Patents by Inventor Pepijn Wijnand Jozef Janssen

Pepijn Wijnand Jozef Janssen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation conduit for radiation source
    Patent number: 8680493
    Abstract: A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.
    Type: Grant
    Filed: June 5, 2012
    Date of Patent: March 25, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Maikel Adrianus Cornelis Schepers, Markus Franciscus Antonius Eurlings, Franciscus Johannes Joseph Janssen, Bernard Jacob Andries Stommen, Hrishikesh Patel, Hermanus Johannes Maria Kreuwel, Jacob Cohen, Pepijn Wijnand Jozef Janssen, Maarten Kees Jan Boon
  • RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
    Publication number: 20130001442
    Abstract: A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.
    Type: Application
    Filed: June 5, 2012
    Publication date: January 3, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Maikel Adrianus Cornelis Schepers, Markus Franciscus Antonius Eurlings, Franciscus Johannes Joseph Janssen, Bernard Jacob Andries Stommen, Hrishikesh Patel, Hermanus Johannes Maria Kreuwel, Jacob Cohen, Pepijn Wijnand Jozef Janssen, Maarten Kees Jan Boon