Patents by Inventor Peter Agren

Peter Agren has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9507142
    Abstract: A semiconductor device, includes a semiconductor substrate (10) having a first (12a) and a second (12b) side. There is provided at least one via (15) extending through the substrate (10) having first (16a) and second (16b) end surfaces, the first end surface (16a) constituting a transducer electrode for interacting with a movable element (14) arranged at the first side (12a) of the substrate (10). A shield (17) is provided on and covers at least part of the first side (12a) of the substrate (10), the shield/mask (17) including a conductive layer (19a) and an insulating material layer (19b) provided between the substrate (10) and the conductive layer (19a). The mask has an opening (18) exposing only a part of the first surface (16a) of the via. Preferably the opening (18) in the mask is precisely aligned with the movable element, and the area of the opening is accurately defined.
    Type: Grant
    Filed: June 12, 2013
    Date of Patent: November 29, 2016
    Assignee: SILEX MICROSYSTEMS AB
    Inventor: Peter Agren
  • Patent number: 9448401
    Abstract: A layered micro-electronic and/or micro-mechanic structure comprises at least three alternating electrically conductive layers with insulating layers between the conductive layers. There is also provided a via in a first outer layer, said via comprising an insulated conductive connection made of wafer native material through the layer, an electrically conductive plug extending through the other layers and into said via in the first outer layer in order to provide conductivity through the layers, and an insulating enclosure surrounding said conductive plug in at least one selected layer of said other layers for insulating said plug from the material in said selected layer. It also relates to micro-electronic and/or micro-mechanic device comprising a movable member provided above a cavity such that it is movable in at least one direction. The device has a layered structure according to the invention. Methods of making such a layered MEMS structure is also provided.
    Type: Grant
    Filed: November 6, 2013
    Date of Patent: September 20, 2016
    Assignee: Silex Microsystems AB
    Inventors: Thorbjorn Ebefors, Edvard Kalvesten, Peter Agren, Niklas Svedin
  • Publication number: 20150370063
    Abstract: A semiconductor device, includes a semiconductor substrate (10) having a first (12a) and a second (12b) side. There is provided at least one via (15) extending through the substrate (10) having first (16a) and second (16b) end surfaces, the first end surface (16a) constituting a transducer electrode for interacting with a movable element (14) arranged at the first side (12a) of the substrate (10). A shield (17) is provided on and covers at least part of the first side (12a) of the substrate (10), the shield/mask (17) including a conductive layer (19a) and an insulating material layer (19b) provided between the substrate (10) and the conductive layer (19a). The mask has an opening (18) exposing only a part of the first surface (16a) of the via. Preferably the opening (18) in the mask is precisely aligned with the movable element, and the area of the opening is accurately defined.
    Type: Application
    Filed: June 12, 2013
    Publication date: December 24, 2015
    Inventor: Peter AGREN
  • Patent number: 8729713
    Abstract: A vent hole precursor structure (26) in an intermediate product for a semi-conductor device has delicate structures (27, 28), and said intermediate product has a cavity (21) with a pressure therein differing from the pressure of the surroundings. The intermediate product comprises a first wafer (20) in which there is formed a depression (21). The first wafer is bonded to a second wafer (22) comprising a device layer (23) from which the structures (27, 28) are to be made by etching. A hole or groove (26) having a predefined depth extends downwards into the device layer, such that the cavity (21) during etching is opened up before the etching procedure breaks through the device layer (23) to form the structures (27, 28).
    Type: Grant
    Filed: July 28, 2011
    Date of Patent: May 20, 2014
    Assignee: Silex Microsystems AB
    Inventors: Thorbjörn Ebefors, Edvard Kälvesten, Peter Agren, Niklas Svedin
  • Publication number: 20140063580
    Abstract: A layered micro-electronic and/or micro-mechanic structure comprises at least three alternating electrically conductive layers with insulating layers between the conductive layers. There is also provided a via in a first outer layer, said via comprising an insulated conductive connection made of wafer native material through the layer, an electrically conductive plug extending through the other layers and into said via in the first outer layer in order to provide conductivity through the layers, and an insulating enclosure surrounding said conductive plug in at least one selected layer of said other layers for insulating said plug from the material in said selected layer. It also relates to micro-electronic and/or micro- mechanic device comprising a movable member provided above a cavity such that it is movable in at least one direction. The device has a layered structure according to the invention. Methods of making such a layered MEMS structure is also provided.
    Type: Application
    Filed: November 6, 2013
    Publication date: March 6, 2014
    Applicant: SILEX Microsystems AB
    Inventors: Thorbjorn Ebefors, Edvard Kalvesten, Peter Agren, Niklas Svedin
  • Patent number: 8630033
    Abstract: A layered micro-electronic and/or micro-mechanic structure comprises at least three alternating electrically conductive layers with insulating layers between the conductive layers. There is also provided a via in a first outer layer, said via comprising an insulated conductive connection made of wafer native material through the layer, an electrically conductive plug extending through the other layers and into said via in the first outer layer in order to provide conductivity through the layers, and an insulating enclosure surrounding said conductive plug in at least one selected layer of said other layers for insulating said plug from the material in said selected layer. It also relates to micro-electronic and/or micro-mechanic device comprising a movable member provided above a cavity such that it is movable in at least one direction. The device has a layered structure according to the invention. Methods of making such a layered MEMS structure is also provided.
    Type: Grant
    Filed: June 22, 2011
    Date of Patent: January 14, 2014
    Assignee: Silex Microsystems AB
    Inventors: Thorbjörn Ebefors, Edvard Kälvesten, Peter Agren, Niklas Svedin, Thomas Ericson
  • Publication number: 20120018898
    Abstract: The invention relates to a layered micro-electronic and/or micro-mechanic structure, comprising at least three alternating electrically conductive layers with insulating layers between the conductive layers. There is also provided a via in a first outer layer, said via comprising an insulated conductive connection made of wafer native material through the layer, an electrically conductive plug extending through the other layers and into said via in the first outer layer in order to provide conductivity through the layers, and an insulating enclosure surrounding said conductive plug in at least one selected layer of said other layers for insulating said plug from the material in said selected layer. It also relates to micro-electronic and/or micro-mechanic device comprising a movable member provided above a cavity such that it is movable in at least one direction. The device has a layered structure according to the invention. Methods of making such a layered MEMS structure is also provided.
    Type: Application
    Filed: December 23, 2009
    Publication date: January 26, 2012
    Applicant: SILEX MICROSYSTEMS AB
    Inventors: Thorbjörn Ebefors, Edvard Kälvesten, Peter Agren, Niklas Svedin
  • Publication number: 20120019886
    Abstract: A layered micro-electronic and/or micro-mechanic structure comprises at least three alternating electrically conductive layers with insulating layers between the conductive layers. There is also provided a via in a first outer layer, said via comprising an insulated conductive connection made of wafer native material through the layer, an electrically conductive plug extending through the other layers and into said via in the first outer layer in order to provide conductivity through the layers, and an insulating enclosure surrounding said conductive plug in at least one selected layer of said other layers for insulating said plug from the material in said selected layer. It also relates to micro-electronic and/or micro-mechanic device comprising a movable member provided above a cavity such that it is movable in at least one direction. The device has a layered structure according to the invention. Methods of making such a layered MEMS structure is also provided.
    Type: Application
    Filed: June 22, 2011
    Publication date: January 26, 2012
    Applicant: SILEX MICROSYSTEMS AB
    Inventors: Thorbjörn Ebefors, Edvard Kälvesten, Peter Agren, Niklas Svedin, Thomas Ericson
  • Publication number: 20120018852
    Abstract: A vent hole precursor structure (26) in an intermediate product for a semi-conductor device has delicate structures (27, 28), and said intermediate product has a cavity (21) with a pressure therein differing from the pressure of the surroundings. The intermediate product comprises a first wafer (20) in which there is formed a depression (21). The first wafer is bonded to a second wafer (22) comprising a device layer (23) from which the structures (27, 28) are to be made by etching. A hole or groove (26) having a predefined depth extends downwards into the device layer, such that the cavity (21) during etching is opened up before the etching procedure breaks through the device layer (23) to form the structures (27, 28).
    Type: Application
    Filed: July 28, 2011
    Publication date: January 26, 2012
    Applicant: SILEX MICROSYSTEMS AB
    Inventors: Thorbjörn Ebefors, Edvard Kälvesten, Peter Agren, Niklas Svedin
  • Patent number: 6732487
    Abstract: A post processing cap applicator for applying a cap to a closure spout after erection, spout attachment, filling and sealing of a carton accommodates custom caps. Cartons are conveyed through the applicator in a first forward direction. A cap supply is configured to dispense caps and to position an edge of a cap in a path defined by movement of the closure spout through the applicator. The closure spout engages the edge of the cap. The applicator includes a rotating, torque-applying element and a drive operably connected to the torque-applying element. The drive is operable in a first direction to tighten the cap onto the spout to a predetermined torque and, once the predetermined torque is reached, to stop tightening the cap. A method for post processing cap application is also disclosed.
    Type: Grant
    Filed: November 20, 2001
    Date of Patent: May 11, 2004
    Assignee: Tetra Laval Holdings & Finance, S.A.
    Inventors: Hichem Bouraoui, Dave Anchor, Peter Agren
  • Publication number: 20030093972
    Abstract: A post processing cap applicator for applying a cap to a closure spout after erection, spout attachment, filling and sealing of a carton accommodates custom caps. Cartons are conveyed through the applicator in a first forward direction. A cap supply is configured to dispense caps and to position an edge of a cap in a path defined by movement of the closure spout through the applicator. The closure spout engages the edge of the cap. The applicator includes a rotating, torque-applying element and a drive operably connected to the torque-applying element. The drive is operable in a first direction to tighten the cap onto the spout to a predetermined torque and, once the predetermined torque is reached, to stop tightening the cap. A method for post processing cap application is also disclosed.
    Type: Application
    Filed: November 20, 2001
    Publication date: May 22, 2003
    Inventors: Hichem Bouraoui, Dave Anchor, Peter Agren