Abstract: Electrically conductive multicomponent material is deposited on a tubular substrate (3) by means of a PCVD method. A plasma (9) is produced between an inner electrode (13) and an outer electrode, one of which is tubular and serves as a substrate. In order to obtain multicomponent material of the desired composition, the composition of the gas phase is changed as a function of time and/or place. In particular when metalorganic starting compounds are used, PCVD of many single layers together with an intermittent, for example, Ar/O.sub.2 plasma intermediate treatment yields an efficient removal of undesired carbon or fluorine from the deposited multicomponent material already during its manufacture.

Abstract: 1. Process for flow-discharge-activated reactive deposition of metal from a gas phase.2.1 For the reactive deposition of tubular metal bodies from a flowing gas phase which contains a metal halide, a glow discharge is generated between an inner electrode and an outer electrode, one of which is of tubular construction and serves as substrate. Under these circumstances, an unexpectedly low yield of the metal deposition is obtained in some cases. The novel process is intended to ensure a high metal deposition.2.2 The reactive deposition from the gas phase is carried out in the high plasma resistance range. A preferred technique for establishing the high plasma resistance is to adjust the absolute mass flow of the metal halide to at least 60 sccm.2.3 The novel process makes it possible to manufacture self-supporting thermionic cathodes and other self-supporting materials, layers and shaped bodies for high-temperature applications.3. FIG.

Abstract: An enriching device consisting of a container which comprises a removable tightly fitting metal body the sparingly volatile material being present in a coiled groove. During operation of this device transverse flows and shortcuts, respectively, of the carrier gas flow occur. To assure that the carrier gas flows through the material without having an escape possibility, the groove (5) is made either in an outer wall of the metal body (8) or in the bottom (4) of the container (1), and the parts (6) present between the individual turns of the groove have a cutting edge, i.e. a cross-sectional profile in the form of a wedge, the tip of which is in contact either with the smooth inner wall of the container (1) or with the smooth lower side of the metal body (8). The device is suitable for adjusting a defined mass flow of sparingly volatile materials which are used as starting compounds for chemical deposition from the gaseous phase.

Abstract: For the reactive deposition of tubular bodies of electrically conductive material from a flowing gas phase on a tubular substrate, a glow discharge 11 is produced between an inner electrode 6 and an outer electrode 2, one of which is constructed so as to be tubular and serves as a substrate. It is ensured that the electrodes 2, 6 are not short-circuited by growing conductive surface layers so that the glow discharge 11 extinguishes. Furthermore, the electrically conductive coating on the electrode 6 which does not function as the substrate electrode is interrupted in an insulating manner to locally limit the glow discharge 11. For example, by a gas barrier the deposit of an electrically conducting material on the insulation can be avoided. The glow discharge 11 is reciprocated during the deposition process.

Abstract: In the reactive deposition from a gaseous phase containing tungsten hexafluoride and hydrogen on a substrate at an overall pressure of 10 to 100 hPa (low-pressure CVD method) an inert carrier gas is enriched with a rare earth metal acetyl acetonate hydrate and is conducted across the substrate and the growing tungsten layer together with the reactive gases tungsten hexafluoride and hydrogen.