-bubbles from the buffer tank to photolithography equipment.
    Type: Application
    Filed: May 9, 2019
    Publication date: January 2, 2020
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chia-Ren Lin, Penny Hung, Hung-Chen Lin